公开(公告)号：US20190153608A1

公开(公告)日：2019-05-23

申请号：US16259444

申请日：2019-01-28

Applicant: G. ALIPRANDINI ,  The Swatch Group Research and Development Ltd.

Inventor： Giuseppe ALIPRANDINI ,  Michel CAILLAUD

IPC: C25D3/62

Abstract: A galvanic bath, containing: gold metal in the form of alkaline aurocyanide; organometallic components; a wetting agent; a complexing agent; free cyanide; copper metal in the form of copper II cyanide and potassium; and indium metal in the form of a complex indium metal, where the galvanic bath does not contain cadmium and zinc, and where the galvanic bath deposits a yellow gold alloy comprising gold, copper, and indium as main components.

公开(公告)号：US20140299481A1

公开(公告)日：2014-10-09

申请号：US14244071

申请日：2014-04-03

Applicant: G. Aliprandini ,  The Swatch Group Research and Development Ltd

Inventor： Giuseppe Aliprandini ,  Michel Caillaud

IPC: C25D3/62

CPC classification number: C25D3/62 ,  C25D3/48

Abstract: The invention relates to a make-up solution for a galvanic bath comprising organometallic components, a wetting agent, a complexing agent and free cyanide, wherein the make-up solution further comprises copper in the form of copper II cyanide and potassium, and complex indium allowing, after addition of alkaline aurocyanide, to galvanically depositing a gold alloy.

Abstract translation: 本发明涉及包含有机金属组分，润湿剂，络合剂和游离氰化物的电镀浴的补充溶液，其中补充溶液还包含铜II氰化物和钾形式的铜和复合铟 在加入碱金属氰化物之后，允许电镀沉积金合金。