公开(公告)号：US20240069452A1

公开(公告)日：2024-02-29

申请号：US18261150

申请日：2022-02-01

申请人： Applied Materials, Inc.

发明人： Assaf KIDRON ,  Jiawei SHI ,  Liang-Yuh CHEN ,  Che-Kai CHANG ,  Tsu-Hui YANG ,  Nimrod SMITH ,  Grant WANG ,  Preston FUNG ,  Vasuman Ghanapaati SRIRANGARAJAN ,  Davidi KALIR ,  Rudolf C. BRUNNER

IPC分类号： G03F7/00

CPC分类号： G03F7/70833 ,  G03F7/70275 ,  G03F7/709

摘要： Embodiments of the present disclosure relate to projection stabilization systems and maskless lithography systems having projection stabilization systems. The projection stabilization system compensates for propagating vibrations that move image projection systems (IRS's). The IRS's are in a processing positon prior to operation of the maskless lithography process. One or more stiffeners are coupled to the IPS. The one or more stiffeners apply pressure to flexures coupled to each stiffener. The flexures are coupled to the IPS to provide stabilization to the IPS during the operations of the maskless lithography process. For example, the one or more of stiffeners protect the IPS from vibrations that propagate through the system during operation.

公开(公告)号：US11880139B2

公开(公告)日：2024-01-23

申请号：US17482992

申请日：2021-09-23

申请人： Honeywell Federal Manufacturing & Technologies, LLC

发明人： Barbara Diane Young ,  Steven James Sedlock ,  Gregory Layton Lane, Jr. ,  Kevin Christopher Ledden

IPC分类号： G03F7/00 ,  H01L21/027

CPC分类号： G03F7/70275 ,  G03F7/70008 ,  G03F7/70575 ,  H01L21/0274

摘要： A system, device, and method for imparting or transferring a geometric pattern on the surface of a substrate. The device comprises, a housing forming at least a partially enclosed space, a light source body comprising an array of light emitters, a base disposed below the light source body and configured for supporting the substrate having a photoresist layer thereon, and a controller for activating a predetermined number of individual light emitters corresponding to the predetermined geometric pattern. Each individual light emitter within the array of light emitters is selectively activatable to emit a light. The array of light emitters comprises a plurality of light-emitting diodes, a plurality of quantum dots, or both.

公开(公告)号：US20180196353A1

公开(公告)日：2018-07-12

申请号：US15498361

申请日：2017-04-26

申请人： National Tsing Hua University

发明人： Chien-Chung Fu ,  Che-Wei Yeh

IPC分类号： G03F7/20 ,  G02B27/12 ,  G02B21/26 ,  G02B21/00 ,  G02B3/00

CPC分类号： G02B3/0056 ,  G02B3/0043 ,  G02B21/0016 ,  G02B26/0833 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70375

摘要： A multiphoton absorption lithography processing system configured to process a to-be-processed object is provided. The multiphoton absorption lithography processing system includes a femtosecond laser source, a spatial light modulator, a lens array, and a stage. The femtosecond laser source is configured to emit a femtosecond laser beam. The spatial light modulator is configured to modulate the femtosecond laser beam into a modulated beam. The lens array is disposed on a path of the modulated beam and configured to divide the modulated beam into a plurality of sub-beams and make the sub-beams be focused on a plurality of position points at the to-be-processed object, so as to form multiphoton absorption reaction at the position points. The stage is configured to carry the to-be-processed object. The stage and the lens array are adapted to move with respect to each other in three dimensions.

