公开(公告)号：US12124165B2

公开(公告)日：2024-10-22

申请号：US17509763

申请日：2021-10-25

Applicant: CANON KABUSHIKI KAISHA

Inventor： Nilabh K. Roy ,  Anshuman Cherala

IPC: G03F7/00 ,  G03F9/00 ,  B82Y40/00

CPC classification number: G03F7/0002 ,  G03F9/7042 ,  G03F9/7092 ,  B82Y40/00

Abstract: A method and system for optimizing forces applied to actuators during a nanoimprint lithography process is provided. A first set of forces within a first set of force limits is selected to be applied to edges of a template. A first residual distortion representative of a first predicted overlay error associated with a simulated imprinting method in which the first set of forces are applied to the edges of the template is estimated. A second set of forces is selected within a second set of force limits to be applied to the edges of the template. A second residual distortion is estimated that is representative of a second predicted overlay error associated with the simulated imprinting method in which the second set of forces are applied to edges of the template. An initial set of forces having a narrowest set of force limits and residual distortion that is below a residual threshold from among the first set of forces and the second set of forces is selected.

公开(公告)号：US20240345476A1

公开(公告)日：2024-10-17

申请号：US18706068

申请日：2022-08-19

Applicant: Goertek Optical Technology Co., Ltd.

Inventor： Lu Cai ,  Weixiang Wang ,  Ying Li ,  Yuliang Zhang ,  Xingiun Han ,  Peiliang Guo ,  Yi Rao

IPC: G03F7/00 ,  B29C41/02 ,  B29C41/38

CPC classification number: G03F7/0002 ,  B29C41/02 ,  B29C41/38 ,  B29K2907/00 ,  B29K2909/02

Abstract: Disclosed are an imprinting master-template and a manufacturing method therefor, wherein the method includes a master-template and a cushioning structure. A surface of the master-template is provided with a structural area and a non-structural area, the non-structural area being provided on a lateral edge of the structural area, and the structural area being provided with a structural member. The cushioning structure is provided in the non-structural area, when the imprinting master-template is transferred to form the transferring structure for the flexible template, the cushioning structure is used to be imprinted to form a supporting structure that supports the flexible template.

公开(公告)号：US12111571B2

公开(公告)日：2024-10-08

申请号：US17323225

申请日：2021-05-18

Applicant: Stensborg A/S

Inventor： Leif Yde ,  Jan Fagerbo Stensborg

IPC: G03F7/00

CPC classification number: G03F7/0002

Abstract: In an embodiment there is provided a method for simultaneous dual-sided direct imprinting of surface relief structures on a substrate, the method utilising an imprinting arrangement comprising first and second rotatable cylinders, each rotatable cylinder being arranged to carry at least one mould having a surface relief structure, at least one rotatable cylinder comprising a resilient layer located between a cylindrical outer surface of the respective rotatable cylinder and the respective mould, and the rotatable cylinders being movable with respect to one another and arranged to form an imprinting nip therebetween, the imprinting nip having an imprinting contact area, wherein the method comprises the steps of: a) providing to the imprinting nip a substrate comprising first and second sides each having a curable medium thereon; b) directly imprinting surface relief structures into the curable medium on both the first and second sides of the substrate by passing the substrate through the imprinting nip and engaging, in the imprinting contact area, a first mould on the first rotatable cylinder with the curable medium on the first side of the substrate and a second mould on the second rotatable cylinder with the curable medium on the second side of the substrate; and c) illuminating at least a part of the curable media on the first and second sides of the substrate with curing radiation to at least partially cure the curable media on the substrate.

公开(公告)号：US12109737B2

公开(公告)日：2024-10-08

申请号：US18139335

申请日：2023-04-25

Applicant: ULTRA SMALL FIBERS, LLC

Inventor： William Hudson Hofmeister ,  Alexander Yuryevich Terekhov ,  Jose Lino Vasconcelos da Costa ,  Kathleen Stacia Lansford ,  Deepak Rajput ,  Lloyd M. Davis

IPC: B32B3/10 ,  B29C33/38 ,  B29C41/00 ,  B29C41/02 ,  B29C41/38 ,  B29C41/42 ,  B82Y10/00 ,  B82Y40/00 ,  C08B3/06 ,  C08B5/02 ,  C08F110/02 ,  C08F120/18 ,  C08F120/40 ,  C08G63/08 ,  C08G63/664 ,  C08G77/04 ,  G03F7/00 ,  B29K1/00 ,  B29K31/00 ,  B29K33/00 ,  B29K67/00 ,  B29K71/00 ,  B29K83/00 ,  B29L31/00

CPC classification number: B29C41/003 ,  B29C33/3842 ,  B29C41/02 ,  B29C41/38 ,  B29C41/42 ,  B82Y10/00 ,  B82Y40/00 ,  C08B3/06 ,  C08B5/02 ,  C08F110/02 ,  C08F120/18 ,  C08F120/40 ,  C08G63/08 ,  C08G63/664 ,  C08G77/04 ,  G03F7/0002 ,  B29K2001/12 ,  B29K2001/18 ,  B29K2023/06 ,  B29K2031/04 ,  B29K2033/12 ,  B29K2067/04 ,  B29K2071/00 ,  B29K2083/00 ,  B29K2901/10 ,  B29K2901/12 ,  B29K2907/045 ,  B29K2909/00 ,  B29K2909/08 ,  B29K2909/14 ,  B29K2995/0026 ,  B29K2995/0094 ,  B29L2031/7562 ,  Y02P20/582 ,  Y10T428/24355 ,  Y10T428/24802

Abstract: Solution casting a nanostructure. Preparing a template by ablating nanoholes in a substrate using single-femtosecond laser machining. Replicating the nanoholes by applying a solution of a polymer and a solvent into the template. After the solvent has substantially dissipated, removing the replica from the substrate.

