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公开(公告)号:US06358430B1
公开(公告)日:2002-03-19
申请号:US09362251
申请日:1999-07-28
IPC分类号: B44C122
CPC分类号: H01L21/31111 , Y10S438/958
摘要: A method of etching a layer of electrical insulating material including a layer of strontium titanate on a surface of a semiconductor substrate. The layer of strontium titanate is immersed in a passivated etching solution including an acid and HF and focused light is directed onto the surface of the layer of strontium titanate at areas to be etched, so as to depassivate the passivated surface and to etch the layer of strontium titanate only at the surface receiving collimated light. In a preferred embodiment, the passivated etching solution includes HCl and less than 1000 ppm of HF.
摘要翻译: 一种在半导体衬底的表面上蚀刻包括钛酸锶层的电绝缘材料层的方法。 将钛酸锶层浸入包含酸和HF的钝化蚀刻溶液中,并将聚焦的光引导到钛酸锶层的待蚀刻区域的表面上,以钝化钝化表面并蚀刻 仅在表面接收准直光的钛酸锶。 在优选实施例中,钝化蚀刻溶液包括HCl和小于1000ppm的HF。
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公开(公告)号:US20140166086A1
公开(公告)日:2014-06-19
申请号:US14105828
申请日:2013-12-13
IPC分类号: H01L31/065
摘要: A magnetically polarized photonic device is provided. The magnetically polarized photonic device (100) includes substrate (102), an annihilation layer (106) and a graded band gap layer (142). The annihilation layer (106) is deposed on a surface (104) of substrate (102) with graded band gap layer (142) disposed on annihilation layer (106). Contacts (116, 128) are disposed on ends (146, 150) of magnetically polarized photonic device (100). A magnetic field (159) is applied to graded band gap layer (142) and annihilation layer (106) to drive charges to contacts (116, 128).
摘要翻译: 提供了磁极化光子器件。 磁偏振光子器件(100)包括衬底(102),湮灭层(106)和渐变带隙层(142)。 湮灭层(106)被放置在具有设置在湮灭层(106)上的渐变带隙层(142)的衬底(102)的表面(104)上。 触点(116,128)设置在磁极化光子器件(100)的端部(146,150)上。 将磁场(159)施加到渐变带隙层(142)和湮灭层(106),以驱动对触点(116,128)的电荷。
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