公开(公告)号：US06738731B1

公开(公告)日：2004-05-18

申请号：US09815445

申请日：2001-03-22

申请人： Terrence J. Riley ,  Qingsu Wang ,  Glen W. Scheid ,  Kent F. Knox

发明人： Terrence J. Riley ,  Qingsu Wang ,  Glen W. Scheid ,  Kent F. Knox

IPC分类号： G01R3126

CPC分类号： G01R31/2831

摘要： A method for identifying faulty wafers includes processing a set of wafers in a tool; collecting tool state information during the processing of the set of wafers; generating a tool state information baseline; comparing the tool state information for each wafer to the tool state information baseline to identify any wafers with outlying tool state information; and designating a particular wafer in the set as suspect in response to identifying outlying tool state information for the particular wafer. A processing line includes a tool adapted to process a set of wafers, and a process controller. The process controller is adapted to collect tool state information during the processing of the set of wafers, generate a tool state information baseline, compare the tool state information for each wafer to the baseline tool state information to identify any wafers with outlying tool state information, and designate a particular wafer in the set as suspect in response to identifying outlying tool state information for the particular wafer.

摘要翻译： 用于识别故障晶片的方法包括在工具中处理一组晶片; 在处理该组晶片期间收集工具状态信息; 生成工具状态信息基线; 将每个晶片的工具状态信息与工具状态信息基准进行比较，以识别具有外围工具状态信息的任何晶片; 以及响应于识别用于特定晶片的外部工具状态信息而将所述组中的特定晶片指定为可疑的。 处理线包括适于处理一组晶片的工具和过程控制器。 过程控制器适于在晶片组的处理期间收集工具状态信息，产生工具状态信息基线，将每个晶片的工具状态信息与基准工具状态信息进行比较，以识别具有外围工具状态信息的任何晶片， 并且响应于识别用于特定晶片的外部工具状态信息而将集合中的特定晶片指定为可疑。

公开(公告)号：US06268270B1

公开(公告)日：2001-07-31

申请号：US09429790

申请日：1999-10-29

申请人： Glen W. Scheid ,  Terrence J. Riley ,  Qingsu Wang ,  Michael Miller ,  Si-Zhao J. Qin

发明人： Glen W. Scheid ,  Terrence J. Riley ,  Qingsu Wang ,  Michael Miller ,  Si-Zhao J. Qin

IPC分类号： H01C21265

CPC分类号： G01J5/0003 ,  G01J1/32

摘要： Methods of optimizing a preheat recipe for rapid thermal processing workpieces are provided. In one aspect, a method of manufacturing is provided that includes preheating a rapid thermal processing chamber according to a preheating recipe and processing a first plurality of workpieces in the rapid thermal processing chamber. Parameter measurements are performed on a first workpiece and a second workpiece of the first plurality of workpieces. The parameter measurements are indicative of processing differences between the first and second workpieces. An output signal is formed corresponding to the parameter measurements and a control signal based on the output signal is used to adjust the preheating recipe for preheating the rapid thermal processing chamber for processing a second plurality of workpieces in the rapid thermal processing chamber to reduce processing differences between first and second workpieces of the second plurality of workpieces.

摘要翻译： 提供了优化用于快速热处理工件的预热配方的方法。 一方面，提供一种制造方法，其包括根据预热配方预热快速热处理室并在快速热处理室中处理第一多个工件。 在第一工件和第一工件的第二工件上执行参数测量。 参数测量表示第一和第二工件之间的加工差异。 对应于参数测量形成输出信号，并且使用基于输出信号的控制信号来调节用于预热快速热处理室的预热配方，用于处理快速热处理室中的第二多个工件以减少加工差异 在第二多个工件的第一和第二工件之间。