公开(公告)号：US20180259844A1

公开(公告)日：2018-09-13

申请号：US15917947

申请日：2018-03-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyeonjin Shin ,  Hyunjae Song ,  Minhyun Lee ,  Yeonchoo Cho

IPC: G03F1/62 ,  G03F1/64 ,  G03F1/22 ,  G03F7/20

CPC classification number: G03F7/70983 ,  G03F1/22 ,  G03F1/62 ,  G03F1/64 ,  G03F7/70283 ,  G03F7/7095 ,  G03F7/70958

Abstract: A pellicle for a photomask, a reticle including the same, and an exposure apparatus for lithography are provided. The pellicle may include a pellicle membrane and a passivation member. The pellicle membrane may include a carbon-based material having defects. The passivation member may cover the defects of the carbon-based material. The passivation member may include an inorganic material. The passivation member may be disposed on one or two surfaces of the pellicle membrane. The pellicle for the photomask may be applied to extreme ultraviolet (EUV) lithography.