公开(公告)号：US20100180645A1

公开(公告)日：2010-07-22

申请号：US12656095

申请日：2010-01-15

申请人： Jong Seok Kim ,  Dong Won Kim ,  Sog Kie Hong ,  Hea Kyung Yoo

发明人： Jong Seok Kim ,  Dong Won Kim ,  Sog Kie Hong ,  Hea Kyung Yoo

IPC分类号： D06F37/00 ,  H02P6/08 ,  H02P1/04 ,  H02H3/04

CPC分类号： D06F58/12 ,  D06F73/02

摘要： The present invention relates to a fabric treating apparatus and method for controlling the same. A fabric treating apparatus according to the present invention includes a treating space within which fabrics are treated; a heating unit configured to supply heated air, or steam, or heated air and steam to the treating chamber; a motor to generate a rotational power; a device receiving the rotational power from the motor, the device configured to move a rack disposed within the treating space; and a control unit adapted to: control the motor according to a sensed electric current of the motor, and drive the motor to rotate at a speed defined by a target number of rotations per minute.

摘要翻译： 织物处理装置及其控制方法技术领域本发明涉及一种织物处理装置及其控制方法。 根据本发明的织物处理装置包括处理织物的处理空间; 加热单元，其构造成将加热的空气或蒸汽或加热的空气和蒸汽供应到处理室; 产生旋转动力的电动机; 接收来自所述电动机的旋转动力的装置，所述装置构造成移动设置在所述处理空间内的架子; 以及控制单元，其适于：根据所感测到的电动机的电流来控制所述电动机，并且以每分钟的目标转数所限定的速度驱动所述电动机。

公开(公告)号：US20100154486A1

公开(公告)日：2010-06-24

申请号：US12654492

申请日：2009-12-22

申请人： Sung Min Kim ,  Dong Won Kim ,  Jong Seok Kim ,  Dae Yun Park

发明人： Sung Min Kim ,  Dong Won Kim ,  Jong Seok Kim ,  Dae Yun Park

IPC分类号： D06F37/00

CPC分类号： D06F58/10 ,  D06F25/00

摘要： A present invention relates to a fabric treating apparatus including an inside cabinet which forms a treating chamber in which the fabrics treated, and a heating unit for supplying any one between hot wind and steam to the treating chamber, and a driving unit for generating driving power, and a driving unit frame is disposed the upper side of the inside cabinet for fixing the driving unit, and a sealing unit is pressed by the driving unit frame and penetrates the driving unit frame and the inside cabinet.

摘要翻译： 一种织物处理装置技术领域本发明涉及一种织物处理装置，该织物处理装置包括：内部机壳，其形成处理织物的处理室;以及用于将热风和蒸汽之间的任何一个供应到处理室的加热单元和用于产生驱动力的驱动单元 并且驱动单元框架设置在内部机壳的上侧，用于固定驱动单元，并且密封单元被驱动单元框架按压并穿过驱动单元框架和内部机柜。

公开(公告)号：US20090241268A1

公开(公告)日：2009-10-01

申请号：US12382904

申请日：2009-03-26

申请人： Hea Kyung Yoo ,  Sog Kie Hong ,  Dong Won Kim ,  Jong Seok Kim ,  Dae Yun Park

发明人： Hea Kyung Yoo ,  Sog Kie Hong ,  Dong Won Kim ,  Jong Seok Kim ,  Dae Yun Park

IPC分类号： D06B19/00

CPC分类号： D06F35/00 ,  A61L2/07 ,  D06F39/008 ,  D06F58/203 ,  D06F58/28 ,  D06F73/02 ,  D06F2058/2809

摘要： A control method of the same are disclosed. A control method of a laundry treating machine comprising an accommodating space receiving laundry therein, the control method includes selecting one of at least two sanitary courses to sanitize objects, and supplying steam to the objects, with controlling a temperature of the accommodating space and a steam supplying time to maintain a temperature of the object to be at a predetermined sanitary standard temperature or higher for a predetermined sanitary standard time according to the selected course. According to the control method of the present invention, steam may be supplied appropriately according to the load amount of the laundry treating machine such that damage of laundry fabric may be prevented, sanitizing, or sterilizing the laundry.

摘要翻译： 公开了其控制方法。 一种衣物处理机的控制方法，包括：容纳空间，其中容纳衣物，所述控制方法包括：选择至少两个卫生路线中的一个以消毒物体，并向物体供应蒸汽，同时控制容纳空间的温度和蒸汽 提供时间，以根据所选择的路线将物体的温度保持在预定卫生标准温度或更高的预定卫生标准时间。 根据本发明的控制方法，可以根据衣物处理机的负载量适当地供给蒸汽，从而可以防止洗衣布的损坏，消毒或消毒衣物。

公开(公告)号：US20090151189A1

公开(公告)日：2009-06-18

申请号：US12219948

申请日：2008-07-30

申请人： Jung Wook Moon ,  Dae Yun Park ,  Sog Kie Hong ,  Jong Seok Kim ,  Seung Gyu Ryu ,  Hye Yong Park ,  Chang Gyu Choi ,  Dong Won Kim

