Interferometric device for measurement of variations in length of a
sample under the influence of temperature
    1.
    发明授权
    Interferometric device for measurement of variations in length of a sample under the influence of temperature 失效
    用于在温度影响下测量样品长度变化的干涉仪

    公开(公告)号:US3930730A

    公开(公告)日:1976-01-06

    申请号:US394552

    申请日:1973-09-06

    IPC分类号: G01B9/02 G01N25/16

    CPC分类号: G01B9/02 G01N25/16

    摘要: An interferometric device is provided for measurement of the variations in length of a sample under the influence of temperature, the length of the sample being within a plane of reference and a plane of measurement defined by two plane terminal faces of the sample. The device comprises a source of monochromatic light, means to form parallel beams from the light source, a controllable temperature thermostatic enclosure containing a sample holder, a reflecting measurement surface joined to the plane of measurement for receiving one of the beams, a reflecting reference surface for receiving the other beam, a bearing face presented by the sample holder for the terminal reference face of the sample which is elastically applied against the bearing face, and support means for supporting the reflecting reference surface inside the enclosure and ensuring that the variation of distance between the two reflecting surfaces will always be equal to the variation in length of the sample when the temperature of the thermostatic enclosure is varied. The two beams reflected respectively by the two reflecting surfaces are caused to interfere, and a sensor observes and measures interference fringes.

    摘要翻译: 提供了一种用于测量在温度影响下样品长度变化的干涉测量装置,样品在参考平面内的长度以及由样品的两个平面终端面限定的测量平面。 该装置包括单色光源,用于形成来自光源的平行光束的装置,包含样本保持器的可控温度恒温壳体,连接到用于接收一个光束的测量平面的反射测量表面,反射参考表面 为了接收另一个光束,由样品保持器提供的用于被弹性地施加到支承面上的样品的端子基准面的支承面以及用于将反射基准表面支撑在外壳内的支撑装置,并确保距离的变化 当恒温箱的温度变化时,两个反射表面之间的长度总是等于样品长度的变化。 分别由两个反射表面反射的两个光束被干扰,传感器观察并测量干涉条纹。