Method of forming mask for charged particle beam exposure and processing program of pattern data for forming mask for charged particle beam exposure
    61.
    发明授权
    Method of forming mask for charged particle beam exposure and processing program of pattern data for forming mask for charged particle beam exposure 失效
    形成用于带电粒子束曝光的掩模的方法和用于形成用于带电粒子束曝光的掩模的图案数据的处理程序

    公开(公告)号:US06732351B2

    公开(公告)日:2004-05-04

    申请号:US10084501

    申请日:2002-02-28

    申请人: Hiroshi Yamashita

    发明人: Hiroshi Yamashita

    IPC分类号: G06F1750

    CPC分类号: G03F1/20

    摘要: The present invention relates to a method of forming a mask with an opening pattern used for a charged particle beam exposure; which comprises the steps of: outlining a pattern figure represented by prescribed pattern data; descerning whether every polygonal pattern represented by pattern data being obtained through said contouring is a convex polygon or not; splitting every polygonal pattern which is not identified as a convex polygon into a plurality of pattern sections; and distributing a plurality of said pattern sections onto masks which constitute a set of complementary masks. In the present invention, any of singular patterns which may cause a problem in stencil mask formation is, through systematical identification, extracted and then, this singular pattern is split and distributed onto different masks constituting a set of complementary masks so that, while maintaining sufficient mechanical strength, the number of openings can be reduced to a minimum by avoiding superfluous pattern splitting. As a result, a stencil mask capable to improve the reliability of the pattern projection can be provided efficiently.

    摘要翻译: 本发明涉及一种形成具有用于带电粒子束曝光的开口图案的掩模的方法; 其包括以下步骤:概述由规定图案数据表示的图案图形; 是否通过所述轮廓获得的图案数据表示的每个多边形图案是否是凸多边形; 将未被识别为凸多边形的每个多边形图案分割成多个图案部分; 以及将多个所述图案部分分布到构成一组互补掩模的掩模上。 在本发明中,可以通过系统识别提取模板掩模形成中的任何可能引起问题的单一图案,然后,将该奇异图案分割并分布到构成一组互补掩模的不同掩模上,使得在保持足够的 机械强度,通过避免多余的图案分割,开孔数量可以减少到最小。 结果,可以有效地提供能够提高图案投影的可靠性的模板掩模。

    Color developer solution, concentrated composition thereof for use in silver halide color photographic material and processing method
    62.
    发明授权
    Color developer solution, concentrated composition thereof for use in silver halide color photographic material and processing method 失效
    显色剂显色剂溶液,其浓缩组合物用于卤化银彩色照相材料和加工方法

    公开(公告)号:US06673527B2

    公开(公告)日:2004-01-06

    申请号:US10207455

    申请日:2002-07-29

    申请人: Hiroshi Yamashita

    发明人: Hiroshi Yamashita

    IPC分类号: G03C7413

    CPC分类号: G03C7/413 G03C5/266 G03C7/44

    摘要: A color developer solution capable of inhibiting precipitation or tar-staining occurring in the processing tank or the roller rack, even when being processed rapidly or at low replenishing rate and a concentrated composition thereof is disclosed, comprising at least one selected from specified N-disubstituted hydroxylamine derivatives and at least one selected from specified N-monosubstituted hydroxylamine derivatives in a molar ratio falling within the range of 1000:1 to 1:1.

    摘要翻译: 公开了即使在快速加工或以低补充速度进行加工处理罐或辊架中也能抑制沉淀或焦油污染的显色剂溶液,其包含选自特定的N-二取代的 羟胺衍生物和选自特定N-单取代羟胺衍生物中的至少一种摩尔比在1000:1至1:1的范围内。

    Test method of mask for electron-beam exposure and method of electron-beam exposure
    63.
    发明授权
    Test method of mask for electron-beam exposure and method of electron-beam exposure 有权
    电子束曝光掩模试验方法及电子束曝光方法

    公开(公告)号:US06603120B2

    公开(公告)日:2003-08-05

    申请号:US09870219

    申请日:2001-05-30

    申请人: Hiroshi Yamashita

    发明人: Hiroshi Yamashita

    IPC分类号: H01L2166

    摘要: The present invention relates to a test method of a mask for electron-beam exposure which has a pattern region in which, by forming an electron-beam scatterer in prescribed shape on an electron-beam transmittable thin film, a scattering region with said electron-beam scatterer and a membrane region without said electron-beam scatterer are formed in prescribed pattern shape; wherein electron-beam irradiation onto a tested mask is carried out in a plurality of times, with each irradiated region subjected to irradiation at a time being scanned with the electron beam, and through detection of transmitted electrons which is made for each irradiated region subjected to irradiation at a time.

