公开(公告)号：US20070058151A1

公开(公告)日：2007-03-15

申请号：US11224319

申请日：2005-09-13

申请人： Markus Franciscus Eurlings ,  Marinus Van Dam ,  Hendrikus Van Greevenbroek ,  Edwin Knols ,  Heine Mulder ,  Gerardus Maria Swinkels ,  Damian Fiolka

发明人： Markus Franciscus Eurlings ,  Marinus Van Dam ,  Hendrikus Van Greevenbroek ,  Edwin Knols ,  Heine Mulder ,  Gerardus Maria Swinkels ,  Damian Fiolka

IPC分类号： G03B27/72

CPC分类号： G03F7/70091 ,  G02B5/1819 ,  G02B5/1838 ,  G02B27/286 ,  G03F7/70566

摘要： An optical element for effecting a desired change in incident radiation at a plane of an illumination system of a lithographic apparatus comprises an array of cells manufactured as a single unit, each cell being arranged to redirect the incident radiation in a predetermined direction. An array of polarizing regions is also provided, each polarizing region being associated with a corresponding cell. Each cell arranged to redirect radiation in a first direction has associated with it a polarizing region ensuring that the redirected radiation has a first polarization, so that all of the radiation redirected in the first direction has the same polarization.

摘要翻译： 用于在光刻设备的照明系统的平面处实现入射辐射的期望变化的光学元件包括以单个单元制造的单元阵列，每个单元被布置成沿着预定方向重定向入射的辐射。 还提供了偏振区域的阵列，每个偏振区域与相应的单元相关联。 布置成沿第一方向重定向辐射的每个单元与其相关联的是偏振区域，确保重定向的辐射具有第一偏振，使得在第一方向上重定向的所有辐射具有相同的偏振。