SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD
    81.
    发明申请
    SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD 有权
    基板保持器,平面设备和器件制造方法

    公开(公告)号:US20150092168A1

    公开(公告)日:2015-04-02

    申请号:US14563792

    申请日:2014-12-08

    Abstract: A substrate holder for use in a lithographic apparatus. The substrate holder comprises a main body, a plurality of burls and a heater and/or a temperature sensor. The main body has a surface. The plurality of burls project from the surface and have end surfaces to support a substrate. The heater and/or temperature sensor is provided on the main body surface. The substrate holder is configured such that when a substrate is supported on the end surfaces, a thermal conductance between the heater and/or temperature sensor and the substrate is greater than a thermal conductance between the heater and/or temperature sensor and the main body surface.

    Abstract translation: 用于光刻设备的衬底保持器。 衬底保持器包括主体,多个毛刺和加热器和/或温度传感器。 主体有一个表面。 多个毛刺从表面突出并具有端面以支撑基底。 加热器和/或温度传感器设置在主体表面上。 衬底保持器构造成使得当衬底被支撑在端表面上时,加热器和/或温度传感器和衬底之间的热导率大于加热器和/或温度传感器与主体表面之间的热导率 。

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