    摘要翻译: 本发明涉及一种用于电子束曝光的掩模的测试方法,其具有图案区域,其中通过在电子束可透射薄膜上形成规定形状的电子束散射体,具有所述电子束曝光薄膜的散射区域, 光束散射体和没有所述电子束散射体的膜区域以规定的图案形状形成; 其中对测试的掩模进行电子束照射多次进行,每个照射区域一次用电子束进行照射,并且通过检测对于经受 一次照射

    Method of electron-beam exposure
    64.
    发明授权
    Method of electron-beam exposure 失效
    电子束曝光方法

    公开(公告)号:US06509127B1

    公开(公告)日:2003-01-21

    申请号:US09670540

    申请日:2000-09-27

    申请人: Hiroshi Yamashita

    发明人: Hiroshi Yamashita

    IPC分类号: G03C500

    摘要: A scattering-angle limiting type electron-beam exposure method in which a mask having a scattering region is used, and a limiting aperture is set to control the amount of electrons scattered by the mask that pass through the limiting aperture, whereby a scattering contrast is formed from differences in the scattering angles of electrons. By changing the thickness of the scattering region of the mask according to the pattern density, the scattering angles of the scattered electrons are controlled and the amount of the scattered electrons that pass through the limiting aperture is adjusted.

    摘要翻译: 使用具有散射区域的掩模的散射角限制型电子束曝光方法,并且设定限制孔径以控制通过限制孔径的掩模散射的电子的量,由此散射对比度为 由电子散射角的差异形成。 通过根据图案密度改变掩模的散射区域的厚度,控制散射电子的散射角度,并且调节通过限制孔径的散射电子的量。

    Non-stop toll collection system and method
    65.
    发明授权
    Non-stop toll collection system and method 失效
    不间断收费系统及方法

    公开(公告)号:US06459385B2

    公开(公告)日:2002-10-01

    申请号:US09865486

    申请日:2001-05-29

    申请人: Hiroshi Yamashita

    发明人: Hiroshi Yamashita

    IPC分类号: G08G100

    CPC分类号: G07B15/063 G08G1/017

    摘要: A non-stop toll collection system has a plurality of road-side radio apparatuses having mutually different radio communication regions, which transmit identification signals responsive to the installation locations thereof, a vehicle-mounted apparatus, which receives an identification signal, records a communication log for each road-side radio apparatus, in response to the identification signal, and transmits the communication log, wherein each of the plurality of road-side radio apparatuses receives the communication log and wherein, in the case in which the communication log indicates that another road-side radio apparatus and the vehicle-mounted apparatus have already communicated, the vehicle-mounted apparatus is instructed to perform billing processing.

    摘要翻译: 不间断收费系统具有多个具有相互不同的无线电通信区域的路侧无线电设备,其响应于其安装位置发送识别信号,接收识别信号的车载设备记录通信日志 对于每个路侧无线电设备,响应于所述识别信号,并且发送所述通信日志,其中所述多个路侧无线电设备中的每一个接收所述通信日志,并且其中,在所述通信日志指示另一个 路侧无线电设备和车载装置已经通信,指示车载装置执行计费处理。

    Mask for electron beam exposure, manufacturing method for the same, and manufacturing method for semiconductor device
    66.
    发明授权
    Mask for electron beam exposure, manufacturing method for the same, and manufacturing method for semiconductor device 失效
    用于电子束曝光的掩模,及其制造方法以及半导体器件的制造方法

    公开(公告)号:US06376132B1

    公开(公告)日:2002-04-23

    申请号:US09560336

    申请日:2000-04-28

    申请人: Hiroshi Yamashita

    发明人: Hiroshi Yamashita

    IPC分类号: G03F900

    摘要: A mask material which is the same as that of a wafer to be exposed is prepared (step Q1), and the proximity effect correction dose for mask-writing is operated. Then, a resist film of the mask material is exposed by a pattern accompanying a correction dose twice the proximity effect correction dose in mask-writing at the same accelerating voltage as in wafer-exposing (step Q2). Next, the resist film is developed to form a resist film pattern, and the mask material is etched by using the resist film pattern as a mask, whereby a mask is prepared (step Q3). Thereafter, by using this mask, the resist film on the wafer is EB-exposed without proximity effect correction (step Q4). According to the present invention, the time required for calculation processing is shortened and the calculation accuracy is improved.

