公开(公告)号：US20110229806A1

公开(公告)日：2011-09-22

申请号：US13054363

申请日：2009-07-16

申请人： Yuankun Lin ,  Karen Lozano ,  Ahmad Harb ,  Daniel Rodriguez Ponce

发明人： Yuankun Lin ,  Karen Lozano ,  Ahmad Harb ,  Daniel Rodriguez Ponce

IPC分类号： G03F1/00

CPC分类号： G03F7/70408 ,  B82Y20/00 ,  G02B6/1225 ,  G02B6/138 ,  G03F7/2032

摘要： A method of fabricating a two-layer phase mask comprises subjecting a photoresist material to two overlapping laser beams that create light and dark fringes in the overlapping beam regions. The photoresist can comprise a liquid crystal and a photo-sensitive material, including, for example, a photo-sensitive monomer and/or polymer. The two laser beams can be first directed towards one side of the photoresist. In the areas subjected to lighter fringes, the polymer molecules can link together and force the liquid crystal into the areas subjected to the darker fringes. This can leave an alternating pattern of linear strips of polymer-rich and liquid crystal-rich regions. The exposure time can be limited so that the strips are formed only partially through the thickness of the photoresist. The photoresist can be then rotated 90 degrees and the overlapping laser beams directed towards the opposite side of the photoresist. Alternating strips of polymer-rich and liquid crystal-rich regions can be formed that extend partially through the photoresist. These strips can be arranged orthogonally to the strips formed on the opposite side of the photoresist. The material in liquid crystal-rich regions can be washed out when the photoresist is developed. A two-layer, integrated phase mask can therefore be produced. Exemplary methods eliminate the need for complicated alignment techniques.

摘要翻译： 制造双层相位掩模的方法包括将光致抗蚀剂材料经受两个重叠的激光束，其在重叠光束区域中产生光和黑条纹。 光致抗蚀剂可以包括液晶和感光材料，包括例如光敏单体和/或聚合物。 两个激光束可以首先指向光致抗蚀剂的一侧。 在较浅条纹的区域中，聚合物分子可以连接在一起并将液晶强制到经受较暗条纹的区域中。 这可以留下富含聚合物和富含液晶的区域的线性条带的交替图案。 可以限制曝光时间，使得条仅部分地通过光致抗蚀剂的厚度形成。 然后光致抗蚀剂可以旋转90度，并且重叠的激光束指向光致抗蚀剂的相对侧。 可以形成富含聚合物和富含液晶的区域的交替条带，其部分地延伸穿过光致抗蚀剂。 这些条可以与形成在光致抗蚀剂的相反侧上的条带正交布置。 当光致抗蚀剂显影时，液晶丰富区域中的材料可以被洗掉。 因此可以制造两层集成的相位掩模。 示例性的方法消除了对复杂对准技术的需要。