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公开(公告)号：US20200379356A1
公开(公告)日：2020-12-03
申请号：US16995191
申请日：2020-08-17
摘要： A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.
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公开(公告)号：US20190155167A1
公开(公告)日：2019-05-23
申请号：US16260101
申请日：2019-01-28
CPC分类号： G03F7/70191 , B82Y10/00 , G02B6/04 , G02B6/10 , G03F7/20 , G03F7/2051 , G03F7/70 , G03F7/70058 , G03F7/7015 , G03F7/70275 , G03F7/70291 , G03F7/70325 , G03F7/70366 , G11B7/00
摘要： A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures.
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公开(公告)号：US20180173106A1
公开(公告)日：2018-06-21
申请号：US15894839
申请日：2018-02-12
CPC分类号： G03F7/70191 , B82Y10/00 , G02B6/04 , G02B6/10 , G03F7/20 , G03F7/2051 , G03F7/70 , G03F7/70058 , G03F7/7015 , G03F7/70275 , G03F7/70291 , G03F7/70325 , G03F7/70366 , G11B7/00
摘要： An super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation directed onto a medium using plasmonic structures, and in particular using plasmonic structures using specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures.
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公开(公告)号：US20160377987A1
公开(公告)日：2016-12-29
申请号：US15262800
申请日：2016-09-12
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , B82Y10/00 , G02B6/04 , G02B6/10 , G03F7/20 , G03F7/2051 , G03F7/70 , G03F7/70058 , G03F7/7015 , G03F7/70275 , G03F7/70291 , G03F7/70325 , G03F7/70366 , G11B7/00
摘要： An super-resolution system for nano-patterning is disclosed, comprising an optical printing head that enables a super-resolution lithographic exposures compatible with conventional optical lithographic processes. The super-resolution exposures are carried out using light directed onto a medium using plasmonic structures, and in particular using plasmonic structures using specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures.
摘要翻译： 公开了一种用于纳米图案化的超分辨率系统，其包括能够进行与常规光学光刻工艺兼容的超分辨率光刻曝光的光学打印头。 超分辨率曝光使用等离子体激元结构的光引导到介质上进行，特别是使用使用特殊设计的超分辨率孔径的等离子体结构，其中“弓领”和“C孔”是其示例。 这些特别设计的孔径在近场传播模式中产生小而明亮的图像。 包括这些孔的阵列的打印头保持紧靠于用于图案化的介质。 在一些实施例中，提供数据处理系统以将要构图的数据重新解释为用于驱动多个单独通道和多次曝光的一组调制信号。
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公开(公告)号：US09229330B2
公开(公告)日：2016-01-05
申请号：US14339411
申请日：2014-08-26
CPC分类号： G03F7/70191 , B82Y10/00 , G02B6/04 , G02B6/10 , G03F7/20 , G03F7/2051 , G03F7/70 , G03F7/70058 , G03F7/7015 , G03F7/70275 , G03F7/70291 , G03F7/70325 , G03F7/70366 , G11B7/00
摘要： A method of performing nanolithography is disclosed, comprising the use of a system having a plasmonic writing head that enables super-resolution exposures of a material. The super-resolution exposures are carried out using light directed onto a material using plasmonic structures, and in particular using plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. In one embodiment, a writing head comprising an array of these apertures is held in close proximity to a lithography material. A data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures. A detector system using light of a second wavelength to monitor the exposures is also provided.
