公开(公告)号：US06777160B2

公开(公告)日：2004-08-17

申请号：US10093411

申请日：2002-03-11

申请人： Kenichiro Sato ,  Kunihiko Kodama

发明人： Kenichiro Sato ,  Kunihiko Kodama

IPC分类号： G03F7004

CPC分类号： G03F7/0045 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/115 ,  Y10S430/122

摘要： A positive-working resist composition comprising (A) a specific resin which has an aliphatic cyclic hydrocarbon group and enhances in the dissolution rate in an alkaline developing solution by an action of an acid, and (B) a specific compound generating an acid by irradiation of actinic ray or radiation. The composition is excellent in the resolving power and the exposure margin, and can be suitably used for micro-photofabrication using far ultraviolet rays, particularly ArF eximer laser beams.

摘要翻译： 一种正性抗蚀剂组合物，其包含（A）具有脂族环状烃基的特定树脂，并且通过酸的作用在碱性显影液中的溶解速度提高，（B）通过照射产生酸的特定化合物 的光化射线或辐射。 该组合物的分辨能力和曝光余量优异，并且可以适用于使用远紫外线，特别是ArF准分子激光束的微光制造。

公开(公告)号：US06727039B2

公开(公告)日：2004-04-27

申请号：US09960343

申请日：2001-09-24

申请人： Kenichiro Sato

发明人： Kenichiro Sato

IPC分类号： G03F7004

CPC分类号： G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： A positive photoresist composition comprises (A) a resin containing a specific repeating structural unit such as norbornene structure, the resin being capable of increasing the solution velocity in an alkali developer by the action of acid; and (B) a compound capable of generating an acid by irradiation with one of an actinic ray and radiation.

摘要翻译： 正型光致抗蚀剂组合物包含（A）含有特定重复结构单元如降冰片烯结构的树脂，该树脂能够通过酸的作用增加碱显影剂中的溶液速度; 和（B）能够通过用光化射线和辐射中的一种照射产生酸的化合物。

公开(公告)号：US06692884B2

公开(公告)日：2004-02-17

申请号：US10116137

申请日：2002-04-05

申请人： Toru Fujimori ,  Kunihiko Kodama ,  Kenichiro Sato ,  Toshiaki Aoai

发明人： Toru Fujimori ,  Kunihiko Kodama ,  Kenichiro Sato ,  Toshiaki Aoai

IPC分类号： G03F7004

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  Y10S430/106

摘要： A positive photoresist composition comprises: a compound capable of generating an acid upon irradiation with an actinic ray or a radiation, in which the compound contains (A1) a sulfonate compound of a sulfonium, and (A2) a sulfonate compound of an N-hydroxyimide or a disulfonyldiazomethane compound; and a resin capable of decomposing by the action of an acid to increase the solubility in an alkali developing solution, in which the resin contains a repeating unit having a specific lactone structure.

摘要翻译： 正型光致抗蚀剂组合物包括：在光化学射线或辐射照射时能够产生酸的化合物，其中该化合物含有（A1）锍磺酸盐化合物，和（A2）N-羟基酰亚胺的磺酸盐化合物 或二磺酰基重氮甲烷化合物; 以及能够通过酸的作用分解以增加在碱性显影液中的溶解度的树脂，其中树脂含有具有特定内酯结构的重复单元。

公开(公告)号：US06596458B1

公开(公告)日：2003-07-22

申请号：US09563436

申请日：2000-05-03

申请人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai ,  Yasumasa Kawabe

发明人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai ,  Yasumasa Kawabe

IPC分类号： G03F7039

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  Y10S430/111

摘要： Disclosed is a positive-working photoresist composition having reduced development defects, and excellent in resist pattern profiles and in the resolving power of contact holes, which comprises (i) a compound generating an acid by irradiation of active light or radiation, and (ii) a resin containing repeating units of at least one kind selected from the group consisting of (a) repeating units having alkali-soluble groups each protected with at least one group selected from the group consisting of groups containing alicyclic hydrocarbon structures represented by specific general formulas (pI) to (pVI), (b) repeating units represented by specific general formula (II) and (c) repeating units represented by specific general formulas (III-a) to (III-d), and decomposed by the action of an acid to increase the solubility of the resin into an alkali.

