公开(公告)号：US20240096586A1

公开(公告)日：2024-03-21

申请号：US17829230

申请日：2022-05-31

Applicant: KLA CORPORATION

Inventor： Xinrong JIANG ,  Christopher SEARS ,  Youfei JIANG ,  Sameet K. SHRIYAN ,  Jeong Ho LEE ,  Michael STEIGERWALD ,  Ralph NYFFENEGGER

IPC: H01J37/153 ,  H01J37/06 ,  H01J37/12 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/06 ,  H01J37/12 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0451 ,  H01J2237/04735 ,  H01J2237/103 ,  H01J2237/151 ,  H01J2237/152 ,  H01J2237/1532 ,  H01J2237/1536 ,  H01J2237/2448

Abstract: A multi-electron beam system that forms hundreds of beamlets can focus the beamlets, reduce Coulomb interaction effects, and improve resolutions of the beamlets. A Wien filter with electrostatic and magnetic deflection fields can separate the secondary electron beams from the 5 primary electron beams and can correct the astigmatism and source energy dispersion blurs for all the beamlets simultaneously.

公开(公告)号：US11887807B2

公开(公告)日：2024-01-30

申请号：US18158444

申请日：2023-01-23

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/06 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/1474 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/1478 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/1534 ,  H01J2237/1536

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

公开(公告)号：US20230335367A1

公开(公告)日：2023-10-19

申请号：US18028771

申请日：2020-11-10

Applicant: Hitachi High-Tech Corporation

Inventor： Takashi OHSHIMA ,  Hideo MORISHITA ,  Tatsuro IDE ,  Hiroyasu SHICHI ,  Yoichi OSE ,  Junichi KATANE

IPC: H01J37/06 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/06 ,  H01J37/28 ,  H01J37/244 ,  H01J2237/24535 ,  C23C14/14

Abstract: An activation mechanism is provided in an activation region of an electron gun, and includes a light source device 3 configured to irradiate a photocathode with excitation light, a heat generating element, an oxygen generation unit configured to generate oxygen by heating the heat generating element, and an emission current meter configured to monitor an emission current generated by electron emission when the photocathode 1 is irradiated with the excitation light from the light source device. In a surface activation process, the photocathode is irradiated with the excitation light from the light source device, an emission current amount of the photocathode is monitored by the emission current meter, the heat generating element is heated to generate oxygen by the oxygen generation unit, and the heating of the heat generating element is stopped when the emission current amount of the photocathode satisfies a predetermined stop criterion.

公开(公告)号：US11774382B1

公开(公告)日：2023-10-03

申请号：US17139271

申请日：2020-12-31

Applicant: Eric Arno Vigen

Inventor： Eric Arno Vigen

IPC: G01N23/225 ,  G01N33/68 ,  H01J37/06 ,  H01J37/244 ,  G01N23/2251

CPC classification number: G01N23/2251 ,  G01N33/6803 ,  H01J37/06 ,  H01J37/244 ,  H01J2237/2445

Abstract: A system includes a target object for examination; electrical transfer points associated with the target object, the electrical transfer points being an application of energy to generate one or more photons; devices for receiving and measuring electromagnetic waves from the one or more photons, to generate a data set of information, the information including at least one of direction, wavelength, and polarity; a computer having a platform to receive the data set of information; generate a model of subatomic particle placement for the photons, as determined by the data set of information; and re-examine the model at one or more of a different initiation-to-destination energy path, a different measuring position, or a different energy input; the receiving of the data set of information, generating of the model, and the re-examination of the model provides information for industrial application.

公开(公告)号：US20180218874A1

公开(公告)日：2018-08-02

申请号：US15576687

申请日：2016-01-06

Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE

Inventor： Bok Lae CHO ,  In Yong PARK

IPC: H01J37/065 ,  H01J37/26

CPC classification number: H01J37/065 ,  H01J37/06 ,  H01J37/26 ,  H01J2237/061 ,  H01J2237/06341

Abstract: The present invention relates to an electron gun for facilitating position adjustment, and an electron microscope including the same, the electron gun improving a vacuum structure so as to easily move a filament block or an electron tip of an electron gun without having bellows for maintaining a vacuum when the center axis of the filament block or the electron tip of the electron gun is mechanically misaligned with the center axis of a anode and a focusing lens.

公开(公告)号：US20180166247A1

公开(公告)日：2018-06-14

申请号：US15836390

申请日：2017-12-08

Applicant: Waviks, Inc.

Inventor： Thomas M. Moore ,  Gregory A. Magel

IPC: H01J37/02 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J37/06

CPC classification number: H01J37/023 ,  H01J37/02 ,  H01J37/06 ,  H01J37/20 ,  H01J37/22 ,  H01J37/226 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/063 ,  H01J2237/202

Abstract: Apparatus and methods for the alignment of a charged-particle beam with an optical beam within a charged-particle beam microscope, and to the focusing of the optical beam are disclosed. An embodiment includes a charged-particle beam microscope having one or more charged-particle beams, such as an electron beam, and one or more optical beams provided by an optical-beam accessory that is mounted in or on the charged-particle beam microscope. This accessory is integrated into a nanomanipulator system, allowing its focus location to be moved within the microscope. The apparatus includes a two-dimensional pixelated beam locator such as a CCD or CMOS imaging array sensor. The image formed by this sensor can then be used to manually, or automatically in an open or closed loop configuration, adjust the positioning of one or more charged-particle beams or optical beams to achieve coincidence of such beams or focus of one or more such beams.

