Patterning of nanocrystalline diamond films for diamond microstructures useful in MEMS and other devices
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    发明授权
    Patterning of nanocrystalline diamond films for diamond microstructures useful in MEMS and other devices 有权
    用于MEMS和其他器件的金刚石微结构的纳米晶金刚石膜的图案化

    公开(公告)号:US06811612B2

    公开(公告)日:2004-11-02

    申请号:US10169879

    申请日:2002-11-08

    IPC分类号: C30B2304

    摘要: MEMS structure and a method of fabricating them from ultrananocrystalline diamond films having average grain sizes of less than about 10 nm and feature resolution of less than about one micron . The MEMS structures are made by contacting carbon dimer species with an oxide substrate forming a carbide layer on the surface onto which ultrananocrystalline diamond having average grain sizes of less than about 10 nm is deposited. Thereafter, microfabrication process are used to form a structure of predetermined shape having a feature resolution of less than about one micron.

    摘要翻译: MEMS结构以及由平均晶粒尺寸小于约10nm并具有小于约1微米的特征分辨率的超晶体金刚石膜制造它们的方法。 通过使碳二聚物与在其上沉积有平均粒径小于约10nm的超微晶金刚石的表面上形成碳化物层的氧化物基底接触来制造MEMS结构。 此后,使用微细加工工艺形成具有小于约1微米的特征分辨率的预定形状的结构。