公开(公告)号：US07384725B2

公开(公告)日：2008-06-10

申请号：US10817193

申请日：2004-04-02

申请人： Anna M. Minvielle ,  Cyrus E. Tabery ,  Hung-eil Kim ,  Jongwook Kye

发明人： Anna M. Minvielle ,  Cyrus E. Tabery ,  Hung-eil Kim ,  Jongwook Kye

IPC分类号： G03F7/20 ,  G03F1/00

CPC分类号： G03F7/70425 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70125 ,  G03F7/70158

摘要： A method of forming a plurality of contact holes of varying pitch and density in a contact layer of an integrated circuit device is provided. The plurality of contact holes can include a plurality of regularly spaced contact holes having a first pitch along a first direction and a plurality of semi-isolated contact holes having a second pitch along a second direction. A double-dipole illumination source can transmit light energy through a mask having a pattern corresponding to a desired contact hole pattern. The double-dipole illumination source can include a first dipole aperture, which is oriented and optimized for patterning the regularly spaced contact holes, and a second dipole aperture, which is oriented substantially orthogonal to the first dipole aperture and optimized for patterning the plurality of semi-isolated contact holes. The contact layer can be etched using the patterned photoresist layer.

摘要翻译： 提供了一种在集成电路器件的接触层中形成多个具有不同间距和密度的接触孔的方法。 多个接触孔可以包括沿着第一方向具有第一间距的多个规则间隔的接触孔和沿第二方向具有第二间距的多个半隔离接触孔。 双偶极照明源可以通过具有对应于期望的接触孔图案的图案的掩模传输光能。 双偶极照明源可以包括第一偶极孔，其被定向和优化以用于图案化规则间隔的接触孔，以及第二偶极孔，其基本上垂直于第一偶极孔定向并且被优化用于图案化多个半 隔离接触孔。 可以使用图案化的光致抗蚀剂层来蚀刻接触层。

公开(公告)号：US20050221233A1

公开(公告)日：2005-10-06

申请号：US10817193

申请日：2004-04-02

申请人： Anna Minvielle ,  Cyrus Tabery ,  Hung-eil Kim ,  Jongwook Kye

发明人： Anna Minvielle ,  Cyrus Tabery ,  Hung-eil Kim ,  Jongwook Kye

IPC分类号： G03F7/20 ,  G03F7/00

CPC分类号： G03F7/70425 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70125 ,  G03F7/70158

摘要： A method of forming a plurality of contact holes of varying pitch and density in a contact layer of an integrated circuit device is provided. The plurality of contact holes can include a plurality of regularly spaced contact holes having a first pitch along a first direction and a plurality of semi-isolated contact holes having a second pitch along a second direction. A double-dipole illumination source can transmit light energy through a mask having a pattern corresponding to a desired contact hole pattern. The double-dipole illumination source can include a first dipole aperture, which is oriented and optimized for patterning the regularly spaced contact holes, and a second dipole aperture, which is oriented substantially orthogonal to the first dipole aperture and optimized for patterning the plurality of semi-isolated contact holes. The contact layer can be etched using the patterned photoresist layer.

摘要翻译： 提供了一种在集成电路器件的接触层中形成多个具有不同间距和密度的接触孔的方法。 多个接触孔可以包括沿着第一方向具有第一间距的多个规则间隔的接触孔和沿第二方向具有第二间距的多个半隔离接触孔。 双偶极照明源可以通过具有对应于期望的接触孔图案的图案的掩模传输光能。 双偶极照明源可以包括第一偶极孔，其被定向和优化以用于图案化规则间隔的接触孔，以及第二偶极孔，其基本上垂直于第一偶极孔定向并且被优化用于图案化多个半 隔离接触孔。 可以使用图案化的光致抗蚀剂层来蚀刻接触层。

公开(公告)号：US06829040B1

公开(公告)日：2004-12-07

申请号：US10703643

申请日：2003-11-07

申请人： Jongwook Kye ,  Ivan Lalovic ,  Christopher F. Lyons ,  Ramkumar Subramanian

发明人： Jongwook Kye ,  Ivan Lalovic ,  Christopher F. Lyons ,  Ramkumar Subramanian

IPC分类号： G03B2742

CPC分类号： G03F7/70575 ,  G03F7/703 ,  G03F7/70333

摘要： A projection lithography system exposes a photo sensitive material on a surface of a semiconductor substrate that includes surface height variations between a high level and a low level. The system comprises an illumination source projecting illumination within a narrow wavelength band centered about a nominal wavelength on an optic path towards the substrate during an exposure period. A wavelength modulation system within the optic path comprises means for chromatically separating the narrow wavelength band into at least two sub-bands, the first sub-band being smaller than the narrow wavelength band and centered about a first sub-band wavelength and the second sub-band being smaller than the narrow wavelength band and centered about a second sub-band wavelength and means for passing each of the first sub-band and the second sub-band during distinct time periods within the exposure period.

摘要翻译： 投影光刻系统在半导体衬底的表面上曝光感光材料，其包括高电平和低电平之间的表面高度变化。 该系统包括照射源，其在曝光期间内以在光路上朝着衬底的标称波长为中心的窄波长带内投射照明。 光路内的波长调制系统包括用于将窄波段色带分离成至少两个子带的装置，第一子带小于窄波段并以第一子带波长为中心，第二子带 带窄于窄波长带并以第二子带波长为中心，以及用于在曝光周期内的不同时间段内通过第一子带和第二子带中的每一个的装置。