公开(公告)号：US07311503B2

公开(公告)日：2007-12-25

申请号：US11235713

申请日：2005-09-26

Applicant: Harald T. Van Lintel ,  Didier Maillefer ,  Stephan Gamper

Inventor： Harald T. Van Lintel ,  Didier Maillefer ,  Stephan Gamper

IPC: F04B17/00

CPC classification number: F04B43/043 ,  A61M5/14244

Abstract: The fluid-flow device (100) of the invention comprises a stack (30) covered by a closure wafer (20), said stack (30) comprising a support wafer (36), a layer of insulating material (34), and a silicon layer (32). The closure wafer (20) and/or said silicon layer (32) are machined so as to define a cavity (38) between said closure wafer (20) and said silicon layer (32), said support wafer (36) has at least one duct (102) passing right through it, said layer of insulating material (34) presenting at least one zone (35) that is entirely free of material placed at least in line with said duct (102) so as to co-operate with said cavity (38) to define a moving member (40) in said silicon layer (32), the moving member being suitable under the pressure of liquid in said cavity (38) for reversibly moving towards said support wafer (36) until contact is made between said moving member (40) and said support wafer (36).

Abstract translation: 本发明的流体流动装置（100）包括由封闭晶片（20）覆盖的堆叠（30），所述堆叠（30）包括支撑晶片（36），绝缘材料层（34）和 硅层（32）。 加工闭合晶片（20）和/或所述硅层（32）以便在所述封闭晶片（20）和所述硅层（32）之间限定空腔（38），所述支撑晶片（36）至少具有 所述绝缘材料层（34）呈现出至少一个区域（35），所述至少一个区域（35）完全不含有至少与所述管道（102）成直线的材料，以便与 所述腔（38）在所述硅层（32）中限定移动构件（40），所述移动构件在所述空腔（38）内的液体压力下适合于可逆地朝向所述支撑晶片（36）移动，直到接触为止 在所述移动构件（40）和所述支撑晶片（36）之间形成。

公开(公告)号：US06237619B1

公开(公告)日：2001-05-29

申请号：US09269816

申请日：1999-04-01

Applicant: Didier Maillefer ,  Philippe Renaud

Inventor： Didier Maillefer ,  Philippe Renaud

IPC: C23F100

CPC classification number: F16K99/0001 ,  F04B43/043 ,  F04B53/1067 ,  F05C2201/0403 ,  F05C2201/0418 ,  F05C2201/046 ,  F15C5/00 ,  F16K99/0009 ,  F16K99/0015 ,  F16K99/0034 ,  F16K99/0057 ,  F16K2099/0074 ,  F16K2099/008 ,  F16K2099/0086 ,  F16K2099/0094 ,  Y10T137/0491 ,  Y10T137/7895

Abstract: The invention relates to a micro-machined fluid-flow device (10) comprising a substrate (12) possessing a flow duct (14), a deformable thin layer (18) such a pump membrane or a valve-forming membrane. According to the invention, the thin layer (18) is a rolled metal sheet, preferably made of titanium, and connected to the substrate (12) in the zone (20) overlapping the flow duct, by an anodic bonding. The invention is applicable to making a valve.

Abstract translation: 本发明涉及一种微加工流体流动装置（10），其包括具有流动管道（14）的基底（12），诸如泵膜或阀形成膜的可变形薄层（18）。 根据本发明，薄层（18）是优选由钛制成的轧制金属板，并通过阳极接合连接到与流动管道重叠的区域（20）中的基板（12）。 本发明适用于制造阀门。

公开(公告)号：US06390791B1

公开(公告)日：2002-05-21

申请号：US09486111

申请日：2000-02-18

Applicant: Didier Maillefer ,  Harald Van Lintel

Inventor： Didier Maillefer ,  Harald Van Lintel

IPC: F04B1700

CPC classification number: F04B43/043 ,  F04B53/1067

Abstract: The invention relates to a micropump (10; 100) comprising at least a first plate (12), a second plate (20), an intermediate plate (18), a pump chamber (24), and inlet and outlet control members (28, 30). According to the invention, said inlet control member (28) is a non-return valve situated in the major portion of the thickness of said intermediate plate (18), being made of a moving member (40) and a membrane-forming portion (42) situated close to one of the plates (12, 20), connecting said moving member (40) to the remainder of said intermediate plate (18) and, by its resilience, enabling said valve (28) to move between a closed position and an open position, said moving member (40) having an orifice of limited volume passing therethrough.

