公开(公告)号：US20050155625A1

公开(公告)日：2005-07-21

申请号：US10761654

申请日：2004-01-20

申请人： Shiu-Ko Jangjian ,  Sheng-Wen Chen ,  Hung-Jui Chang ,  Chen-Liang Chang ,  Ying-Lang Wang

发明人： Shiu-Ko Jangjian ,  Sheng-Wen Chen ,  Hung-Jui Chang ,  Chen-Liang Chang ,  Ying-Lang Wang

IPC分类号： B08B7/00 ,  B08B7/02 ,  B08B9/00 ,  B08B9/08 ,  C23C16/44

CPC分类号： C23C16/4405 ,  B08B7/00

摘要： A method suitable for cleaning the interior surfaces of a process chamber is disclosed. The invention is particularly effective in removing silicon nitride and silicon dioxide residues from the interior surfaces of a chemical vapor deposition (CVD) chamber. The method includes reacting nitrous oxide (N2O) gas with nitrogen trifluoride (NF3) gas in a plasma to generate nitric oxide (NO) and fluoride (F) radicals. Due to the increased density of nitric oxide radicals generated from the nitrous oxide, the etch and removal rate of the residues on the interior surfaces of the chamber is enhanced. Consequently, the quantity of nitrogen trifluoride necessary to efficiently and expeditiously carry out the chamber cleaning process is reduced.

摘要翻译： 公开了一种适于清洁处理室内表面的方法。 本发明特别有效地从化学气相沉积（CVD）室的内表面去除氮化硅和二氧化硅残余物。 该方法包括在等离子体中使一氧化二氮（N 2 O 2 O）气体与三氟化氮（NF 3 N 3）气体反应以产生一氧化氮（NO）和氟化物（F）基团 。 由于由一氧化二氮产生的一氧化氮自由基的密度增加，腔室内表面上残留物的蚀刻和去除速度增强。 因此，有效且快速地进行室清洁处理所需的三氟化氮的量减少。

公开(公告)号：US06309096B1

公开(公告)日：2001-10-30

申请号：US09542848

申请日：2000-04-04

申请人： Chen-Liang Chang

发明人： Chen-Liang Chang

IPC分类号： B01F500

CPC分类号： G05D11/03 ,  B01F5/0077 ,  B01F5/008 ,  B01F5/0403 ,  B01F7/00916 ,  B01F15/005 ,  G05D23/1313

摘要： A valve structure is provided for destroying pressure difference between incoming fluids. The valve body includes two inlet passages and a merging passage that is communicated to an outlet. A pressure-balancing device is mounted in the merging passage and includes a shaft supported by two supports or end closures. Two bladed wheels are mounted to the shaft and may be impacted by the incoming fluids to thereby destroy the pressure difference between the incoming fluids.

摘要翻译： 提供了一种用于破坏进入流体之间的压力差的阀结构。 阀体包括两个入口通道和与出口连通的合流通道。 压力平衡装置安装在合流通道中，并包括由两个支撑件或端盖封闭的轴。 两个叶片轮安装在轴上并且可能被进入的流体撞击，从而破坏进入的流体之间的压力差。

公开(公告)号：US06209564B1

公开(公告)日：2001-04-03

申请号：US09433227

申请日：1999-11-04

申请人： Chen-Liang Chang

发明人： Chen-Liang Chang

IPC分类号： G05D11035

CPC分类号： G05D23/1313 ,  Y10T137/2516

摘要： A pressure difference adjusting device is provided for a valve having a first inlet for a first fluid of a first pressure, a second inlet for a second fluid of a second pressure not equal to the first pressure, and an outlet. The pressure difference adjusting device includes two rotatable elements that are mounted in a meeting area of the incoming fluids. The elements mesh with each other to drive each other when the elements are subjected to impact from the incoming fluids.

摘要翻译： 为具有第一压力的第一流体的第一入口和不等于第一压力的第二压力的第二流体的第二入口和出口设置压力差调节装置。 压力差调节装置包括安装在进入流体的会聚区域中的两个可旋转元件。 当元件受到来自流体的冲击时，元件彼此啮合以相互驱动。