公开(公告)号：US06443168B1

公开(公告)日：2002-09-03

申请号：US09579142

申请日：2000-05-30

申请人： Fumio Morita ,  Masataka Fujiki ,  Hitoshi Oka ,  Noriyuki Oroku ,  Yuichirou Tanaka

发明人： Fumio Morita ,  Masataka Fujiki ,  Hitoshi Oka ,  Noriyuki Oroku ,  Yuichirou Tanaka

IPC分类号： B08B302

CPC分类号： H01L21/67051 ,  B08B3/04 ,  Y10S134/902

摘要： The fluid treatment apparatus, as disclosed, comprises upper and lower Bernoulli-plates 12 and 14, each of which includes a metal plate 25 provided on overall outer surface thereof. On each of the metal plates 25, there is arranged a spiral-shaped circulating pipe 24 through which a heating medium or a cooling medium are circulated so as to rapidly heat or cool the upper and lower Bernoulli-plates. During the treatment of a wafer 16 by the apparatus, the upper and lower Bernoulli-plates are disposed in parallel with each other to define a narrow gap therebetween while a clearance between the wafer 16 and the upper Bernoulli-plate and a clearance between the wafer 16 and the lower Bernoulli-plate are kept to be equal to each other. Thus, the present invention can achieve various purpose such as a time saving for the cleaning, reduction of consumption of the cleaning liquid and inhibition of cleaning irregularity.

摘要翻译： 所公开的流体处理装置包括上部和下部伯努利板12和14，每个都包括设置在其整个外表面上的金属板25。 在每个金属板25上，布置有螺旋形循环管24，通过该螺旋形循环管24循环加热介质或冷却介质，以便快速加热或冷却上部和下部伯努利板。 在由设备处理晶片16期间，上部和下部伯努利板彼此平行地设置，以在其间形成窄间隙，同时晶片16和上部伯努利板之间的间隙以及晶片之间的间隙 16和下部伯努利板保持彼此相等。 因此，本发明可以实现各种目的，例如清洁的时间节省，清洁液的消耗减少和清洁不均匀性的抑制。

公开(公告)号：US06431190B1

公开(公告)日：2002-08-13

申请号：US09955212

申请日：2001-09-19

申请人： Hitoshi Oka ,  Fumio Morita ,  Masataka Fujiki ,  Akinobu Yamaoka

发明人： Hitoshi Oka ,  Fumio Morita ,  Masataka Fujiki ,  Akinobu Yamaoka

IPC分类号： B08B304

CPC分类号： H01L21/67017 ,  B08B3/10 ,  B08B11/02 ,  Y10S134/902

摘要： To carry out very clean and low-cost fluid processing on both the front and rear surfaces of an object to be processed without generating rubbing particles and without leakage of fluid. A retention member for the object to be processed 18 that retains the object to be processed 17 and a rear shielding plate 15 that prevents the rear surface of the object to be processed from becoming contaminated by excessive fluid flow are mechanically separated. The rear shielding plate 15 is fixed in like manner to a front shielding plate 11, only the retention member for the object to be processed 18 is allowed to rotate making it possible to rigidly connect a supply pipe 22 (that supplies fluid through the rear shielding plate 15) to the rear shielding plate 15. Further, a circulation system is provided that collects fluid which underwent front surface processing in a collection tube 13, circulates that fluid and then supplies it to the rear surface of the object to be processed from a supply pipe.

摘要翻译： 在待加工物体的前表面和后表面上进行非常干净且低成本的流体处理，而不会产生摩擦颗粒并且不会泄漏流体。 机械地分离用于保护被处理物体18的保持构件18和防止被处理物的后表面被过度流体流动污染的后挡板15。 后屏蔽板15以与前屏蔽板11相同的方式固定，仅允许被处理物体18的保持构件旋转，从而可以将供给管22（通过后屏蔽 板15）连接到后屏蔽板15.此外，提供一种循环系统，其收集在收集管13中经历前表面处理的流体，使该流体循环，然后将其从一个 供应管道。