Chemicals mixing container with offset communicating holes
    81.
    发明授权
    Chemicals mixing container with offset communicating holes 有权
    化学品混合容器带有通孔

    公开(公告)号:US08074794B2

    公开(公告)日:2011-12-13

    申请号:US12673615

    申请日:2007-08-16

    CPC classification number: B65D81/3211 B65D81/3255 B65D83/0005

    Abstract: A chemicals mixing container (1), which allows two kinds of chemicals, a liquid material (2) and a powder material (4), to be stored therein in isolation from each other and which allows the liquid material (2) and the powder material (4) to be mixed together. The mixing container includes: a first cylinder (6); a first piston (7) which is fitted in the first cylinder (6) to define a first internal space (3); a second cylinder (8) which is connected to the first cylinder (6) or the first piston (7) so as to be rotationally slidable thereon; and a second piston (9) which is fitted in the second cylinder to define a second internal space (5). The second cylinder (8) and the first cylinder (6) or the first piston (7) to which the second cylinder (8) is connected have communicating holes (13, 14) formed in their mutual sliding surfaces at positions, respectively, eccentric relative to a rotation axis X. The first internal space (3) and the second internal space (5) are communicated with or isolated from each other depending on a rotational sliding angle between the second cylinder (8) and the first cylinder (6) or the first piston (7) to which the second cylinder (8) is connected.

    Abstract translation: 一种化学品混合容器(1),其允许两种化学物质,液体材料(2)和粉末材料(4)彼此隔离地存储在其中,并且允许液体材料(2)和粉末 材料(4)混合在一起。 混合容器包括:第一气缸(6); 第一活塞(7),其装配在所述第一气缸(6)中以限定第一内部空间(3); 与第一气缸(6)或第一活塞(7)连接以便可旋转地滑动的第二气缸(8) 以及第二活塞(9),其配合在所述第二气缸中以限定第二内部空间(5)。 连接有第二气缸(8)的第二气缸(8)和第一气缸(6)或第一活塞(7)具有形成在它们的相互滑动表面中的位置处的连通孔(13,14),分别位于偏心 相对于旋转轴线X.第一内部空间(3)和第二内部空间(5)根据第二气缸(8)和第一气缸(6)之间的旋转滑动角度彼此连通或隔离, 或第二气缸(8)连接到的第一活塞(7)。

    Process cartridge with image carrier supporting structure for use in an image forming apparatus
    82.
    发明授权
    Process cartridge with image carrier supporting structure for use in an image forming apparatus 有权
    具有用于图像形成装置的图像载体支撑结构的处理盒

    公开(公告)号:US07546064B2

    公开(公告)日:2009-06-09

    申请号:US11520684

    申请日:2006-09-14

    CPC classification number: G03G21/181 G03G21/1828 G03G2221/1606 G03G2221/183

    Abstract: A process cartridge and an image carrier supporter for use in an image forming apparatus. The image carrier supporter temporarily fixes an image carrier inside a process cartridge of an image forming apparatus. The image carrier supporter includes a penetration shaft, and first and second fixing members. The penetration shaft includes first and second ends, and penetrates through a center throughhole of the image carrier. The first and second fixing members are provided at the first and second ends, respectively, of the penetration shaft, and are configured to closely contact a circumferential inner surface of the image carrier and a frame of a process cartridge, respectively. The process cartridge is configured to be attachable to and detachable from the image forming apparatus, and includes a frame, the image carrier, the image carrier supporter, and a process mechanism configured to form an image on the image carrier.

    Abstract translation: 一种用于图像形成装置的处理盒和图像载体支架。 图像载体支持者将图像载体临时固定在图像形成装置的处理盒内。 图像载体支撑件包括穿透轴,以及第一和第二固定构件。 穿透轴包括第一端和第二端,并穿过图像载体的中心通孔。 第一和第二固定构件分别设置在穿透轴的第一端和第二端处,并且分别被配置成紧密地接触图像载体的周向内表面和处理盒的框架。 处理盒被配置为可附接到图像形成装置并且可以从图像形成装置拆卸,并且包括框架,图像载体,图像载体支撑件以及被配置为在图像载体上形成图像的处理机构。

    Substrate processing apparatus
    83.
    发明授权
    Substrate processing apparatus 有权
    基板加工装置

    公开(公告)号:US07491662B2

    公开(公告)日:2009-02-17

    申请号:US10590521

    申请日:2005-05-12

    Applicant: Satoshi Takano

    Inventor: Satoshi Takano

    CPC classification number: H01L21/67745 Y10S414/139 Y10S414/14

    Abstract: Substrate processing with return processing is carried out efficiently by a substrate processing apparatus that continuously processes a plurality of substrates. The apparatus is equipped with a conveyor chamber constituting a substrate convey space, a plurality of process chambers in which substrate processing is carried out, a substrate conveying device provided in the conveyor chamber having a function of conveying substrates, and a substrate convey control device that controls the process of substrate conveyance by the substrate conveying device so that in a case in which after a substrate is continuously processed by two or more process chambers, the substrate is re-conveyed from the last process chamber to any of the two or more process chambers other than the last and return processing is implemented. In the re-conveyance, the substrate is conveyed to any of the process chambers after being temporarily retracted to a place other than a process chamber.