摘要翻译： 公开了具有减少的显影缺陷，抗蚀剂图案轮廓和接触孔分辨能力优异的正性光致抗蚀剂组合物，其包括（i）通过活性光或辐射的照射产生酸的化合物，和（ii） 含有重复单元的树脂，所述重复单元选自（a）具有碱溶性基团的重复单元，各自被至少一个选自由特定通式表示的脂环族烃结构的基团所选择的基团保护的基团 pI）至（pVI），（b）由特定通式（II）表示的重复单元和（c）由特定通式（III-a）至（III-d）表示的重复单元，并通过 酸以增加树脂在碱中的溶解度。

公开(公告)号：US06544715B2

公开(公告)日：2003-04-08

申请号：US09492848

申请日：2000-01-27

申请人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai

发明人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai

IPC分类号： G03C173

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115

摘要： A positive photoresist composition for far ultraviolet ray exposure improved in standard developing solution suitability, good in defocus latitude depended on line pitch of a resist pattern formed and excellent in sensitivity to a light source of shorter wavelength, which comprises (i) a compound capable of generating an acid by irradiation of actinic light or radiation; and (ii) a resin containing (a) repeating units each having an alkali-soluble group protected with at least one specific group containing an alicyclic hydrocarbon structure, (b) repeating units having, for example, lactone rings, and (c) repeating units derived from (meth)acrylic acid, the content of the repeating units of (c) being from 5 mol % to 18 mol % based on the total repeating units of the resin, and the resin being decomposable by action of an acid to increase its solubility in an alkali solution.

公开(公告)号：US06528229B2

公开(公告)日：2003-03-04

申请号：US09789823

申请日：2001-02-22

申请人： Kenichiro Sato

发明人： Kenichiro Sato

IPC分类号： G03F7016

CPC分类号： G03F7/075 ,  G03F7/0045 ,  G03F7/0758 ,  Y10S430/106

摘要： Provided is a positive photoresist composition which comprises (A) a resin which contains a repeating unit represented by formula (I) shown below and a repeating unit represented by formula (II) shown below and whose solubility in an alkaline developing solution increases by the action of an acid and (B) a compound which generates an acid upon irradiation with an actinic ray or radiation, wherein R1, R2 and R3 each independently represents an alkyl group, a haloalkyl group, a halogen atom, an alkoxy group, a trialkylsilyl group or a trialkylsilyloxy group; and n represents 0 or 1, wherein M represents an atomic group necessary for forming an alicyclic structure, which may be substituted, together with the connected two carbon atoms (C—C); and R11 and R12 each independently represents a hydrogen atom, a cyano group, a halogen atom or an alkyl group which may be substituted.

摘要翻译： 提供一种正性光致抗蚀剂组合物，其包含（A）含有下述式（I）表示的重复单元的树脂和由下述式（II）表示的重复单元，其在碱性显影液中的溶解度增加， 的酸和（B）在用光化射线或辐射照射时产生酸的化合物，其中R1，R2和R3各自独立地表示烷基，卤代烷基，卤素原子，烷氧基，三烷基甲硅烷基 或三烷基甲硅烷氧基; 并且n表示0或1，其中M表示与所连接的两个碳原子（C-C）一起形成可被取代的脂环族结构所必需的原子团; R 11和R 12各自独立地表示氢原子，氰基，卤素原子或可以被取代的烷基。

公开(公告)号：US06506535B1

公开(公告)日：2003-01-14

申请号：US09698221

申请日：2000-10-30

申请人： Kazuyoshi Mizutani ,  Kenichiro Sato ,  Kunihiko Kodama

发明人： Kazuyoshi Mizutani ,  Kenichiro Sato ,  Kunihiko Kodama

IPC分类号： G03C172

CPC分类号： G03F7/0758 ,  G03F7/0045 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106

摘要： Disclosed is a positive working photoresist composition comprising an acid-decomposable polymer containing at least a repeating unit represented by the following formula (I) and at least either one repeating unit represented by the following formula (IIa) or (IIb), and also disclosed is a positive working photoresist composition comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, (B) an acid-decomposable polymer containing at least a repeating unit represented by the following formula (I) and at least either one repeating unit represented by the following formula (IIa) or (IIb), (C) at least one solvent capable of dissolving the components (A) and (B), (D) an organic basic compound and (E) at least one surfactant selected from fluorine-containing surfactants, silicon-containing surfactants and nonionic surfactants:

