Method and apparatus for controlling rate of pressure change in a vacuum process chamber
    1.
    发明授权
    Method and apparatus for controlling rate of pressure change in a vacuum process chamber 失效
    用于控制真空处理室中的压力变化率的方法和装置

    公开(公告)号:US06328803B2

    公开(公告)日:2001-12-11

    申请号:US08805018

    申请日:1997-02-21

    IPC分类号: C23C1600

    摘要: A method, apparatus and system for controlling a rate of pressure change in a vacuum process chamber during pump down and vent up cycles of a vacuum process are provided. The method includes sensing the pressure in the process chamber, and then controlling the rate of pressure change to achieve a desired rate for a particular vacuum process. For a pump down cycle, the apparatus can include a control valve in flow communication with the process chamber and with an evacuation pump. For a vent up cycle, the apparatus can include a control valve in flow communication with the process chamber and with an inert gas supply. With either embodiment controllers can be programmed to adjust positions of the control valves based upon feedback from pressure sensors. The system can include multiple chambers each having an associated pump down and vent up control apparatus configured to match the rates of pressure change between chambers.

    摘要翻译: 提供了一种用于在抽真空过程的抽空和排气循环期间控制真空处理室中的压力变化率的方法,装置和系统。 该方法包括感测处理室中的压力,然后控制压力变化率以达到特定真空过程的期望速率。 对于抽气循环,设备可以包括与处理室和抽气泵流动连通的控制阀。 对于排气循环,该装置可以包括与处理室流动连通并具有惰性气体供应的控制阀。 通过任一实施例,控制器可以被编程以基于来自压力传感器的反馈来调节控制阀的位置。 该系统可以包括多个腔室,每个腔室具有相关联的泵送和排气控制装置,其配置成匹配腔室之间的压力变化率。