公开(公告)号：US20180095258A1

公开(公告)日：2018-04-05

申请号：US15654766

申请日：2017-07-20

申请人： Carl Zeiss SMT GmbH

发明人： Alexander Epple ,  Vladimir Kamenov ,  Toralf Gruner ,  Thomas Schicketanz

IPC分类号： G02B17/08 ,  G03F7/20 ,  G02B1/11

CPC分类号： G02B17/0892 ,  G02B1/11 ,  G02B17/08 ,  G02B17/0896 ,  G03F7/70 ,  G03F7/70225 ,  G03F7/70275

摘要： A method of providing a catadioptric projection includes: providing a first partial objective for imaging an object field onto a first real intermediate image; providing a second partial objective for imaging the first real intermediate image onto a second real intermediate image, in which the second partial objective includes a concave mirror; providing a third partial objective for imaging the second intermediate image onto an image field, the third partial objective including an aperture stop; providing a first folding mirror and a second folding mirror; and providing an antireflection coating onto a surface of at least one lens that is directly adjacent to the concave mirror or that is separate from the concave mirror by a single lens, in which the antireflection coating is designed to have reflectivity of less than 0.2% for a wavelength between 150 nm and 250 nm and for an angle-of-incidence range between 0° and 30°.

公开(公告)号：US20180017781A1

公开(公告)日：2018-01-18

申请号：US15639600

申请日：2017-06-30

申请人： Applied Materials, Inc.

发明人： David MARKLE ,  Thomas L. LAIDIG ,  Timothy N. THOMAS ,  Jang Fung CHEN

IPC分类号： G02B26/08 ,  G02B5/04 ,  G03F7/20 ,  G02F1/13

CPC分类号： G02B26/0833 ,  G02B5/04 ,  G02F1/1303 ,  G03F7/7015 ,  G03F7/70275

摘要： The present disclosure generally relates to frustrated cube assemblies having a first prism having a first surface, a second surface, and a first hypotenuse, and a second prism having a third surface, a fourth surface, and a second hypotenuse. The first and second hypotenuses face one another and are separated by an air gap. The frustrated cube assembly may include a tilted mirror adjacent the second surface. The second surface may be a reflective diffraction grating. Light is reflected to a digital micromirror device (DMD) adjacent to the frustrated cube assembly at a normal incidence angle and through an image projection system along a single optical axis. The direction of light incident on the DMD is such that light reflected from an “on” mirror is directed along the normal to the DMD surface and at 45 degrees to the hypotenuses. The input and output light beams are parallel.

公开(公告)号：US20180003952A1

公开(公告)日：2018-01-04

申请号：US15542281

申请日：2016-01-06

申请人： V TECHNOLOGY CO., LTD.

发明人： Michinobu Mizumura

IPC分类号： G02B26/10 ,  G02B3/00 ,  G03F7/20

CPC分类号： G02B26/10 ,  G02B3/0037 ,  G02B3/0056 ,  G02B26/101 ,  G03F7/2008 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  H01L21/027

摘要： A projection exposure device projects exposure light onto a substrate via a microlens array. The projection exposure device includes a scanning exposure unit that moves the microlens array along a scanning direction from one end toward another end of the substrate, and a microlens array shift unit that moves the microlens array in a shift direction intersecting with the scanning direction during movement of the microlens array caused by the scanning exposure unit.

公开(公告)号：US09726870B2

公开(公告)日：2017-08-08

申请号：US15002492

申请日：2016-01-21

申请人： Carl Zeiss SMT GmbH

发明人： Alexander Epple ,  Vladimir Kamenov ,  Toralf Gruner ,  Thomas Schicketanz

IPC分类号： G02B17/08 ,  G03F7/20 ,  G02B1/11

CPC分类号： G02B17/0892 ,  G02B1/11 ,  G02B17/08 ,  G02B17/0896 ,  G03F7/70 ,  G03F7/70225 ,  G03F7/70275

摘要： A projection objective for microlithography for imaging an object field onto an image field includes: a first partial objective for imaging the object field onto a first real intermediate image; a second partial objective for imaging the first intermediate image onto a second real intermediate image; a third partial objective for imaging the second intermediate image onto the image field, the third partial objective including an aperture; and a first folding mirror for deflecting radiation toward a concave mirror and a second folding mirror for deflecting the radiation from the concave mirror toward the image plane; in which the projection objective is an immersion projection objective in which during operation an immersion liquid is situated between a last lens surface and an image plane, and at least one surface of at least one lens in the second partial objective has an antireflection coating including at least six layers.