公开(公告)号：US20240319586A1

公开(公告)日：2024-09-26

申请号：US18593112

申请日：2024-03-01

Applicant: Kioxia Corporation

Inventor： Yukichi KAMITA ,  Takahiro IWASAKI

IPC: G03F7/00

CPC classification number: G03F7/0002

Abstract: An imprint method includes dividing an outer peripheral portion of a patterned surface including a device pattern into a plurality of regions along a circumferential direction. The imprint method includes disposing a dummy pattern in the outer peripheral portion, causing a pattern density of each of the plurality of regions to fall within a first range based on information regarding the device pattern.

公开(公告)号：US20240319585A1

公开(公告)日：2024-09-26

申请号：US18579565

申请日：2022-07-19

Applicant: KONINKLIJKE PHILIPS N. V.

Inventor： Marcus Antonius Verschuuren ,  Didier Mathijs Maria Petit ,  Merijn wijnen ,  Maurice Leonardus Johnnes Janssen

IPC: G03F7/00

CPC classification number: G03F7/0002 ,  G03F7/707 ,  G03F7/70733 ,  G03F7/70775

Abstract: An imprinting apparatus comprises a first carrier for carrying a flexible stamp and a second carrier movable relative to the first carrier and configured to carry a substrate having a resist layer. The second carrier comprises a chuck, a set of chuck actuators for translating a portion of the chuck in a Z-axis direction, a stamp landing device (e.g., ring) around an outside of the chuck and a set of landing ring actuators for translating a portion of the stamp landing ring in a Z-axis direction. Movement of the stamp landing ring in addition to movement of the chuck enables the apparatus to take account of different stamp thicknesses.

公开(公告)号：US12099295B2

公开(公告)日：2024-09-24

申请号：US16843677

申请日：2020-04-08

Applicant: CANON KABUSHIKI KAISHA

Inventor： Hiroyuki Koide ,  Tomomi Funayoshi ,  Kenichi Kobayashi ,  Tatsuya Hayashi

IPC: G03F7/00 ,  G05B13/00 ,  H01L21/027

CPC classification number: G03F7/0002 ,  G05B13/00 ,  H01L21/0271

Abstract: The present invention provides an imprint apparatus forming a pattern of an imprint material on a substrate by using a mold, the imprint apparatus including an optical system applying, to a peripheral region, irradiation light acing to increase viscosity of the imprint material, the peripheral region including an end of a mesa portion of the mold and surrounding the mesa portion in a state in which the mesa portion of the mold is held in contact with the imprint material, and a control unit controlling the optical system such that timings of applying the irradiation light to a plurality of zones in the peripheral region are different from each other, the zones being positioned at different distances from a center of the mesa portion, in the state in which the mesa portion of the mold is held in contact with the imprint material on the substrate.

公开(公告)号：US20240300165A1

公开(公告)日：2024-09-12

申请号：US18668382

申请日：2024-05-20

Applicant: CANON KABUSHIKI KAISHA

Inventor： TAKAHIRO SATO

IPC: B29C59/02 ,  B29C37/00 ,  B29C59/00 ,  G03F7/00

CPC classification number: B29C59/026 ,  B29C59/002 ,  G03F7/0002 ,  B29C2037/90

Abstract: A forming apparatus forms a formable material using a mold including a contact region to be brought into contact with the formable material on a substrate. The apparatus includes a controller configured to perform processing of bringing the contact region and the formable material on the substrate into contact with each other. The controller controls the processing so as to bring the mold and the substrate close to each other at a first relative speed and then bring the mold and the substrate close to each other at a second relative speed lower than the first relative speed, and controls switching from the first relative speed to the second relative speed so as to compensate a manufacturing error of the mold.

公开(公告)号：US12087604B2

公开(公告)日：2024-09-10

申请号：US17471038

申请日：2021-09-09

Applicant: Kioxia Corporation

Inventor： Kazuhiro Takahata

IPC: H01L21/67 ,  G03F7/00 ,  G03F9/00 ,  H01L23/544

CPC classification number: H01L21/67282 ,  G03F7/0002 ,  G03F9/7042 ,  H01L23/544 ,  H01L2223/54426 ,  H01L2223/54453

Abstract: A template includes a first mark surrounding a recessed portion disposed in an inside region of the first mark. The first mark is provided with, in a planar view, an inner portion having a pair of first sides opposed to each other and a pair of second sides opposed to each other. The first sides extend in a first direction along the first substrate. The second sides extend in a second direction intersecting with the first direction along the first substrate. The inner portion surrounds the recessed portion of the first mark. An outer portion has a pair of third sides opposed to each other and a pair of fourth sides opposed to each other. The third sides extend in the first direction. The fourth sides extend in the second direction. The outer portion is an outer edge portion of the first mark.

公开(公告)号：US12085853B2

公开(公告)日：2024-09-10

申请号：US18172540

申请日：2023-02-22

Applicant: Kioxia Corporation

Inventor： Hirotaka Tsuda

IPC: G03F7/00 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B29C59/026

Abstract: A template includes a first region having a first face on a side opposite to a main face and a first pattern including a convex-concave portion provided on the first face, and a second region, provided around the first region, having a second face on the side opposite to the main face, a second pattern including a protruding portion protruding from the second face, and an optical layer provided on the second face and the second pattern, wherein the second face is positioned farther to the main surface side than a bottommost face of the irregular portion.