VACUUM PUMPING SYSTEM WITH A PLURALITY OF SPUTTER ION PUMPS
    1.
    发明申请
    VACUUM PUMPING SYSTEM WITH A PLURALITY OF SPUTTER ION PUMPS 审中-公开
    真空泵系统具有大量的飞溅离子泵

    公开(公告)号:US20100034668A1

    公开(公告)日:2010-02-11

    申请号:US12537159

    申请日:2009-08-06

    CPC classification number: H01J41/20

    Abstract: In a vacuum pumping system with a plurality of sputter ion pumps the considerable reduction in its overall axial size and weight is achieved by utilizing a plurality of axially superimposed sputter ion pumps and a common magnetic circuit, which comprises a pair of external magnets located at opposite axial ends of the pumping system, one or more intermediate magnets arranged alternated with the sputter ion pumps and a ferromagnetic yoke, internally enclosing the external magnets and the one or more intermediate magnets.

    Abstract translation: 在具有多个溅射离子泵的真空泵送系统中,通过利用多个轴向重叠的溅射离子泵和公共磁路来实现其总体轴向尺寸和重量的显着降低,其包括位于相对的一对外部磁体 泵送系统的轴向端部,与溅射离子泵和铁磁轭交替排列的一个或多个中间磁体,内部包围外部磁体和一个或多个中间磁体。

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