    摘要翻译: 准备与要曝光的晶片相同的掩模材料(步骤Q1),并且操作用于掩模写入的邻近效应校正剂量。 然后,在与晶片曝光相同的加速电压下,掩模材料的抗蚀剂膜通过伴随校正剂量的两倍于掩模写入的邻近效应校正剂量的图案曝光(步骤Q2)。 接下来,将抗蚀剂膜显影以形成抗蚀剂膜图案,并且通过使用抗蚀剂膜图案作为掩模来蚀刻掩模材料,由此制备掩模(步骤Q3)。 此后,通过使用该掩模,晶片上的抗蚀剂膜被曝光而不进行邻近效应校正(步骤Q4)。 根据本发明,缩短了计算处理所需的时间,提高了计算精度。

    Vehicle-mounted device with sleep function for use in road-to-vehicle communication system
    67.
    发明授权
    Vehicle-mounted device with sleep function for use in road-to-vehicle communication system 失效
    具有睡眠功能的车载装置用于道路交通通信系统

    公开(公告)号:US06181259B2

    公开(公告)日:2001-01-30

    申请号:US09518785

    申请日:2000-03-03

    申请人: Hiroshi Yamashita

    发明人: Hiroshi Yamashita

    IPC分类号: G08G100

    CPC分类号: G07B15/063

    摘要: There is disclosed a vehicle-mounted device with a sleep function for use in a road-to-vehicle communication system. After having indicated a switching period T1 and reception frequencies F1, F2 to a frequency switching controller, a controller stops operation of an internal counter, and enters a sleep mode until it cancels the sleep mode in response to a detected signal from a receiver. While a vehicle with the vehicle-mounted device is running outside of a communication range of a road radio unit installed at a toll gate or the like, the frequency switching controller independently performs a frequency search process on an RF module, and the controller is in the sleep mode. Therefore, the vehicle-mounted device has a relatively low power requirement.

    摘要翻译: 公开了一种具有用于道路对车辆通信系统中的睡眠功能的车载装置。 在将切换期间T1和接收频率F1,F2指示给频率切换控制器之后,控制器停止内部计数器的操作,并且进入睡眠模式,直到其响应于来自接收器的检测信号而取消睡眠模式。 具有车载装置的车辆在安装在收费站等的道路无线电单元的通信范围外运行时,频率切换控制器对RF模块独立地进行频率搜索处理,并且控制器处于 睡眠模式。 因此,车载装置的功率要求相对较低。

    Method of manufacturing an EB mask for electron beam image drawing and
device for manufacturing an EB mask
    68.
    发明授权
    Method of manufacturing an EB mask for electron beam image drawing and device for manufacturing an EB mask 失效
    制造电子束图像的EB掩模的方法和用于制造EB掩模的装置

    公开(公告)号:US6042971A

    公开(公告)日:2000-03-28

    申请号:US006503

    申请日:1998-01-14

    IPC分类号: G03F1/20 H01L21/027 G03F9/00

    CPC分类号: G03F1/20

    摘要: The present invention consists in a method of creating an EB mask for electron beam image drawing, comprising: a step of extracting patterns for forming on an EB mask from design data stored in means for storage; a step of calculating an aperture area of an aperture section requested in an EB mask, using the design data contained in the extracted cell; a step of generating cell data for aperture creation using the value of this aperture area; and a step of forming a basic aperture pattern in an EB mask using this cell data for aperture creation.

    摘要翻译: 本发明在于一种创建用于电子束图像绘制的EB掩模的方法,包括:从存储在存储器中的设计数据中提取用于在EB掩模上形成的图案的步骤; 使用包含在所提取的单元中的设计数据来计算EB掩模中请求的孔径区域的孔径面积的步骤; 使用该开口区域的值生成用于孔径创建的单元数据的步骤; 以及使用这种用于孔径创建的单元数据在EB掩模中形成基本孔径图案的步骤。

    Electric motor for an electric vehicle
    70.
    发明授权
    Electric motor for an electric vehicle 失效
    电动汽车用电动机

    公开(公告)号:US5808387A

    公开(公告)日:1998-09-15

    申请号:US547519

    申请日:1995-10-24

    IPC分类号: H02K9/22 H02K9/20 H02K9/00

    CPC分类号: H02K9/20 Y02T10/641

    摘要: It is an object of the present invention to provide an electric motor for an electric vehicle with an improved cooling capacity by causing coils wound around a stator to serve as a tubular heat pipe type heat transfer device. An electric motor for an electric vehicle includes a stator 11, coils 12 wound around at least the stator, and a rotor 13 being rotated by an induction field developed around the coils 12. In one embodiment of the invention the coils 12 are formed of a tubular container 121 which is filled with a working fluid which vibrates in an axial direction of a tube by nuclear boiling generated at a high temperature portion of the coils 12. The coils themselves are arranged as a non-looped tubular heat pipe type heat transfer device.

    摘要翻译: 本发明的目的是提供一种电动车辆用电动机,其通过使卷绕在定子上的线圈用作管状热管式传热装置而具有改进的冷却能力。 用于电动车辆的电动机包括定子11,至少缠绕在定子上的线圈12和通过围绕线圈12产生的感应磁场而转动的转子13.在本发明的一个实施例中,线圈12由 管状容器121填充有通过在线圈12的高温部分产生的核沸腾而在管的轴向振动的工作流体。线圈本身被布置为非环形管状热管式传热装置 。