公开(公告)号：US09703207B1

公开(公告)日：2017-07-11

申请号：US13544480

申请日：2012-07-09

申请人： Daniel L. Cavan ,  Grace Chen

发明人： Daniel L. Cavan ,  Grace Chen

IPC分类号： G03B27/68 ,  G01N21/95 ,  G03F7/20

CPC分类号： G03F7/70275 ,  G01N21/8806 ,  G01N21/9501 ,  G03F7/70291 ,  G03F7/70516 ,  G03F7/7055

摘要： The present invention includes generating illumination, providing a spatial light modulator (SLM) configured to selectably illuminate one or more portions of a surface of a wafer using the generated illumination, receiving a sets of wafer pattern data indicative of one or more patterns of the wafer, translating the wafer along a direction, selectably controlling a pixel configuration of the SLM to control an illumination pattern on the surface of the wafer, a first pixel configuration illuminating a first set of regions of the wafer at an illumination level, an additional pixel configuration illuminating an additional set of regions at an additional illumination level, wherein a pixel pattern of the SLM based on the received sets of wafer pattern data is configured to move across a surface of the SLM synchronously with the pattern of the translated wafer, and detecting illumination from the surface of the wafer.

公开(公告)号：US20160349628A1

公开(公告)日：2016-12-01

申请号：US15235542

申请日：2016-08-12

申请人： ASML Netherlands B.V.

发明人： Arno Jan BLEEKER ,  Thomas Josephus Maria CASTENMILLER ,  Pieter Willem Herman DEJAGER ,  Heine Melle MULDER ,  Koen Jacobus Johannes ZAAL ,  Theodorus Petrus Maria CADEE ,  Danny Maria Hubertus PHILIPS ,  Ruud Antonius Catharina Maria BEERENS ,  Roger Anton Marie TIMMERMANS

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/20 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70366 ,  G03F7/70383 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70425 ,  G03F7/70475

摘要： A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.

摘要翻译： 配置成将辐射束投影到目标上的投影系统包括可旋转框架，其被配置为围绕限定切线方向和径向方向的轴线旋转，其中可旋转框架保持配置成将辐射束聚焦在仅切向 或径向; 以及固定部分，其包括基本上固定的透镜，其被配置为仅将所述辐射束聚焦在所述切向或径向方向中的另一个中。

公开(公告)号：US09507271B1

公开(公告)日：2016-11-29

申请号：US13225405

申请日：2011-09-03

申请人： Jang Fung Chen ,  Thomas Laidig

发明人： Jang Fung Chen ,  Thomas Laidig

IPC分类号： G03B27/44 ,  G03F7/20

CPC分类号： G03F7/70433 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/70475 ,  G03F7/70508 ,  G03F7/70791

摘要： System and method for manufacturing multiple light emitting diodes in parallel are disclosed. In one embodiment, the method includes providing an imaging writer system that includes a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, providing one or more substrates corresponding to multiple LEDs to be manufactured, receiving mask data to be written to the one or more substrates corresponding to the multiple LEDs, processing the mask data to form a plurality of partitioned mask data patterns corresponding to the plurality substrates of the multiple LEDs, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, and controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the plurality substrates of the multiple LEDs in parallel.

摘要翻译： 公开了并联制造多个发光二极管的系统和方法。 在一个实施例中，该方法包括提供一种成像写入器系统，其包括布置在一个或多个并行阵列中的多个空间光调制器（SLM）成像单元，提供对应于待制造的多个LED的一个或多个基板， 写入到与多个LED对应的一个或多个基板，处理掩模数据以形成与多个LED的多个基板相对应的多个分割的掩模数据图案，分配一个或多个SLM成像单元以处理每个分割的 掩模数据图案，并且控制多个SLM成像单元将多个分割的掩模数据图案并行写入多个LED的多个基板。