公开(公告)号：US20070185337A1

公开(公告)日：2007-08-09

申请号：US11596580

申请日：2005-05-25

Applicant: Seong-Jin Kim ,  Chung-woo Lim ,  Chang Boo ,  Jung-hoon Oh ,  Ki Kim ,  Jae Lee ,  Duk Won

Inventor： Seong-Jin Kim ,  Chung-woo Lim ,  Chang Boo ,  Jung-hoon Oh ,  Ki Kim ,  Jae Lee ,  Duk Won

IPC: C07D207/04

CPC classification number: C07D207/273

Abstract: A process for the preparation of chiral 4-hydroxy-2-oxo-1-pyrrolidine acetamide includes adding sodium cyanide together with citric acid to a solution of chiral epichlorohydrin to obtain chiral 3-chloro-2-hydroxypropionitrile by ring opening reaction of the chiral epichlorohydrin, reacting the obtained product with an alcohol containing hydrochloride gas to obtain chiral 4-chloro-3-hydroxybutyric acid ester, and reacting the obtained product in a presence of a base with glycinamide or with glycine ester accompanied by ammonolysis with ammonia to produce the targeted chiral 4-hydroxy-2-oxo-1-pyrrolidine acetamide.

Abstract translation: 手性4-羟基-2-氧代-1-吡咯烷乙酰胺的制备方法包括将氰化钠与柠檬酸一起加入到手性表氯醇的溶液中，以通过手性的开环反应获得手性3-氯-2-羟基丙腈 将得到的产物与含有盐酸气体的醇反应，得到手性4-氯-3-羟基丁酸酯，并使得到的产物在碱的存在下与甘氨酰胺或甘氨酸酯反应，伴随着氨的氨解，生成 靶向手性4-羟基-2-氧代-1-吡咯烷乙酰胺。

公开(公告)号：US06723595B2

公开(公告)日：2004-04-20

申请号：US10061704

申请日：2002-02-01

Applicant: Chang-Boo Park

Inventor： Chang-Boo Park

IPC: H01L218283

CPC classification number: C23C16/45531 ,  C23C16/4401

Abstract: The present invention discloses a method of fabricating a thin film in a chamber where a heater and a suscepter are located. The method includes the steps of disposing an object on the susceptor so as to form the thin film thereon; heating the object; a first sub-step of introducing a first gaseous reactant into the first chamber such that the first gaseous reactant is absorbed on the object to form an absorption layer; a second sub-step of introducing a second gaseous reactant into the first chamber such that the second gaseous reactant reacts with the absorption layer absorbed on the object; and a third sub-step of introducing a reducing gas into the first camber such that the reducing gas reduces by-products and impurities of the first and second gaseous reactants.

Abstract translation: 本发明公开了一种制造薄膜的方法，该方法是在一个加热器和一个夹持器所在的腔室中。 该方法包括在基座上设置物体以在其上形成薄膜的步骤; 加热物体; 将第一气态反应物引入第一室中的第一子步骤，使得第一气态反应物被吸收在物体上以形成吸收层; 将第二气态反应物引入第一室中的第二子步骤，使得第二气态反应物与吸收在物体上的吸收层反应; 以及将还原气体引入到第一弯度中的第三子步骤，使得还原气体减少第一和第二气态反应物的副产物和杂质。