PLASMA PROCESS AND REACTOR FOR TREATING METALLIC PIECES
    2.
    发明申请
    PLASMA PROCESS AND REACTOR FOR TREATING METALLIC PIECES 有权
    用于处理金属片的等离子体处理和反应器

    公开(公告)号:US20110108059A1

    公开(公告)日:2011-05-12

    申请号:US12737125

    申请日:2009-06-09

    IPC分类号: B08B13/00 H05H1/24 B08B7/00

    摘要: The plasma reactor defines a reaction chamber provided with a support for the metallic pieces and an anode-cathode system, and a heating means is mounted externally to said plasma reactor. The plasma process, for a cleaning operation, includes the steps of connecting the support to the grounded anode and the cathode to a negative potential of a power source; feeding an ionizable gaseous charge into the reaction chamber and heating the latter at vaporization temperatures of piece contaminants; applying an electrical discharge to the cathode; and providing the exhaustion of the gaseous charge and contaminants. A subsequent heat treatment includes the steps of: inverting the energization polarity of the anode-cathode system; feeding a new gaseous charge to the reaction chamber and maintaining it heated; applying an electrical discharge to the cathode; and exhausting the gaseous charge from the reaction chamber.

    摘要翻译: 等离子体反应器限定了设置有用于金属片的支撑件和阳极 - 阴极系统的反应室,并且加热装置安装在所述等离子体反应器的外部。 用于清洁操作的等离子体处理包括将支撑件与接地的阳极和阴极连接到电源的负电位的步骤; 将可电离的气态进料装入反应室中,并在片状污染物的蒸发温度下加热; 向阴极施加放电; 并提供气态电荷和污染物的耗尽。 随后的热处理包括以下步骤:反转阳极 - 阴极系统的通电极性; 向反应室中加入新的气态物质并保持其加热; 向阴极施加放电; 并从反应室中排出气体。