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公开(公告)号：US08878148B2
公开(公告)日：2014-11-04
申请号：US12888978
申请日：2010-09-23
CPC分类号： H01J37/06 , H01J2237/022 , H01J2237/06316 , H01J2237/06341
摘要： A method of pre-treating an ultra high vacuum charged particle gun chamber by ion stimulated desorption is provided. The method includes generating a plasma for providing a plasma ion source, and applying a negative potential to at least one surface in the gun chamber, wherein the negative potential is adapted for extracting an ion flux from the plasma ion source to the at least one surface for desorbing contamination particles from the at least one surface by the ion flux impinging on the at least one surface.
摘要翻译： 提供了一种通过离子刺激解吸预处理超高真空带电粒子枪室的方法。 该方法包括产生用于提供等离子体离子源的等离子体，以及向枪室中的至少一个表面施加负电位，其中负电位适于将离子通量从等离子体离子源提取到至少一个表面 用于通过撞击在至少一个表面上的离子通量从至少一个表面解吸污染颗粒。
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公开(公告)号：US20110084219A1
公开(公告)日：2011-04-14
申请号：US12888978
申请日：2010-09-23
申请人： Pavel ADAMEC , Ivo LISKA , Gennadij GLUCHMAN , Milan SNABL
发明人： Pavel ADAMEC , Ivo LISKA , Gennadij GLUCHMAN , Milan SNABL
IPC分类号： G21K5/00
CPC分类号： H01J37/06 , H01J2237/022 , H01J2237/06316 , H01J2237/06341
摘要： A method of pre-treating an ultra high vacuum charged particle gun chamber by ion stimulated desorption is provided. The method includes generating a plasma for providing a plasma ion source, and applying a negative potential to at least one surface in the gun chamber, wherein the negative potential is adapted for extracting an ion flux from the plasma ion source to the at least one surface for desorbing contamination particles from the at least one surface by the ion flux impinging on the at least one surface.
摘要翻译： 提供了一种通过离子刺激解吸预处理超高真空带电粒子枪室的方法。 该方法包括产生用于提供等离子体离子源的等离子体，以及向枪室中的至少一个表面施加负电位，其中负电位适于将离子通量从等离子体离子源提取到至少一个表面 用于通过撞击在至少一个表面上的离子通量从至少一个表面解吸污染颗粒。
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