Material composition for nano-and micro-lithography
    61.
    发明申请
    Material composition for nano-and micro-lithography 失效
    纳米和微光刻的材料组成

    公开(公告)号:US20070196589A1

    公开(公告)日:2007-08-23

    申请号:US10598943

    申请日:2005-06-01

    Abstract: A material composition, which is used as a liquid resist, includes a first component comprising a monomer portion and at least one cationically polymerizable functional group, and a crosslinker reactive with the first component and comprising at least three cationically polymerizable functional groups. The material composition also includes a cationic photoinitiator. Upon exposure to UV light, the material composition crosslinks via cure to form a cured resist film that is the reaction product of the first component, the crosslinker, and the cationic photoinitiator. An article includes a substrate layer and a resist layer formed on the substrate layer from the material composition.

    Abstract translation: 用作液体抗蚀剂的材料组合物包括包含单体部分和至少一种阳离子可聚合官能团的第一组分和与第一组分反应并包含至少三个可阳离子聚合的官能团的交联剂。 该材料组合物还包括阳离子光引发剂。 在暴露于UV光下时,材料组合物通过固化交联以形成固化的抗蚀剂膜,其是第一组分,交联剂和阳离子光引发剂的反应产物。 一种制品包括从该材料组合物形成在基底层上的基底层和抗蚀剂层。

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