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1.发明授权Acrylate-based compounds and photosensitive composition comprising the same 有权基于丙烯酸酯的化合物和包含它们的光敏组合物公开(公告)号：US08742005B2
公开(公告)日：2014-06-03
申请号：US13300055
申请日：2011-11-18
申请人： Keon Woo Lee , Sang Kyu Kwak , Changsoon Lee , Hyehyeon Kim
发明人： Keon Woo Lee , Sang Kyu Kwak , Changsoon Lee , Hyehyeon Kim
CPC分类号： C07C69/602 , C07C69/54 , C07C69/92 , C07C69/94 , C07C2603/24 , G03F7/027 , G03F7/032 , G03F7/033
摘要： The present invention relates to an acrylate-based compound that includes an organic acid having two or more acrylate groups and one or more phenolic acid structures in one molecule, and a photosensitive composition including the same. It is possible to shorten a developing time in a photolithography process without damaging photosensitivity by using the photosensitive composition according to the present invention.
摘要翻译： 本发明涉及一种包含一分子中具有两个或多个丙烯酸酯基和一个或多个酚酸结构的有机酸的含丙烯酸酯类化合物和包含它们的感光性组合物。 可以通过使用根据本发明的感光组合物缩短光刻工艺中的显影时间而不损害光敏性。
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2.发明申请ACRYLATE-BASED COMPOUNDS AND PHOTOSENSITIVE COMPOSITION COMPRISING THE SAME 有权基于丙烯酸酯的化合物和包含其的感光性组合物公开(公告)号：US20120156619A1
公开(公告)日：2012-06-21
申请号：US13300055
申请日：2011-11-18
申请人： Keon Woo LEE , Sang Kyu KWAK , Changsoon LEE , Hyehyeon KIM
发明人： Keon Woo LEE , Sang Kyu KWAK , Changsoon LEE , Hyehyeon KIM
IPC分类号： G03F7/032 , G03F7/033 , C07C69/94 , C07C69/602 , C07C69/88
CPC分类号： C07C69/602 , C07C69/54 , C07C69/92 , C07C69/94 , C07C2603/24 , G03F7/027 , G03F7/032 , G03F7/033
摘要： The present invention relates to an acrylate-based compound that includes an organic acid having two or more acrylate groups and one or more phenolic acid structures in one molecule, and a photosensitive composition including the same. It is possible to shorten a developing time in a photolithography process without damaging photosensitivity by using the photosensitive composition according to the present invention.
摘要翻译： 本发明涉及一种包含一分子中具有两个或多个丙烯酸酯基和一个或多个酚酸结构的有机酸的含丙烯酸酯类化合物和包含它们的感光性组合物。 可以通过使用根据本发明的感光组合物缩短光刻工艺中的显影时间而不损害光敏性。
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公开(公告)号：US09034561B2
公开(公告)日：2015-05-19
申请号：US13988469
申请日：2011-11-17
申请人： Keon Woo Lee , Sang Kyu Kwak , Changsoon Lee , Hyehyeon Kim
发明人： Keon Woo Lee , Sang Kyu Kwak , Changsoon Lee , Hyehyeon Kim
CPC分类号： G03F7/033 , G03F7/0007 , G03F7/027 , Y02P20/582
摘要： The present invention relates to a photosensitive composition including an acrylate-based compound having an adamantyl structure. It is possible to manufacture an organic thin film that is easily stripped without decreasing the strength of the thin film by using the photosensitive composition.
摘要翻译： 本发明涉及包含具有金刚烷基结构的丙烯酸酯类化合物的感光性组合物。 可以通过使用光敏组合物来制造容易剥离的有机薄膜而不降低薄膜的强度。
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公开(公告)号：US20130244182A1
公开(公告)日：2013-09-19
申请号：US13988469
申请日：2011-11-17
申请人： Keon Woo Lee , Sang Kyu Kwak , Changsoon Lee , Hyehyeon Kim
发明人： Keon Woo Lee , Sang Kyu Kwak , Changsoon Lee , Hyehyeon Kim
IPC分类号： G03F7/033
CPC分类号： G03F7/033 , G03F7/0007 , G03F7/027 , Y02P20/582
摘要： The present invention relates to a photosensitive composition including an acrylate-based compound having an adamantyl structure. It is possible to manufacture an organic thin film that is easily stripped without decreasing the strength of the thin film by using the photosensitive composition.
摘要翻译： 本发明涉及包含具有金刚烷基结构的丙烯酸酯类化合物的感光性组合物。 可以通过使用光敏组合物来制造容易剥离的有机薄膜而不降低薄膜的强度。
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