Method of Manufacturing an Optical System
    1.
    发明申请
    Method of Manufacturing an Optical System 审中-公开
    制造光学系统的方法

    公开(公告)号:US20130218533A1

    公开(公告)日:2013-08-22

    申请号:US13847841

    申请日:2013-03-20

    IPC分类号: G06F17/50

    摘要: A method of calculating an optical system (OS), the optical system (OS) being identified by a function (OF), the optical system (OS) having a first part (F1) defined by a first equation (EF1) and a second part (F2) defined by a second equation (EF2), the method performed by: a generating step (GEN), in which a virtual optical system (VOS) is used to generate a virtual function (VOF); a modification step (MOD), in which the virtual function (VOF) is modified so as obtain the function (OF); a calculation step (CAL), in which the second equation (EF2) is calculated from the function (OF), and the first equation (EF1). A method of manufacturing an optical system (OS) is also disclosed.

    摘要翻译: 一种计算光学系统(OS)的方法,所述光学系统(OS)由功能(OF)标识,所述光学系统(OS)具有由第一等式(EF1)定义的第一部分(F1)和第二等式 由第二等式(EF2)定义的部分(F2),通过以下步骤执行的方法:使用虚拟光学系统(VOS)来生成虚拟功能(VOF)的生成步骤(GEN) 修改步骤(MOD),其中虚拟功能(VOF)被修改以获得功能(OF); 计算步骤(CAL),其中根据函数(OF)计算第二等式(EF2)和第一等式(EF1)。 还公开了一种制造光学系统(OS)的方法。

    Method of manufacturing an optical system
    2.
    发明授权
    Method of manufacturing an optical system 有权
    制造光学系统的方法

    公开(公告)号:US08447573B2

    公开(公告)日:2013-05-21

    申请号:US11997359

    申请日:2006-08-01

    IPC分类号: G06F17/50

    摘要: The invention relates to a method of calculating an optical system (OS), the optical system (OS) being identified by a function (OF), the optical system (OS) comprising a first part (F1) defined by a first equation (EF1) and a second part (F2) defined by a second equation (EF2), the method comprising: —a generating step (GEN), in which a virtual optical system (VOS) is used to generate a virtual function (VOF); —a modification step (MOD), in which the virtual function (VOF) is modified so as obtain the function (OF); —a calculation step (CAL), in which the second equation (EF2) is calculated from the function (OF), and the first equation (EF1). The invention relates also to a method of manufacturing an optical system (OS).

    摘要翻译: 本发明涉及一种计算光学系统(OS)的方法,所述光学系统(OS)由功能(OF)标识,所述光学系统(OS)包括由第一等式(EF1)定义的第一部分(F1) )和由第二等式(EF2)定义的第二部分(F2),所述方法包括: - 生成步骤(GEN),其中使用虚拟光学系统(VOS)来生成虚拟功能(VOF); - 修改步骤(MOD),其中虚拟函数(VOF)被修改以获得函数(OF); - 计算步骤(CAL),其中根据函数(OF)和第一等式(EF1)计算第二等式(EF2)。 本发明还涉及一种制造光学系统(OS)的方法。

    Method of Manufacturing an Optical System
    3.
    发明申请
    Method of Manufacturing an Optical System 有权
    制造光学系统的方法

    公开(公告)号:US20090125137A1

    公开(公告)日:2009-05-14

    申请号:US11997359

    申请日:2006-08-01

    IPC分类号: G06F19/00 G06F17/10

    摘要: The invention relates to a method of calculating an optical system (OS), the optical system (OS) being identified by a function (OF), the optical system (OS) comprising a first part (F1) defined by a first equation (EF1) and a second part (F2) defined by a second equation (EF2), the method comprising: —a generating step (GEN), in which a virtual optical system (VOS) is used to generate a virtual function (VOF); —a modification step (MOD), in which the virtual function (VOF) is modified so as obtain the function (OF); —a calculation step (CAL), in which the second equation (EF2) is calculated from the function (OF), and the first equation (EF1). The invention relates also to a method of manufacturing an optical system (OS).

    摘要翻译: 本发明涉及一种计算光学系统(OS)的方法,所述光学系统(OS)由功能(OF)标识,所述光学系统(OS)包括由第一等式(EF1)定义的第一部分(F1) )和由第二等式(EF2)定义的第二部分(F2),所述方法包括: - 生成步骤(GEN),其中使用虚拟光学系统(VOS)来生成虚拟功能(VOF); - 修改步骤(MOD),其中虚拟函数(VOF)被修改以获得函数(OF); - 计算步骤(CAL),其中根据函数(OF)和第一等式(EF1)计算第二等式(EF2)。 本发明还涉及一种制造光学系统(OS)的方法。

    Fringe deflectometry apparatus and method
    4.
    发明授权
    Fringe deflectometry apparatus and method 失效
    边缘偏转装置及方法

    公开(公告)号:US6043885A

    公开(公告)日:2000-03-28

    申请号:US4226

    申请日:1998-01-08

    IPC分类号: G01M11/02 G01B9/02 G01B9/00

    CPC分类号: G01M11/0271 G01M11/0242

    摘要: A fringe deflectometry apparatus illuminates an optical component to be measured using radiation with a known wavefront, deflects the radiation after it has been reflected or transmitted by the optical component to be measured, and materializes a reference ray. Transverse aberration of the reference ray after reflection or transmission by the optical component is measured. A deflectometry method using the apparatus enables an absolute phase reference to be provided.

    摘要翻译: 边缘偏转测量装置利用具有已知波前的辐射来照射要测量的光学部件,在被被测量的光学部件反射或透射之后偏转辐射,并实现参考光线。 测量由光学部件反射或透射后的参考光线的横向像差。 使用该装置的偏转方法能够提供绝对相位参考。