摘要翻译： 公开了一种正性光致抗蚀剂组合物，其包含至少含有由下式（I）表示的重复单元和至少一种由下式（IIa）或（IIb）表示的重复单元的酸可分解聚合物，并且还公开 是一种正性光致抗蚀剂组合物，其包含（A）在用光化射线或辐射照射时能够产生酸的化合物，（B）至少含有由下式（I）表示的重复单元的酸可分解聚合物和至少 由下式（IIa）或（IIb）表示的一个重复单元，（C）至少一种能够溶解组分（A）和（B）的溶剂，（D）有机碱性化合物和（E） 一种选自含氟表面活性剂，含硅表面活性剂和非离子表面活性剂的表面活性剂：

公开(公告)号：US06490509B1

公开(公告)日：2002-12-03

申请号：US09856046

申请日：2001-05-17

申请人： Kenichiro Sato ,  Masaaki Takahashi ,  Hiroshi Ito

发明人： Kenichiro Sato ,  Masaaki Takahashi ,  Hiroshi Ito

IPC分类号： G06F1700

CPC分类号： G06F9/4812 ,  G06F9/461

摘要： The present invention provides a multi-task system which can suppress the increase of required volume of RAM and which enables a multiplex interruption, and a car controlling unit utilizing that system. A memory area (RAM) utilized in executing a processing is divided into a task area 50 for carrying out a task processing and an interrupt area 60 for carrying out an interrupt processing. An interrupt level is given to the interrupt processing in accordance with its priority. The interrupt area is prepared so that the number thereof is same as that of the interrupt level. This system can suppress the increase of memory areas to be consumed as the interrupt area and can guarantee that all interrupt processings are operated.

摘要翻译： 本发明提供一种多任务系统，其可以抑制RAM的所需体积的增加，并且能够实现多路复用中断，以及利用该系统的轿厢控制单元。 在执行处理中使用的存储区域（RAM）被划分为用于执行任务处理的任务区域50和用于执行中断处理的中断区域60。 根据其优先级给予中断处理中断级别。 准备中断区域，使其数量与中断级别相同。 该系统可以抑制作为中断区域消耗的存储区域的增加，并且可以保证所有中断处理都被操作。

公开(公告)号：US06410204B1

公开(公告)日：2002-06-25

申请号：US09669907

申请日：2000-09-27

申请人： Kunihiko Kodama ,  Kenichiro Sato ,  Toshiaki Aoai

发明人： Kunihiko Kodama ,  Kenichiro Sato ,  Toshiaki Aoai

IPC分类号： G03F7004

CPC分类号： G03F7/0395 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/122

摘要： A positive photoresist composition comprising (A) a compound which generates a sulfonic acid having naphthalene structure by the irradiation with actinic rays of a wavelength of 220 nm or less or radiation, and (B) a resin whose solubility in an alkali developing solution increases by the action of an acid is disclosed.

摘要翻译： 一种正型光致抗蚀剂组合物，其包含（A）通过用波长为220nm以下的光化射线照射或辐射而产生具有萘结构的磺酸的化合物，和（B）在碱性显影溶液中的溶解度增加的树脂 公开了酸的作用。

公开(公告)号：US06214517B1

公开(公告)日：2001-04-10

申请号：US09023801

申请日：1998-02-12

申请人： Kenichiro Sato ,  Toshiaki Aoai

发明人： Kenichiro Sato ,  Toshiaki Aoai

IPC分类号： G03F7004

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

摘要： A positive type photoresist composition suitable for light in the wavelength region of 170 nm to 220 nm, high in sensitivity, excellent in adhesion and giving a good resist pattern profile, which comprises a resin having an ester group represented by the following general formula [I] in its molecule and a compound generating an acid by irradiation of an active light ray or radiation: wherein R1 represents a hydrogen atom, an alkyl group or a cycloalkyl group; and R2 and R3, which may be the same or different, each represents a hydrogen atom, an alkyl group, a cycloalkyl group or —A—R4, and R2 and R3 may combine together to form a ring, wherein R4 represents a hydrogen atom, an alkyl group or a cycloalkyl group, R4 and R2 or R3 may combine together to form a ring, and A represents an oxygen atom or a sulfur atom.

摘要翻译： 一种适用于170nm至220nm波长区域的光的正型光致抗蚀剂组合物，其灵敏度高，粘附性优异，并且具有良好的抗蚀剂图案轮廓，其包含具有由以下通式[I ]和通过活性光线或辐射的照射产生酸的化合物：其中R1表示氢原子，烷基或环烷基; 和可以相同或不同的R 2和R 3各自表示氢原子，烷基，环烷基或-A-R 4，并且R 2和R 3可以结合在一起形成环，其中R 4表示氢原子 ，烷基或环烷基，R 4和R 2或R 3可以结合在一起形成环，A表示氧原子或硫原子。