摘要翻译： 公开了一种执行纳米光刻的方法，其包括使用具有等离子体激发写头的系统，其能够进行材料的超分辨率曝光。 超分辨率曝光使用等离子体激元结构的材料进行导向，特别是使用具有特别设计的超分辨率孔径的等离子体结构，其中“弓领”和“C”孔径是其示例。 这些特别设计的孔径在近场传播模式中产生小而明亮的图像。 在一个实施例中，包括这些孔的阵列的写头保持在非常靠近光刻材料的位置。 提供数据处理系统以将要构图的数据重新解释为用于驱动多个单独通道和多次曝光的一组调制信号。 还提供了使用第二波长的光来监测曝光的检测器系统。
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公开(公告)号：US20150042971A1
公开(公告)日：2015-02-12
申请号：US14493344
申请日：2014-09-22
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , B82Y10/00 , G02B6/04 , G02B6/10 , G03F7/20 , G03F7/2051 , G03F7/70 , G03F7/70058 , G03F7/7015 , G03F7/70275 , G03F7/70291 , G03F7/70325 , G03F7/70366 , G11B7/00
摘要： A method of performing nanolithography is disclosed, comprising use of an optical printing head that enables a super-resolution lithographic exposures compatible with conventional optical lithographic processes. The super-resolution exposures are carried out using light directed onto a data recording medium using plasmonic structures, and in particular using plasmonic structures using specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to a data recording medium. A data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures.
摘要翻译： 公开了一种执行纳米光刻的方法，包括使用能够进行与常规光刻工艺兼容的超分辨率光刻曝光的光学打印头。 超分辨率曝光使用等离子体结构的导向到数据记录介质的光进行，特别是使用特殊设计的超分辨率孔的等离子体结构，其中“弓领”和“C孔”是其中的例子 。 这些特别设计的孔径在近场传播模式中产生小而明亮的图像。 包括这些孔的阵列的打印头保持在靠近数据记录介质的位置。 提供数据处理系统以将要构图的数据重新解释为用于驱动多个单独通道和多次曝光的一组调制信号。
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公开(公告)号：US08507880B2
公开(公告)日：2013-08-13
申请号：US13507121
申请日：2012-06-04
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , B82Y10/00 , G02B6/04 , G02B6/10 , G03F7/20 , G03F7/2051 , G03F7/70 , G03F7/70058 , G03F7/7015 , G03F7/70275 , G03F7/70291 , G03F7/70325 , G03F7/70366 , G11B7/00
摘要： A method for fabricating waveguides comprising nano-apertures for illumination of sub-resolution exposures is presented. In particular, the end of a waveguide, such as an optical fiber, is coated with a material, such as an electrically conducting metal or a semiconductor. This material is then selectively removed through the process of ion milling, creating an aperture in the material at the end of the waveguide. Under normal conditions, if the aperture is smaller than the wavelength of light in the waveguide, there is little or no transmission through the aperture. However, with the appropriate selection of materials and aperture geometry, for example a metallic conducting coating and sub-wavelength “C-shaped” or “bow-tie” aperture, enhancement of transmission of light through the aperture can be achieved, allowing effective illumination of sub-resolution spots using the ion-milled aperture. This can be used in a nanolithography system incorporating waveguide illuminators as well.
摘要翻译： 提出了一种用于制造包括用于照射次分辨率曝光的纳米孔径的波导的方法。 特别地，诸如光纤的波导的端部涂覆有诸如导电金属或半导体的材料。 然后通过离子铣削的过程选择性地去除该材料，在波导端部的材料中产生孔。 在正常条件下，如果孔径小于波导管中的光的波长，则通过孔径很少或没有透射。 然而，通过适当选择的材料和孔径几何形状，例如金属导电涂层和亚波长“C”形或“弓形”孔，可以实现通过孔径的光的透过增强，从而允许有效照明 使用离子研磨孔径的次分辨率点。 这也可以用在包含波导照明器的纳米光刻系统中。
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公开(公告)号：US07989783B2
公开(公告)日：2011-08-02
申请号：US12584578
申请日：2009-09-05
IPC分类号： G02B6/04
CPC分类号： G03F7/70191 , B82Y10/00 , G02B6/04 , G02B6/10 , G03F7/20 , G03F7/2051 , G03F7/70 , G03F7/70058 , G03F7/7015 , G03F7/70275 , G03F7/70291 , G03F7/70325 , G03F7/70366 , G11B7/00
摘要： A nanolithography system comprising a novel optical printing head suitable for high throughput nanolithography. This optical head enables a super-resolution lithographic exposure tool that is otherwise compatible with the optical lithographic process infrastructure. The exposing light is transmitted through specially designed super-resolution apertures, of which the “C-aperture” is one example, that create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to the wafer to be exposed. In one embodiment, an illumination source is divided into parallel channels that illuminate each of the apertures. Each of these channels can be individually modulated to provide the appropriate exposure for the particular location on the wafer corresponding to the current position of the aperture. A data processing system is provided to re-interpret the layout data into a modulation pattern used to drive the individual channels. In one embodiment of the invention, the exposure head remains stationary while the material to be exposed rotates beneath the head. Such an embodiment comprises a circular data fracturing system to process the layout data to determine the correct modulation pattern.