公开(公告)号：US09997325B2

公开(公告)日：2018-06-12

申请号：US12460462

申请日：2009-07-16

Applicant: Jimmy W. Hosch ,  Matthew J. Goeckner ,  Mike Whelan ,  Andrew Weeks Kueny ,  Kenneth C. Harvey ,  P.L. Stephan Thamban

Inventor： Jimmy W. Hosch ,  Matthew J. Goeckner ,  Mike Whelan ,  Andrew Weeks Kueny ,  Kenneth C. Harvey ,  P.L. Stephan Thamban

IPC: H01J37/06 ,  H01J37/32

CPC classification number: H01J37/06 ,  H01J37/32935 ,  H01J37/32972

Abstract: The present invention is directed to a gas line electron beam exciter, gas line electron beam excitation system and method for exciting a gas using an electron beam exciter. The electron beam exciter generally comprises a variable density electron source for generating a cloud of electrons in an electron chamber and a variable energy electron extractor for accelerating electrons from the electron chamber as an electron beam and into an effluent stream for fluorescing species in the effluent. The electron density of the electron beam is variably controlled by adjusting the excitation power applied to the variable density electron source. The electrons in the electron chamber reside at a reference electrical potential of the chamber, typically near ground electrical potential. The electron energy of the electron beam is variably controlled by adjusting an electrical potential across the variable energy electron extractor, which energizes the electrons through an extraction hole of the chamber and toward the extractor. The greater the difference in the electrical potential between the electron extractor and the electron source, the higher the energy imparted to the electrons in the electron beam. The excitation power applied to the electron source can be adjusted independently from the electron energy of the electron beam, thereby altering the electron density of the electron beam without changing the energy level of the electrons of the electron beam.

公开(公告)号：US20180158647A1

公开(公告)日：2018-06-07

申请号：US15464533

申请日：2017-03-21

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Bao-Hua Niu ,  Jung-Hsiang Chuang ,  David Hung-I Su

IPC: H01J37/22 ,  H01J37/16 ,  H01J37/20 ,  H01J37/06 ,  H01J37/10 ,  H01J37/244

CPC classification number: H01J37/226 ,  H01J37/06 ,  H01J37/10 ,  H01J37/16 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/2445

Abstract: A wafer and DUT inspection apparatus and a wafer and DUT inspection method using thereof are provided. The apparatus includes a vacuum chamber, a stage, an electron gun, a lens system, an optical mirror and a detector. In the vacuum chamber, the stage is disposed near a first end, and the electron gun is disposed near a second end opposite to the first end. The lens system disposed between the stage and the electron gun is a total reflective achromatic lens system including a first lens and a second lens. The second lens having a second aperture is disposed between the electron gun and the first lens having a first aperture aligned with the second aperture. The optical mirror is disposed between the lens system and the electron gun. The detector is horizontally aligned with the optical mirror and configured to detect cathodoluminescence reflected from the optical mirror.

公开(公告)号：US20180090298A1

公开(公告)日：2018-03-29

申请号：US15717107

申请日：2017-09-27

Applicant: NuFlare Technology, Inc.

Inventor： Noriaki NAKAYAMADA

IPC: H01J37/302 ,  H01J37/317 ,  H01J37/06 ,  H01J37/147

CPC classification number: H01J37/3023 ,  H01J37/06 ,  H01J37/1472 ,  H01J37/3026 ,  H01J37/3175 ,  H01J2237/004 ,  H01J2237/30472 ,  H01J2237/31774 ,  H01J2237/31776

Abstract: According to one aspect of the present invention, an electron beam apparatus includes charge amount distribution operation processing circuitry that operates a charge amount distribution of an irradiation region in a case that a substrate is irradiated with an electron beam using a combined function combining a first exponential function having an inflection point and at least one of a first-order proportional function and a second exponential function that converges and depending on a pattern area density; positional displacement operation processing circuitry that operates a positional displacement of an irradiation pattern formed due to irradiation of the electron beam using the charge amount distribution obtained; correction processing circuitry that corrects an irradiation position using the positional displacement; and an electron beam column including an emission source that emits the electron beam and a deflector that deflects the electron beam to irradiate a corrected irradiation position with the electron beam.

公开(公告)号：US20180053631A1

公开(公告)日：2018-02-22

申请号：US15783983

申请日：2017-10-13

Applicant: Applied Materials, Inc.

Inventor： Leonid Dorf ,  Kenneth S. Collins ,  Shahid Rauf ,  Kartik Ramaswamy ,  James D. Carducci ,  Hamid Tavassoli ,  Olga Regelman ,  Ying Zhang

IPC: H01J37/32 ,  H01J37/06 ,  H01L21/3065

CPC classification number: H01J37/32174 ,  H01J37/06 ,  H01J37/32082 ,  H01J37/3233 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/3244 ,  H01J37/32458 ,  H01J37/32532 ,  H01J2237/3151 ,  H01J2237/3174 ,  H01J2237/334 ,  H01J2237/3348 ,  H01L21/3065 ,  H01L21/31116

Abstract: The disclosure concerns a method of operating a plasma reactor having an electron beam plasma source for independently adjusting electron beam energy, plasma ion energy and radical population. The disclosure further concerns an electron beam source for a plasma reactor having an RF-driven electrode for producing the electron beam.