公开(公告)号：US5225312A

公开(公告)日：1993-07-06

申请号：US739646

申请日：1991-08-02

申请人： Sunit S. Dixit ,  Richard M. Lazarus ,  Thomas P. Carter ,  Joseph E. Oberlander ,  Andreas Goehring ,  Randall W. Kautz ,  Grieg Beltramo

发明人： Sunit S. Dixit ,  Richard M. Lazarus ,  Thomas P. Carter ,  Joseph E. Oberlander ,  Andreas Goehring ,  Randall W. Kautz ,  Grieg Beltramo

IPC分类号： G03F7/09

CPC分类号： G03F7/091

摘要： A positive photoresist of the type containing an alkali-soluble novolac resin and a quinone diazide sensitizer contains a dye of the general formula: ##STR1## wherein R' is lower alkyl, R" is H, alkyl or CO.sub.2 -alkyl, alkyl-CO.sub.2 -alkyl or alkyl-CO.sub.2 -(C.sub.1 -C.sub.3 alkyl-O).sub.n -alkyl (n=1-3) and wherein said dye is compatible with the novolac resin/quinone diazide formulation to at least 0.1 phr. The dye reduces reflective notching. Preferably the photoresist also contain a nitro naphthol dye to reduce the effects of I-Line radiation.

摘要翻译： 含有碱溶性酚醛清漆树脂和醌二叠氮化物敏化剂的正型光致抗蚀剂含有下列通式的染料：其中R'为低级烷基，R“为H，烷基或CO 2 - 烷基，烷基 - CO 2 - 烷基或烷基-CO 2 - （C 1 -C 3烷基-O）n-烷基（n = 1-3），并且其中所述染料与酚醛清漆树脂/醌二叠氮化合物配方相容至至少0.1phr。 染料减少反光缝。 优选地，光致抗蚀剂还含有硝基萘酚染料以减少I-Line辐射的影响。