公开(公告)号：US5908718A

公开(公告)日：1999-06-01

申请号：US828531

申请日：1997-03-31

Applicant: Shinji Ishida ,  Tadao Yasuzato

Inventor： Shinji Ishida ,  Tadao Yasuzato

IPC: G03F1/29 ,  G03F9/00

CPC classification number: G03F1/29

Abstract: Disclosed is a photomask, which has: a transparent substrate; and masking film which is selectively formed on the transparent substrate to provide a predetermined pattern composed of a transparent region and a masking region; wherein the transparent region comprises a first transparent region which is formed adjacent to the masking region and extends like a belt along the masking region and a second transparent region which lies sandwiching the first transparent region with the masking region, whereby a phase of exposure light through the first transparent region is advanced prior to that through the second transparent region.

Abstract translation: 公开了一种光掩模，其具有：透明基板; 以及选择性地形成在透明基板上以提供由透明区域和掩蔽区域构成的预定图案的掩模膜; 其中所述透明区域包括邻近所述掩蔽区域形成的第一透明区域，并沿着所述掩蔽区域像带一样延伸，以及第二透明区域，所述第二透明区域将所述第一透明区域与所述掩蔽区域夹在中间，由此曝光光的相位通过 第一透明区域在其之前通过第二透明区域前进。

公开(公告)号：US5792596A

公开(公告)日：1998-08-11

申请号：US595916

申请日：1996-02-06

Applicant: Tadao Yasuzato ,  Shinji Ishida ,  Kunihiko Kasama ,  Yoko Iwabuchi

Inventor： Tadao Yasuzato ,  Shinji Ishida ,  Kunihiko Kasama ,  Yoko Iwabuchi

IPC: G03F1/32 ,  G03F1/68 ,  G03F7/20 ,  G03F7/38 ,  H01L21/027 ,  G03F7/207

CPC classification number: G03F7/70333 ,  G03F7/2002 ,  G03F7/70433

Abstract: In a method of forming a pattern, a photo-mask including a desired pattern is provided. A photo-sensitive resin film is spin-coated on a semiconductor substrate. Subsequently, the surface of the photo-sensitive resin film is changed to have a resistivity against a development solution. Next, light is illuminated to transmit the photo-mask. As a result, the resistivity of only the surface portion of the photo-sensitive resin film corresponding to the desired pattern is decreased based on the property of photo-sensitive resin film by the light having transmitted the photo-mask. Last, the photo-sensitive layer is developed with the development solution.

Abstract translation: 在形成图案的方法中，提供包括期望图案的光掩模。 将感光树脂膜旋涂在半导体衬底上。 随后，将感光树脂膜的表面改变成对显影液具有电阻率。 接下来，照亮光以传输照相掩模。 结果，基于通过光掩模的光的光敏树脂膜的性质，仅使与所需图案相对应的感光树脂膜的表面部分的电阻降低。 最后，光敏层是用开发解决方案开发的。

公开(公告)号：USD327740S

公开(公告)日：1992-07-07

申请号：US471120

申请日：1990-01-26

Applicant: Tetsuya Arioka ,  Shinji Ishida

Designer： Tetsuya Arioka ,  Shinji Ishida