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公开(公告)号：US08163571B2
公开(公告)日：2012-04-24
申请号：US12021791
申请日：2008-01-29
IPC分类号： H01L21/00
CPC分类号： H01L21/76877 , H01L21/2855 , H01L21/76865 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： For providing control of two-step or a multi-step deposition process, a method and a corresponding deposition system is provided comprising providing a deposition process having at least two sub-processes employing different sets of process parameters, wherein each set of process parameters comprises at least one process parameter. The method comprises controllably generating an actual value for at least one first process parameter by taking into account at least one previous value of the respective first process parameter, wherein each first process parameter is a process parameter of said at least two sets of process parameters.
摘要翻译： 为了提供两步或多步沉积过程的控制，提供了一种方法和相应的沉积系统，其包括提供具有采用不同工艺参数集的至少两个子过程的沉积工艺，其中每组工艺参数包括 至少一个过程参数。 该方法包括通过考虑到相应的第一过程参数的至少一个先前值来可控地生成至少一个第一过程参数的实际值，其中每个第一过程参数是所述至少两组过程参数的过程参数。
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公开(公告)号：US20080299681A1
公开(公告)日：2008-12-04
申请号：US12021791
申请日：2008-01-29
CPC分类号： H01L21/76877 , H01L21/2855 , H01L21/76865 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： For providing control of two-step or a multi-step deposition process, a method and a corresponding deposition system is provided comprising providing a deposition process having at least two sub-processes employing different sets of process parameters, wherein each set of process parameters comprises at least one process parameter. The method comprises controllably generating an actual value for at least one first process parameter by taking into account at least one previous value of the respective first process parameter, wherein each first process parameter is a process parameter of said at least two sets of process parameters.
摘要翻译： 为了提供两步或多步沉积过程的控制，提供了一种方法和相应的沉积系统，其包括提供具有采用不同工艺参数集的至少两个子过程的沉积工艺，其中每组工艺参数包括 至少一个过程参数。 该方法包括通过考虑到相应的第一过程参数的至少一个先前值来可控地生成至少一个第一过程参数的实际值，其中每个第一过程参数是所述至少两组过程参数的过程参数。
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公开(公告)号：US08585877B2
公开(公告)日：2013-11-19
申请号：US13416025
申请日：2012-03-09
CPC分类号： H01L21/76877 , H01L21/2855 , H01L21/76865 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： For providing control of two-step or a multi-step deposition process, a method and a corresponding deposition system is provided comprising providing a deposition process having at least two sub-processes employing different sets of process parameters, wherein each set of process parameters comprises at least one process parameter. The method comprises controllably generating an actual value for at least one first process parameter by taking into account at least one previous value of the respective first process parameter, wherein each first process parameter is a process parameter of said at least two sets of process parameters.
摘要翻译： 为了提供两步或多步沉积过程的控制，提供了一种方法和相应的沉积系统，其包括提供具有采用不同工艺参数集的至少两个子过程的沉积工艺，其中每组工艺参数包括 至少一个过程参数。 该方法包括通过考虑到相应的第一过程参数的至少一个先前值来可控地生成至少一个第一过程参数的实际值，其中每个第一过程参数是所述至少两组过程参数的过程参数。
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公开(公告)号：US20120160415A1
公开(公告)日：2012-06-28
申请号：US13416025
申请日：2012-03-09
IPC分类号： H01L21/306
CPC分类号： H01L21/76877 , H01L21/2855 , H01L21/76865 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： For providing control of two-step or a multi-step deposition process, a method and a corresponding deposition system is provided comprising providing a deposition process having at least two sub-processes employing different sets of process parameters, wherein each set of process parameters comprises at least one process parameter. The method comprises controllably generating an actual value for at least one first process parameter by taking into account at least one previous value of the respective first process parameter, wherein each first process parameter is a process parameter of said at least two sets of process parameters.
摘要翻译： 为了提供两步或多步沉积过程的控制，提供了一种方法和相应的沉积系统，其包括提供具有采用不同工艺参数集的至少两个子过程的沉积工艺，其中每组工艺参数包括 至少一个过程参数。 该方法包括通过考虑到相应的第一过程参数的至少一个先前值来可控地生成至少一个第一过程参数的实际值，其中每个第一过程参数是所述至少两组过程参数的过程参数。
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