Abstract translation: 本发明涉及至少包括第一板（12），第二板（20），中间板（18），泵室（24）和入口和出口控制构件（28）的微型泵（10; 100） ，30）。 根据本发明，所述入口控制构件（28）是位于所述中间板（18）的厚度的主要部分中的止回阀，其由移动构件（40）和膜形成部分 42），其接近所述板（12,20）中的一个，将所述移动构件（40）连接到所述中间板（18）的其余部分，并且通过其弹性使所述阀（28）能够在闭合位置 和打开位置，所述移动构件（40）具有经过其的有限体积的孔口。

公开(公告)号：US06309189B1

公开(公告)日：2001-10-30

申请号：US09331952

申请日：1999-06-28

Applicant: Gilles Rey-Mermet ,  Harald Van Lintel ,  Didier Maillefer

Inventor： Gilles Rey-Mermet ,  Harald Van Lintel ,  Didier Maillefer

IPC: F04B1700

CPC classification number: F04B43/046

Abstract: A micropump including at least one main plate (1), at least one upper plate (2), and a middle plate (3) arranged between the other two plates (1, 2) and forming a pumping chamber (4) that is connected with at least one inlet of the micropump and at least one outlet of the micropump. The pumping chamber comprises a movable wall (5) machined into the middle plate (3); the upper plate is equipped with at least one opening (12) linking a cavity (8) with at least one portion of the movable wall (5). Actuation devices (6, 7, 13) attached to the free surface of the upper plate (2) are used to shift said movable wall (5) in order to bring about a periodic variation in the volume of the pumping chamber (4). According to the invention, the actuating devices (6, 7, 13) are formed by an actuating plate (7) of a material which can be machined so as to define a movable area (11) and said cavity (8). A (sic) intermediate part (13), formed from the upper plate (2), is fastened to the actuating plate (7) (sic) so as to establish contact with the movable wall (5).

Abstract translation: 一种微型泵，包括至少一个主板（1），至少一个上板（2）和设置在其它两个板（1,2）之间的中间板（3），并形成连接的泵送室（4） 具有微型泵的至少一个入口和微型泵的至少一个出口。 泵送室包括机加工成中间板（3）的可动壁（5）。 上板装备有将空腔（8）与活动壁（5）的至少一部分连接起来的至少一个开口（12）。 附接到上板（2）的自由表面的致动装置（6,7,13）用于移动所述可移动壁（5），以引起泵送室（4）的体积的周期性变化。 根据本发明，致动装置（6,7,13）由能够加工以限定可移动区域（11）和所述空腔（8）的材料的致动板（7）形成。 由上板（2）形成的中间部分（13）被紧固到致动板（7）上，以与可动壁（5）建立接触。

公开(公告)号：US20060027523A1

公开(公告)日：2006-02-09

申请号：US11235713

申请日：2005-09-26

Applicant: Harald Van Lintel ,  Didier Maillefer ,  Stephan Gamper

Inventor： Harald Van Lintel ,  Didier Maillefer ,  Stephan Gamper

IPC: C23F1/00 ,  B44C1/22

CPC classification number: F04B43/043 ,  A61M5/14244

Abstract: The fluid-flow device (100) of the invention comprises a stack (30) covered by a closure wafer (20), said stack (30) comprising a support wafer (36), a layer of insulating material (34), and a silicon layer (32). The closure wafer (20) and/or said silicon layer (32) are machined so as to define a cavity (38) between said closure wafer (20) and said silicon layer (32), said support wafer (36) has at least one duct (102) passing right through it, said layer of insulating material (34) presenting at least one zone (35) that is entirely free of material placed at least in line with said duct (102) so as to co-operate with said cavity (38) to define a moving member (40) in said silicon layer (32), the moving member being suitable under the pressure of liquid in said cavity (38) for reversibly moving towards said support wafer (36) until contact is made between said moving member (40) and said support wafer (36).

公开(公告)号：US07005078B2

公开(公告)日：2006-02-28

申请号：US10296466

申请日：2001-05-25

Applicant: Harald T. Van Lintel ,  Didier Maillefer ,  Stephan Gamper

Inventor： Harald T. Van Lintel ,  Didier Maillefer ,  Stephan Gamper

IPC: G01D15/00

CPC classification number: F04B43/043 ,  A61M5/14244

Abstract: The fluid-flow device (100) of the invention comprises a stack (30) covered by a closure wafer (20), said stack (30) comprising a support wafer (36), a layer of insulating material (34), and a silicon layer (32). The closure wafer (20) and/or said silicon layer (32) are machined so as to define a cavity (38) between said closure wafer (20) and said silicon layer (32), said support wafer (36) has at least one duct (102) passing right through it, said layer of insulating material (34) presenting at least one zone (35) that is entirely free of material placed at least in line with said duct (102) so as to co-operate with said cavity (38) to define a moving member (40) in said silicon layer (32), the moving member being suitable under the pressure of liquid in said cavity (38) for reversibly moving towards said support wafer (36) until contact is made between said moving member (40) and said support wafer (36).

Abstract translation: 本发明的流体流动装置（100）包括由封闭晶片（20）覆盖的堆叠（30），所述堆叠（30）包括支撑晶片（36），绝缘材料层（34）和 硅层（32）。 加工闭合晶片（20）和/或所述硅层（32）以便在所述封闭晶片（20）和所述硅层（32）之间限定空腔（38），所述支撑晶片（36）至少具有 所述绝缘材料层（34）呈现出至少一个区域（35），所述至少一个区域（35）完全不含有至少与所述管道（102）成直线的材料，以便与 所述腔（38）在所述硅层（32）中限定移动构件（40），所述移动构件在所述空腔（38）内的液体压力下适于可逆地朝所述支撑晶片（36）移动，直到接触为止 在所述移动构件（40）和所述支撑晶片（36）之间形成。