    Abstract translation: 通过连续处理多个基板的基板处理装置有效地进行具有返回处理的基板处理。 该装置配备有构成基板输送空间的输送室,进行基板处理的多个处理室,设置在具有输送基板的功能的输送室中的基板输送装置,以及基板输送控制装置, 控制由基板输送装置进行的基板输送的处理,使得在基板被两个或更多个处理室连续处理之后,将基板从最后一个处理室重新输送到两个或更多个处理中的任一个 实施除最后和返回处理之外的其他室。 在再输送中,将衬底暂时缩回到处理室以外的位置时,将衬底输送到任何处理室。

    Semiconductor manufacturing method, substrate processing method, and semiconductor manufacturing apparatus
    84.
    发明授权
    Semiconductor manufacturing method, substrate processing method, and semiconductor manufacturing apparatus 有权
    半导体制造方法,基板处理方法和半导体制造装置

    公开(公告)号:US06828235B2

    公开(公告)日:2004-12-07

    申请号:US09819690

    申请日:2001-03-29

    Applicant: Satoshi Takano

    Inventor: Satoshi Takano

    Abstract: It is an object of the present invention to adjust the transfer environment of a substrate in order to prevent contamination of the substrate surface by impurities. A semiconductor manufacturing apparatus comprises a load-lock chamber 1 in which substrate exchange with the outside is performed, a wafer process chamber 2 in which the wafer is subjected to a predetermined processing, and a transfer chamber 3 in which the wafer is transferred between the load-lock chamber 1 and the wafer process chamber 2. In a semiconductor manufacturing method in which this semiconductor manufacturing apparatus is used to treat a substrate, an inert gas (N2) is supplied to and exhausted from the load-lock chamber 1, the transfer chamber 3, and the wafer process chamber 2 while the substrate is being transferred from the load-lock chamber 1 to the wafer process chamber 2 through the transfer chamber 3, and the substrate transfer is carried out with a predetermined pressure maintained.

    Abstract translation: 本发明的目的是调整基片的转印环境,以防止杂质污染基片表面。 半导体制造装置包括:与外部进行基板交换的负载锁定室1,经受了规定处理的晶片处理室2;以及转印室3, 负载锁定室1和晶片处理室2.在将半导体制造装置用于处理基板的半导体制造方法中,向负载锁定室1供给惰性气体(N 2)并从负载锁定室1排出, 传输室3和晶片处理室2,同时基板通过传送室3从加载锁定室1传送到晶片处理室2,并且以保持预定压力的方式进行基板传送。

    Substrate processing apparatus and method for manufacturing semiconductor device
    85.
    发明授权
    Substrate processing apparatus and method for manufacturing semiconductor device 有权
    基板处理装置及半导体装置的制造方法

    公开(公告)号:US06744018B2

    公开(公告)日:2004-06-01

    申请号:US10259762

    申请日:2002-09-30

    Applicant: Satoshi Takano

    Inventor: Satoshi Takano

    CPC classification number: H01L21/67248

    Abstract: A substrate processing apparatus and a method for manufacturing semiconductor device can inhibit an elastic deformation of a substrate due to a temperature difference in a substrate surface during a substrate temperature raising process so that a substrate processing such as a film formation and the like can be performed in a temperature uniform state in a substrate surface. The substrate processing apparatus is adapted to heat a substrate 1 on a susceptor 2 by a division type resistance heating heater 3 which can perform an unequal heating in a substrate surface. Such a temperature deviation &Dgr;t in a substrate surface represented by: &Dgr;t≦350×EXP(−0.004×T), wherein T is a substrate temperature, is obtained that no warpage of the substrate 1 occurs in accordance with a temperature of the substrate 1 when heating. Heating of the substrate 1 is controlled by controlling the resistance heating heater 3 such that the temperature deviation in a surface of the substrate 1 heated by the resistance heating heater 3 is maintained within the above-noted &Dgr;t.

