公开(公告)号：US20050139320A1

公开(公告)日：2005-06-30

申请号：US10999908

申请日：2004-11-30

申请人： Gregory Athas ,  Russel Mello

发明人： Gregory Athas ,  Russel Mello

IPC分类号： G11B5/187 ,  G11B5/31 ,  G11B5/39 ,  H01J37/305 ,  C23F1/00

CPC分类号： G11B5/3967 ,  G11B5/1871 ,  G11B5/3116 ,  G11B5/3163 ,  G11B5/3166 ,  H01J37/3056 ,  H01J2237/30438

摘要： A focused particle beam system, according to one embodiment of the invention, precisely shapes a pole-tip assembly formed by a multi-layer device having a first layer with a first structural element, a second layer with a second structural element, and a shielding layer with a shielding element, the shielding element being located between the first layer and the second layer. The focused particle beam system mills the second structural element without irradiating a first structural element. The system images a selected portion of the multi-layer device to locate the shielding element and thereby avoids irradiating the first structural element. The shielding element separates the first structural element from the second structural element. Based on the location of the shielding element, the system images and mills the second structural element without irradiating the first structural element. In this manner, the focused particle beam system mills the second structural element to produce a desired pole-tip configuration. By producing a desired pole-tip configuration, these methods and apparatus produce a recording transducer capable of high storage density.

摘要翻译： 根据本发明的一个实施例的聚焦粒子束系统精确地形成由具有第一层与第一结构元件的多层器件形成的极尖组件，具有第二结构元件的第二层和屏蔽层 所述屏蔽元件位于所述第一层和所述第二层之间。 聚焦粒子束系统对第二结构元件进行研磨而不照射第一结构元件。 系统对多层设备的选定部分进行成像以定位屏蔽元件，从而避免照射第一结构元件。 屏蔽元件将第一结构元件与第二结构元件分开。 基于屏蔽元件的位置，系统对第二结构元件进行成像和研磨，而不照射第一结构元件。 以这种方式，聚焦的粒子束系统研磨第二结构元件以产生期望的极尖构造。 通过产生期望的极尖构造，这些方法和装置产生能够高存储密度的记录换能器。

公开(公告)号：US08017191B2

公开(公告)日：2011-09-13

申请号：US11848215

申请日：2007-08-30

申请人： Jason Haaheim ,  Gregory Athas

发明人： Jason Haaheim ,  Gregory Athas

IPC分类号： B05D1/18

CPC分类号： G03F7/0002 ,  G01Q80/00

摘要： A method of dipping a nanoscopic probe comprising dipping a nanoscopic tip at a dipping rate into an inkwell comprising ink, wherein the dipping rate is configured to be sufficiently faster than a rate of wicking. A nanoscopic probe comprising a nanoscopic tip and an inkwell configured to contain ink, wherein the nanoscopic probe is configured to dip into and retract from the ink at a rate that is sufficiently faster than wicking. Wicking can cause excessive amounts of ink to be deposited on nanoscopic tips, which can lead to contamination of inkwells and other nanoscopic tips.

摘要翻译： 一种浸渍纳米尺度探针的方法，包括以浸渍速率将纳米级尖端浸入包含墨水的墨水阱中，其中浸渍速率被配置为比芯吸速度快得多。 纳米级探针，其包括纳米级尖端和构造成容纳墨水的墨水孔，其中所述纳米级探针配置成以比芯吸足够快的速率从所述墨浸入和缩回。 芯吸可能导致过量的墨水沉积在纳米尖端上，这可能导致墨水和其他纳米级尖端的污染。

公开(公告)号：US20080055344A1

公开(公告)日：2008-03-06

申请号：US11848215

申请日：2007-08-30

申请人： Jason Haaheim ,  Gregory Athas

发明人： Jason Haaheim ,  Gregory Athas

IPC分类号： B41J27/00

CPC分类号： G03F7/0002 ,  G01Q80/00

摘要： A method of dipping a nanoscopic probe comprising dipping a nanoscopic tip at a dipping rate into an inkwell comprising ink, wherein the dipping rate is configured to be sufficiently faster than a rate of wicking. A nanoscopic probe comprising a nanoscopic tip and an inkwell configured to contain ink, wherein the nanoscopic probe is configured to dip into and retract from the ink at a rate that is sufficiently faster than wicking. Wicking can cause excessive amounts of ink to be deposited on nanoscopic tips, which can lead to contamination of inkwells and other nanoscopic tips.

摘要翻译： 一种浸渍纳米尺度探针的方法，包括以浸渍速率将纳米级尖端浸入包含墨水的墨水阱中，其中浸渍速率被配置为比芯吸速度快得多。 纳米级探针，其包括纳米级尖端和构造成容纳墨水的墨水孔，其中所述纳米级探针配置成以比芯吸足够快的速率从所述墨浸入和缩回。 芯吸可能导致过量的墨水沉积在纳米尖端上，这可能导致墨水和其他纳米级尖端的污染。