发明人： Jung Wook Moon ,  Dae Yun Park ,  Sog Kie Hong ,  Jong Seok Kim ,  Seung Gyu Ryu ,  Hye Yong Park ,  Chang Gyu Choi ,  Dong Won Kim

IPC分类号： F26B25/08

CPC分类号： D06F58/10 ,  D06F58/24

摘要： A clothes treatment apparatus that treats clothes into a condition suitable to wear is disclosed. The clothes treatment apparatus includes a cabinet, a receiving space defined in the cabinet for receiving clothes, an air supply device for removing moisture from the air so as to provide a dried air to the receiving space, and a fan assembly configured to circulate the dried air in the receiving space and to discharge condensed water generated in the fan assembly to the outside.

摘要翻译： 公开了一种将衣物处理成适合穿着的衣物的衣服处理装置。 衣物处理装置包括：机壳，容纳在橱柜中用于接收衣物的容纳空间;空气供应装置，用于从空气中除去水分，以便向容纳空间提供干燥的空气;以及风扇组件，其构造成使干燥 在接收空间中的空气并且将在风扇组件中产生的冷凝水排出到外部。

公开(公告)号：US20090120903A1

公开(公告)日：2009-05-14

申请号：US12073311

申请日：2008-03-04

申请人： Chan Wook Baik ,  Seog Woo Hong ,  Jong Seok Kim ,  Seong Chan Jun ,  Sun Il Kim

发明人： Chan Wook Baik ,  Seog Woo Hong ,  Jong Seok Kim ,  Seong Chan Jun ,  Sun Il Kim

IPC分类号： G03F7/20 ,  B44C1/22

CPC分类号： H03B28/00 ,  B44C1/227 ,  H01L23/66 ,  H01L2223/6627 ,  H01L2924/0002 ,  H01L2924/1903 ,  H01L2924/00

摘要： A method of multi-stage substrate etching is provided. The method comprises the steps of: forming a first mask pattern on one surface of a first substrate; forming a hole by etching the first substrate using the first mask pattern as an etching mask; forming a second mask pattern on one surface of a second substrate; forming a hole by etching the second substrate to a predetermined depth using the second mask pattern as an etching mask; bonding the first and second substrates together such that an etched surface of the first substrate faces an etched surface of the second substrate; forming a third mask pattern on the second substrate; and forming a hole passing through the second substrate by etching the second substrate using the third mask pattern as an etching mask, whereby it is prevented the occurrence of a radius of curvature in the bottom surface and the overhang structure occurring on a step surface, so that etching quality is improved, a precise bonding between the substrates is obtained using the alignment key positioned on each substrate, and a multi-layer process is carried out.

摘要翻译： 提供了一种多级衬底蚀刻的方法。 该方法包括以下步骤：在第一衬底的一个表面上形成第一掩模图案; 通过使用第一掩模图案蚀刻第一衬底作为蚀刻掩模来形成孔; 在第二基板的一个表面上形成第二掩模图案; 通过使用第二掩模图案作为蚀刻掩模，将第二基板蚀刻到预定深度来形成孔; 将第一和第二基板接合在一起，使得第一基板的蚀刻表面面对第二基板的蚀刻表面; 在所述第二基板上形成第三掩模图案; 并且通过使用第三掩模图案作为蚀刻掩模蚀刻第二基板来形成通过第二基板的孔，从而防止在台面上出现底面和突出结构中的曲率半径的出现，因此 改善了蚀刻质量，使用位于每个衬底上的对准键来获得衬底之间的精确结合，并且进行多层工艺。

公开(公告)号：US20080155758A1

公开(公告)日：2008-07-03

申请号：US11965047

申请日：2007-12-27

申请人： Sog Kie HONG ,  Jong Seok Kim

发明人： Sog Kie HONG ,  Jong Seok Kim

IPC分类号： D06F33/00

CPC分类号： D06F58/10

摘要： A clothes treating apparatus and a method for controlling the same can prevent a safety incident caused by steam and hot air and improve the safety of the clothes treating apparatus by preventing the door from being opened and closed randomly in the steam step and the dry step.

摘要翻译： 衣物处理装置及其控制方法可以防止蒸汽和热空气引起的安全事故，并且通过在蒸汽步骤和干燥步骤中防止门被无意地打开和关闭来提高衣物处理装置的安全性。

公开(公告)号：US09010158B2

公开(公告)日：2015-04-21

申请号：US12461658

申请日：2009-08-19

申请人： Hea Kyung Yoo ,  Jong Seok Kim ,  Sung Min Kim ,  Sog Kie Hong

发明人： Hea Kyung Yoo ,  Jong Seok Kim ,  Sung Min Kim ,  Sog Kie Hong

IPC分类号： D06F37/00 ,  D06F58/10 ,  D06F73/02

CPC分类号： D06F58/10 ,  D06F73/02

摘要： A fabric treatment apparatus is provided. The fabric treatment apparatus includes a treatment room which can receive and hold clothes; a motor which generates a rotational force; an eccentric unit which is rotated eccentrically by the rotational force generated by the motor; a contact unit which converts the rotating motion of the eccentric unit into a reciprocating motion; a clothes rack which is disposed in the treatment room and is coupled to the contact unit so as to move reciprocally in a linear path, and on which a number of hangers can be hung; and a heating unit which supplies at least one of hot air and steam into the treatment room.

