公开(公告)号：US4745088A

公开(公告)日：1988-05-17

申请号：US830713

申请日：1986-02-19

申请人： Yosuke Inoue ,  Takaya Suzuki ,  Masahiro Okamura ,  Noboru Akiyama ,  Masato Fujita ,  Hiroo Tochikubo ,  Shinya Iida

发明人： Yosuke Inoue ,  Takaya Suzuki ,  Masahiro Okamura ,  Noboru Akiyama ,  Masato Fujita ,  Hiroo Tochikubo ,  Shinya Iida

IPC分类号： H01L21/205 ,  C23C16/458 ,  C23C16/46 ,  H01L21/31 ,  C23C16/00

CPC分类号： C23C16/46 ,  C23C16/4584 ,  Y10S148/057 ,  Y10S148/169 ,  Y10S438/935

摘要： The vapor phase growth on semiconductor wafers is carried out by an apparatus in which a multiplicity of semiconductor wafers are held by a holder so that the semiconductor wafers lie one over another in a vertical direction, and are rotated together with the holder, the holder is placed in a heater disposed in a reaction vessel, a raw material gas supply nozzle and a raw material gas exhaust nozzle are provided within the heater so that the semiconductor wafers are interposed between the gas supply nozzle and the gas discharge nozzle, and the gas supply nozzle and the gas discharge nozzle have gas supply holes and gas discharge holes, respectively, so that a raw material gas can flow on each semiconductor wafer in horizontal directions. When the temperature of the heater is raised by a heating source to heat the semiconductor wafers, the raw material gas is supplied from the gas supply holes to each semiconductor wafer, and thus a uniform layer is grown on each semiconductor wafer from the raw material gas.

摘要翻译： 半导体晶片上的气相生长由多个半导体晶片被保持器保持的装置进行，使得半导体晶片在垂直方向上一个接一个地并且与保持器一起旋转，保持器是 放置在设置在反应容器中的加热器中，原料气体供给喷嘴和原料气体排出喷嘴设置在加热器内，使得半导体晶片插入在气体供给喷嘴和气体排出喷嘴之间，气体供给 喷嘴和气体排出喷嘴分别具有气体供给孔和气体排出孔，使得原料气体可以在水平方向上在每个半导体晶片上流动。 当加热器的温度由加热源升高以加热半导体晶片时，原料气体从气体供给孔供给到每个半导体晶片，因此从原料气体在每个半导体晶片上生长均匀的层 。