    Abstract translation: 基板处理装置和半导体装置的制造方法可以抑制由于衬底升温过程中的衬底表面的温度差引起的衬底的弹性变形,从而可以执行诸如成膜等的衬底处理 在基板表面的温度均匀状态。 基板处理装置适于通过分割型电阻加热器3加热基座2上的基板1,分割电阻加热器3可以在基板表面上执行不相等的加热。 获得由下式表示的基板表面中的这种温度偏差Deltat:其中T是基板温度,其在加热时根据基板1的温度不发生基板1的翘曲。 通过控制电阻加热器3来控制基板1的加热,使得由电阻加热加热器3加热的基板1的表面中的温度偏差保持在上述Deltat之内。

    Electromagnetic relay, joining structure for hinge spring and yoke in the electromagnetic relay, and flux penetration preventing structure

    公开(公告)号:US06265958B1

    公开(公告)日:2001-07-24

    申请号:US09632211

    申请日:2000-08-03

    CPC classification number: H01H50/023 H01H50/041 H01H50/28 H01H2050/446

    Abstract: An electromagnetic relay has an iron core, an armature, a coil wound around the iron core, a yoke, a hinge spring, and a joining structure. The yoke is fastened rigidly to the iron core and has an engaging hole and a fitting portion. The hinge spring is used to support the armature rotatably on the yoke, and the joining structure is used to join the hinge spring to the yoke in the electromagnetic relay. The hinge spring has a tongue and a dish-shaped portion, and the yoke has an engaging hole and a fitting portion for engaging with the tongue and the dish-shaped portion. The hinge spring is joined to the yoke by inserting and fitting the hinge spring into the yoke. This structure serves to simplify the process of assembling the hinge spring to the yoke and drastically reduce the number of assembling steps required. Further, in a flux penetration preventing structure of the electromagnetic relay, a coil bobbin is formed, integral with or separate from a base block, and a venting portion, for allowing air trapped in a center hole in the coil bobbin to be vented therethrough, is formed in an upper flange of the coil bobbin. Therefore, sealing work of the base block of the electromagnetic relay can be performed smoothly and pinhole-free sealing thereof can be provided.

    Image forming apparatus with provisions for supplying toner therein
    87.
    发明授权
    Image forming apparatus with provisions for supplying toner therein 失效
    具有用于在其中供应调色剂的装置的图像形成装置

    公开(公告)号:US5909609A

    公开(公告)日:1999-06-01

    申请号:US877558

    申请日:1997-06-17

    Abstract: An image forming apparatus includes a toner bank that is configured to hold a large-volume of toner that is ultimately used to develop a latent image formed on a latent image carrier. A developing apparatus develops the latent image into a visible image. The toner is supplied to the toner bank, which need not be located adjacent to the developing apparatus, using a mechanism that prevents the toner from becoming clogged while being transported to the developing apparatus from the toner bank. In the toner bank, more than one toner bottles are vertically set. The toner bottles are individually opened and closed at respective opening portions thereon with an opening/closing mechanism and are rotated so as to discharge toner therefrom. Toner discharged from the toner bottles is dropped into the toner bank and is supplied to a developing apparatus by a flexible toner delivering mechanism having a powder pump unit and a flexible toner supplying pipe.

    Abstract translation: 图像形成装置包括调色剂组,其被配置为保持最终用于显影形成在潜像载体上的潜像的大量调色剂。 显影装置将潜像显影成可见图像。 调色剂被提供给调色剂组,其不需要位于与显影装置相邻的位置,该机构防止调色剂在从调色剂组输送到显影装置时堵塞。 在墨粉盒中,多个墨粉瓶垂直放置。 调色剂瓶在打开/关闭机构的各自的开口部分上单独地打开和关闭,并被转动以从其中排出调色剂。 从调色剂瓶排出的调色剂落入调色剂组中,并通过具有粉末泵单元和柔性调色剂供应管的柔性调色剂输送机构供给到显影装置。

    Image transferring device for image forming equipment
    88.
    发明授权
    Image transferring device for image forming equipment 失效
    图像形成设备图像传送装置

    公开(公告)号:US5897241A

    公开(公告)日:1999-04-27

    申请号:US754766

    申请日:1996-11-20

    Abstract: An image transferring device incorporated in an image forming apparatus and capable of surely preventing a sheet from wrapping around a photoconductive element. The image transferring device includes a transfer belt contacting an image bearing member to form a nip portion and which is supported by rollers one which is made from insulating material. A contact electrode contacts the inner surface of the belt and is located downstream of the nip for applying a transfer bias to the belt. A power source is connected to the contact electrode. A discharge electrode is located downstream of the contact electrode for dissipating transfer charge on the belt. A controller controls the power source such that a relation: I.sub.1 -I.sub.2=I.sub.out is satisfied, where I.sub.1 is the transfer current, I.sub.2 is the feedback current flowing from the discharge electrode and I.sub.out is constant.

    Abstract translation: 一种图像转印装置,其结合在图像形成装置中并且能够可靠地防止片材缠绕在光电导元件周围。 图像转印装置包括与图像承载部件接触以形成夹持部分并由由绝缘材料制成的辊支撑的转印带。 接触电极接触带的内表面并且位于辊隙的下游,用于向带施加转印偏压。 电源连接到接触电极。 放电电极位于接触电极的下游,用于消散带上的转移电荷。 控制器控制电源,使得满足以下关系:I1-I2 = Iout,其中I1是转移电流,I2是从放电电极流出的反馈电流,Iout是恒定的。

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