Abstract:
The invention disclosed teaches an arrow straightening machine which includes a nock or head alignment bearing attachment which allows for correction of any eccentricity or misaligmnent between the nock or head and the arrow shaft. The method discloses adhesively bonding the nock or head to the arrow shaft using the attachment device to align while the adhesive is in the unset condition.
Abstract:
Compounds of formula 1: ##STR1## wherein R.sub.1 is alkyl, cycloalkyl, aryl, aralkyl, heteroaryl, or heteroaralkyl, substituted with 0-3 substituents selected from lower alkyl, halo, hydroxy, lower alkoxy, amino, lower alkyl-amino, and nitro;R.sub.2 is hydroxy, amino, or lower alkoxy;R.sub.3 is H, lower alkyl, lower acyl, lower alkoxy-acyl, or amnino-acyl;R.sub.4 is H or lower alkyl; and pharmaceutically acceptable salts and esters thereof; are effective inhibitors of GSK3.
Abstract:
Apparatus for applying a continuous embossing pattern to webs of material such as paper or the like and a method for producing an embossing surface. The apparatus includes rollers which receive a web or webs of such material therebetween and removable embossing plates secured to the surface of the rollers and having an embossing surface for embossing the webs. The rollers are constructed such that they have magnetic properties whereby the embossing plates which are comprised of magnetically attracted material can be held against the roller surface. The plates are positioned in closely adjacent relationship with respect to each other such that they provide a continuous embossing pattern around the surface of the roller. The plates and the rollers also include mutually engaging registering means which permit the plates to be accurately aligned with respect to the roller surface. The plates can thus be readily removed or replaced in the event that they become worn or damaged or in the event that it is desirable to change the embossing pattern frequently. The embossing pattern can be formed in the surface of each of the embossing plates by means of a method of coating the plate surfaces with a photo-chemical resist material, laying a negative of the desired pattern over the photo-chemical coating, directing light through the negative to cause selective deterioration of the coating, and subjecting the plate to a caustic chemical, wash chemical, or etchant to etch the desired pattern into the surface of the plate. The plate may, if necessary, be further machined in order to increase the depth of the etching and to improve the definition and clarity of the embossing pattern.
Abstract:
Compounds of formula 1: wherein R1 is alkyl, cycloalkyl, aryl, aralkyl, heteroaryl, or heteroaralkyl, substituted with 0–3 substituents selected from lower alkyl, halo, hydroxy, lower alkoxy, amino, lower alkyl-amino, and nitro; R2 is hydroxy, amino, or lower alkoxy; R3 is H, lower alkyl, lower acyl, lower alkoxy-acyl, or amino-acyl; R4 is H or lower alkyl; and pharmaceutically acceptable salts and esters thereof; are effective inhibitors of GSK3.
Abstract translation:式1的化合物:其中R 1是被0-3个选自低级烷基,卤素,羟基,低级烷氧基,氨基,低级的取代基取代的烷基,环烷基,芳基,芳烷基,杂芳基或杂芳烷基 烷基 - 氨基和硝基; R 2是羟基,氨基或低级烷氧基; R 3是H,低级烷基,低级酰基,低级烷氧基 - 酰基或氨基 - 酰基; R 4是H或低级烷基; 及其药学上可接受的盐和酯; 是GSK3的有效抑制剂。