公开(公告)号：US06323111B1

公开(公告)日：2001-11-27

申请号：US09428689

申请日：1999-10-28

申请人： Frank Y. Hui ,  Edward B. Harris

发明人： Frank Y. Hui ,  Edward B. Harris

IPC分类号： H01L21326

CPC分类号： H01L23/5256 ,  H01L2924/0002 ,  H01L2924/00

摘要： A fuse for use in an integrated circuit includes a dielectric layer into which a trench or void is etched defined by a top opening and a bottom floor. The trench includes at least one undercut which forms an overhang in the dielectric layer partially shielding the bottom floor. A second or barrier layer deposited onto the dielectric layer is interrupted or non-continuous at the undercut. A third, or electrically conductive layer, is electrically continuous over the fuse. A weak spot in the third layer exists in the lack of structural support by the second layer at the interruption. A further weak spot in the third layer exists in the electrical isolation of the conductor layer, i.e. no leakage current through the barrier layer, at the interruption.

摘要翻译： 用于集成电路的保险丝包括介电层，由顶部开口和底部底部限定沟槽或空隙。 沟槽包括至少一个底切部，该底切部在屏蔽底层的介电层中形成伸出部。 沉积在电介质层上的第二或阻挡层在底切处被中断或不连续。 第三个或导电层在保险丝上电连续。 第三层的弱点存在于中断时第二层缺乏结构支撑。 在中断时，在导电层的电隔离中存在第三层中的另一个弱点，即没有通过阻挡层的泄漏电流。

公开(公告)号：US06570238B2

公开(公告)日：2003-05-27

申请号：US10066279

申请日：2001-10-29

申请人： Frank Y. Hui ,  Edward B. Harris

发明人： Frank Y. Hui ,  Edward B. Harris

IPC分类号： H01L2900

CPC分类号： H01L23/5256 ,  H01L2924/0002 ,  H01L2924/00

摘要： A fuse for use in an integrated circuit includes a dielectric layer into which a trench or void is etched defined by a top opening and a bottom floor. The trench includes at least one undercut which forms an overhang in the dielectric layer partially shielding the bottom floor. A second or barrier layer deposited onto the dielectric layer is interrupted or non-continuous at the undercut. A third, or electrically conductive layer, is electrically continuous over the fuse. A weak spot in the third layer exists in the lack of structural support by the second layer at the interruption. A further weak spot in the third layer exists in the electrical isolation of the conductor layer, i.e. no leakage current through the barrier layer, at the interruption.