摘要翻译： 一种纳米光刻系统，包括适用于高通量纳米光刻的新型光学打印头。 该光学头能够实现与光学光刻工艺基础设施兼容的超分辨率光刻曝光工具。 曝光光通过专门设计的超分辨率孔径传播，其中“C孔径”是一个例子，其在近场传输图案中产生小而明亮的图像。 包括这些孔的阵列的打印头被保持紧靠待暴露的晶片。 在一个实施例中，照明源被分成照亮每个孔的平行通道。 可以对这些通道中的每一个进行单独调制，以对与孔的当前位置相对应的晶片上的特定位置提供适当的曝光。 提供数据处理系统以将布局数据重新解释为用于驱动各个通道的调制模式。 在本发明的一个实施例中，曝光头保持静止，而待曝光的材料在头部下方旋转。 这种实施例包括用于处理布局数据以确定正确的调制模式的圆形数据压缩系统。
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公开(公告)号：US07160103B2
公开(公告)日：2007-01-09
申请号：US10803181
申请日：2004-03-16
申请人： Gary Lee Butler , Chad William Hendrickson , Robb Edward Bennett , Stephen G. Smith , Thomas J. Bachinski , David Charles Lyons
发明人： Gary Lee Butler , Chad William Hendrickson , Robb Edward Bennett , Stephen G. Smith , Thomas J. Bachinski , David Charles Lyons
摘要： An apparatus and method for modifying the appearance of a flame to maximize the size of the flame for a given amount of fuel, increase a burn rate efficiency of the flame, or change the shape of the flame. The shape and size of the flame may be modified by applying a secondary source of fluid to the flame. The secondary source of fluid may cause turbulent fluid flow within the combustion chamber enclosure in which the flame is produced to change the appearance of the flame. The secondary source of fluid may be generated by a blower or fan and may include, for example, a source of fresh combustion air, additional flammable gas such as natural gas, or other fluid additives for enhancement of the flame color, shape, and size.
摘要翻译： 一种用于改变火焰外观以使给定量燃料的火焰尺寸最大化的装置和方法，提高火焰的燃烧速率效率或改变火焰的形状。 火焰的形状和尺寸可以通过将二次流体源施加到火焰来改变。 二次流体源可能导致在燃烧室外壳内产生湍流流体，其中产生火焰以改变火焰的外观。 流体的二次源可以由鼓风机或风扇产生，并且可以包括例如新鲜燃烧空气源，附加的可燃气体（例如天然气）或用于增强火焰颜色，形状和尺寸的其它流体添加剂 。
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公开(公告)号：US07056113B2
公开(公告)日：2006-06-06
申请号：US10803535
申请日：2004-03-17
IPC分类号： F23D14/28
摘要： A gas light assembly including a stand member having a recessed portion sized to receive a fuel container. The recessed portion is accessible through an opening of the stand member. A panel member is coupled to the stand member and movable between a closed position covering the recessed portion and an open position wherein the recessed portion is accessible for inserting or removing the fuel container.
摘要翻译： 一种气体灯组件，包括具有尺寸设置成容纳燃料容器的凹部的支架构件。 凹部可通过支架构件的开口而接近。 面板构件联接到支架构件并且可在覆盖凹部的关闭位置和打开位置之间移动，其中凹部可接近以插入或移除燃料容器。
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