公开(公告)号：US5489986A

公开(公告)日：1996-02-06

申请号：US233081

申请日：1994-04-25

申请人： Nobutaka Magome ,  Kazuya Ota ,  Hideo Mizutani ,  Kouichiro Komatsu

发明人： Nobutaka Magome ,  Kazuya Ota ,  Hideo Mizutani ,  Kouichiro Komatsu

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F9/70

摘要： In a position detecting apparatus having an object optical system, two beams are generated for irradiating a diffraction grating formed on an object from two directions at a predetermined intersect angle for forming an interference fringe, the beams passing through a pupil plane of the object optical system spaced apart a predetermined distance from each other. An opto-electric detector receives diffracted light from the grating via the object optical system and outputs a detection signal, and the position of the object is determined on the basis of the detection signal. An adjustable optical member provided in a light path between an optical source and the object changes incident angles at which the two beams are incident on the grating while keeping the intersect angle between the two beams substantially constant.

摘要翻译： 在具有物体光学系统的位置检测装置中，产生两个光束，用于以形成干涉条纹的预定相交角从两个方向照射形成在物体上的衍射光栅，通过物镜光学系统的光瞳面 彼此隔开预定的距离。 光电检测器经由对象光学系统从光栅接收衍射光并输出检测信号，并且基于检测信号确定物体的位置。 设置在光源和物体之间的光路中的可调节光学构件改变两个光束入射到光栅上的入射角，同时保持两个光束之间的相交角基本上恒定。

公开(公告)号：US5459003A

公开(公告)日：1995-10-17

申请号：US350014

申请日：1994-12-06

申请人： Kazuya Ota

发明人： Kazuya Ota

IPC分类号： G03F7/20 ,  G11B5/31 ,  H01L21/027 ,  H01L21/30 ,  H01L21/302 ,  H01L21/3065 ,  G03F9/00

CPC分类号： G03F7/201 ,  G03F7/2022

摘要： A method of forming side surfaces of photosensitive material removed areas is performed so that the side surfaces are inclined to the surface of a substrate when transferring a pattern formed on a mask onto the substrate coated with a photosensitive material and effecting a developing process on the substrate. An image of the pattern to be transferred onto the substrate and the substrate are relatively shifted in a direction along the surface of the substrate during the transfer.

摘要翻译： 执行形成感光材料移除区域的侧表面的方法，使得当将形成在掩模上的图案转印到涂覆有感光材料的基材上并且在基板上进行显影处理时，侧表面倾斜于基板的表面 。 在转印过程中，要转印到基板和基板上的图案的图像在沿着基板表面的方向上相对移位。

公开(公告)号：US5416562A

公开(公告)日：1995-05-16

申请号：US264841

申请日：1994-06-22

申请人： Kazuya Ota ,  Hideo Mizutani

发明人： Kazuya Ota ,  Hideo Mizutani

IPC分类号： G03F9/00 ,  G03B27/42

CPC分类号： G03F9/7088 ,  G03F9/7026

摘要： An apparatus for detecting the position, in a predetermined direction normal to a substrate, of at least one measurement point in a detection area on the substrate, includes:a projection device for projecting a light-dark pattern consisting of a repetitive pattern of light and dark portions in a predetermined detection direction onto substantially the entire detection area;a photoelectric detection device for detecting reflection light from the substrate, and outputting a photoelectric signal having a waveform representing the contrast of an image of the light-dark pattern in the detection direction;a device for detecting the position of a waveform representing a dark portion of the light-dark pattern corresponding to the measurement point in the waveform of the photoelectric signal; anda measurement device for measuring the position, in the predetermined direction, of the measurement point based on a deviation between the detected waveform position and a predetermined reference position.