摘要翻译： 提供了一种织物处理装置。 该织物处理装置包括可以接收和保持衣物的治疗室; 产生旋转力的马达; 由电动机产生的旋转力偏心旋转的偏心单元; 接触单元，其将偏心单元的旋转运动转换为往复运动; 衣架，其设置在治疗室中并且联接到接触单元以在线性路径中往复运动，并且可以悬挂多个衣架; 以及将热风和蒸汽中的至少一种供应到处理室中的加热单元。

公开(公告)号：US08621763B2

公开(公告)日：2014-01-07

申请号：US12461654

申请日：2009-08-19

申请人： Dae Yun Park ,  Jong Seok Kim ,  Dong Won Kim ,  Sog Kie Hong

发明人： Dae Yun Park ,  Jong Seok Kim ,  Dong Won Kim ,  Sog Kie Hong

IPC分类号： F26B25/06 ,  F26B25/08

CPC分类号： D06F58/203 ,  D06F58/12

摘要： A fabric treatment apparatus is provided. The fabric treatment apparatus includes a treatment room adapted to receive laundry to be treated; a rack disposed in the treatment room, and adapted to support a plurality of hangers to hang the laundry; one or more electromagnets to apply attraction and repulsion to the clothes rack; and a heating unit adapted to supply at least one of hot air and steam into the treatment room.

摘要翻译： 提供了一种织物处理装置。 织物处理装置包括适于接收被处理衣物的处理室; 设置在所述治疗室中的并且适于支撑多个衣架以悬挂衣物的搁架; 一个或多个电磁铁，用于对衣架进行吸引和排斥; 以及适于将热空气和蒸汽中的至少一种供应到所述治疗室中的加热单元。

公开(公告)号：US08563076B2

公开(公告)日：2013-10-22

申请号：US12222444

申请日：2008-08-08

申请人： Chan Wook Baik ,  Jong Seok Kim ,  Sun Il Kim ,  Young Mok Son

发明人： Chan Wook Baik ,  Jong Seok Kim ,  Sun Il Kim ,  Young Mok Son

IPC分类号： B32B3/10

CPC分类号： C23C14/16 ,  C23C14/022 ,  C23C14/5806 ,  H01L21/30655 ,  H01L2924/0002 ,  Y10T428/24917 ,  H01L2924/00

摘要： Provided are a substrate structure and method of forming the same. The method of forming the substrate structure may include etching a substrate to form an etched portion having a vertical surface, forming a diffusion material layer on the whole substrate or in part of the substrate; annealing the diffusion material layer to form a seed layer diffused downward toward the surface of the etched portion, and forming a metal layer on the seed layer. Accordingly, surface characteristics of the etched portion of the substrate may be enhanced by the seed layer, and therefore, a metal layer with improved adhesion and a uniform thickness may be formed on the vertical surface of the etched portion.

公开(公告)号：US20130207093A1

公开(公告)日：2013-08-15

申请号：US13808477

申请日：2011-07-07

申请人： Kwang Jin Jeong ,  Min Soo Kang ,  Jong Seok Kim ,  Hyun Jee Yoo ,  Yoon Gyung Cho

发明人： Kwang Jin Jeong ,  Min Soo Kang ,  Jong Seok Kim ,  Hyun Jee Yoo ,  Yoon Gyung Cho

IPC分类号： H01L51/52

CPC分类号： H01L51/5253 ,  H01L51/5243 ,  H01L51/5246 ,  H05B33/04

摘要： Provided is an organic light emitting diode including an organic light-emitting part including a first electrode, an organic material layer having a light-emitting layer, and a second electrode, and an encapsulating layer included on an entire top surface of the organic light-emitting part. Here, the encapsulating layer has a structure in which at least two of a water barrier film, a glass cap, a metal foil and a conductive film are stacked. Accordingly, the diode may have excellent water and oxygen barrier effects, and deterioration of the diode or running failure may be prevented.

摘要翻译： 本发明提供一种有机发光二极管，其包括具有第一电极，具有发光层的有机材料层和第二电极的有机发光部，以及包含在有机发光层的整个上表面上的封装层， 发射部分。 这里，封装层具有层叠防水膜，玻璃帽，金属箔和导电膜中的至少两个的结构。 因此，二极管可以具有优异的水和氧阻隔效应，并且可以防止二极管的劣化或运行故障。