公开(公告)号：US4086870A

公开(公告)日：1978-05-02

申请号：US811732

申请日：1977-06-30

申请人： Benjamin John Canavello ,  Michael Hatzakis ,  Arthur Richard Siegel ,  Connell Watters

发明人： Benjamin John Canavello ,  Michael Hatzakis ,  Arthur Richard Siegel ,  Connell Watters

IPC分类号： C25D7/12 ,  B05C11/08 ,  B05D1/40 ,  G03F7/16 ,  H01L21/027 ,  H01L21/28

CPC分类号： G03F7/162 ,  B05C11/08

摘要： A resist spinning head for preventing photoresist, or electron and X-ray resist from flowing to the edge of the wafer when spin coating in a photoresist spinner, which includes the use of a tapered top plate having a knife-edge contact to the surface of the wafer so as to seal the top of the wafer at an outer ring and prevent resist from flowing under the top plate; whereby the resist is guided, during spinning, by the tapered top surface to the edge of the plate and off the head. The tapered top plate is pressed against the wafer and secured by a spring biasing means to a spinner motor shaft.

摘要翻译： {PG，1抗蚀纺丝头，用于防止光致抗蚀剂或电子和X射线抗蚀剂在光刻胶旋涂器中旋涂时流向晶片边缘，其中包括使用具有刀刃接触的锥形顶板 到晶片的表面，以便在外环处密封晶片的顶部，并防止抗蚀剂在顶板下方流动; 由此抗蚀剂在纺丝过程中被锥形顶表面引导到板的边缘并离开头部。 锥形顶板压靠在晶片上，并通过弹簧偏置装置固定到旋转电机轴上。