摘要翻译： 一种用于检测基板上检测区域中的至少一个测量点的垂直于基板的预定方向的位置的装置，包括：投影装置，用于投射由重复图案组成的暗色图案;以及 基本上在整个检测区域上的预定检测方向的暗部; 用于检测来自基板的反射光的光电检测装置，并且输出具有表示所述检测方向上的所述暗色图案的图像的对比度的波形的光电信号; 用于检测表示与光电信号的波形中的测量点相对应的暗暗图案的暗部分的波形的位置的装置; 以及测量装置，用于基于检测到的波形位置与预定基准位置之间的偏差来测量测量点在预定方向上的位置。

公开(公告)号：US5151750A

公开(公告)日：1992-09-29

申请号：US505504

申请日：1990-04-06

申请人： Nobutaka Magome ,  Kazuya Ota ,  Hideo Mizutani ,  Kouichiro Komatsu

发明人： Nobutaka Magome ,  Kazuya Ota ,  Hideo Mizutani ,  Kouichiro Komatsu

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F9/7049 ,  G03F7/70725 ,  G03F9/7076

摘要： There is disclosed an apparatus for transferring a reticle pattern onto a wafer, in which the reticle and the wafer are mutually aligned by irradiating an alignment mark of the wafer with light beams and detecting the optical information from the mark. Depending on the shape of the wafer mark, suitably selected is a first light beam passing through the center of entrance pupil of an objective optical system, or a pair of second light beams passing through the entrance pupil point-symmetrically with respect to its center. The wafer mark consists of a main mark and an auxiliary mark, and the main mark contains a diffraction grating pattern. The second paired light beams and the main mark are used for determining the positional error within an integral fraction of the pitch of the diffraction grating pattern, and the first light beam and the auxiliary mark are used for determining the positional error of an integral multiple of the pitch of the diffraction grating pattern.

摘要翻译： 公开了一种用于将掩模版图案转印到晶片上的装置，其中通过用光束照射晶片的对准标记并且从标记检测光学信息来将标线片和晶片相互对准。 根据晶片标记的形状，适当地选择通过物镜光学系统的入射光瞳的中心的第一光束或相对于其中心点对称地通过入射光瞳的一对第二光束。 晶片标记由主标记和辅助标记组成，主标记包含衍射光栅图案。 第二配对光束和主标记用于确定衍射光栅图案的间距的整数分数内的位置误差，并且第一光束和辅助标记用于确定衍射光栅图案的整数倍的位置误差 衍射光栅图案的间距。

公开(公告)号：US5070250A

公开(公告)日：1991-12-03

申请号：US649340

申请日：1991-02-01

申请人： Koichiro Komatsu ,  Hideo Mizutani ,  Nobutaka Magome ,  Kazuya Ota

发明人： Koichiro Komatsu ,  Hideo Mizutani ,  Nobutaka Magome ,  Kazuya Ota

IPC分类号： G03F9/00

CPC分类号： G03F9/7049

摘要： A position detection apparatus has a substrate on which a diffraction grating is formed and an alignment optical system for illuminating the diffraction grating with a pair of coherent light beams having different frequencies from each other from different directions. The intensity of interference fringes formed due to the interference of diffracted beams generated in the diffraction grating is detected photo-electrically. The alignment optical system forms the pair of coherent light by using an optical modulator, and two luminous fluxes from the optical modulator pass through independent optical paths positioned symmetrically with the optical axis of the alignment optical system therebetween and reach the diffraction grating from different directions. The alignment optical system has a stop having an opening having an inclined edge with respect to the direction of the grating components of the diffraction grating, the opening being in conjugation with the substrate.

摘要翻译： 位置检测装置具有其上形成有衍射光栅的基板和用于用不同方向彼此不同频率的一对相干光束照射衍射光栅的对准光学系统。 由于衍射光栅中产生的衍射光束的干涉而形成的干涉条纹的强度被光电检测。 对准光学系统通过使用光学调制器形成一对相干光，并且来自光学调制器的两个光束通过独立的光学路径，与对准光学系统的光轴对称地定位并从不同的方向到达衍射光栅。 对准光学系统具有具有相对于衍射光栅的光栅部件的方向具有倾斜边缘的开口的开口，该开口与基板共轭。