公开(公告)号：US20140296607A1

公开(公告)日：2014-10-02

申请号：US14346880

申请日：2012-05-30

申请人： Colin Baptist ,  Claire Cahill ,  Matthew John Cousins ,  David Davis ,  Michelle Taylor Wilson ,  Christopher John Young

发明人： Colin Baptist ,  Claire Cahill ,  Matthew John Cousins ,  David Davis ,  Michelle Taylor Wilson ,  Christopher John Young

IPC分类号： B01D53/02 ,  C07C7/12 ,  B01D15/10

CPC分类号： B01D53/02 ,  B01D15/00 ,  B01D15/10 ,  B01D15/1871 ,  B01D2256/16 ,  B01D2256/24 ,  B01D2257/204 ,  B01D2257/2045 ,  B01D2257/206 ,  B01D2257/2064 ,  B01D2259/402 ,  B01D2259/414 ,  C01B7/0718 ,  C01B7/093 ,  C07C7/12 ,  Y02P20/154

摘要： A process for removing halogen compounds, particularly chlorine compounds, from a process fluid, includes the steps of (i) passing a process fluid containing hydrogen halide over a first sorbent to remove hydrogen halide and generate a hydrogen halide depleted process fluid and then, (ii) passing the hydrogen halide depleted process fluid over a second different sorbent to remove organic halide compounds therefrom. A purification system suitable for removing hydrogen halide and organic halide compounds from process fluids is also described.

摘要翻译： 从工艺流体中除去卤素化合物，特别是氯化合物的方法包括以下步骤：（i）将含有卤化氢的工艺流体通过第一吸附剂以除去卤化氢并产生卤化氢消耗的工艺流体，然后（ ii）将卤化氢消耗的工艺流体通过第二种不同的吸附剂以从其中除去有机卤化物。 还描述了适用于从工艺流体中除去卤化氢和有机卤化物的净化系统。

公开(公告)号：US10252211B2

公开(公告)日：2019-04-09

申请号：US14346880

申请日：2012-05-30

申请人： Colin Baptist ,  Claire Cahill ,  Matthew John Cousins ,  David Davis ,  Michelle Taylor Wilson ,  Christopher John Young

发明人： Colin Baptist ,  Claire Cahill ,  Matthew John Cousins ,  David Davis ,  Michelle Taylor Wilson ,  Christopher John Young

IPC分类号： B01D53/02 ,  C07C7/12 ,  B01D15/18 ,  B01D15/00 ,  C01B7/07 ,  C01B7/09 ,  B01D15/10

摘要： A process for removing halogen compounds, particularly chlorine compounds, from a process fluid, includes the steps of (i) passing a process fluid containing hydrogen halide over a first sorbent to remove hydrogen halide and generate a hydrogen halide depleted process fluid and then, (ii) passing the hydrogen halide depleted process fluid over a second different sorbent to remove organic halide compounds therefrom. A purification system suitable for removing hydrogen halide and organic halide compounds from process fluids is also described.