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公开(公告)号：US07046331B2
公开(公告)日：2006-05-16
申请号：US10407944
申请日：2003-04-07
CPC分类号： G03F7/70633 , G03F7/70733 , Y10T428/24802 , Y10T428/24835
摘要： A lithographic projection apparatus having at least two substrate holders is controlled to reduce effects of differences in images caused by differences between the two substrate holders. The apparatus includes an internal or external detector that identifies a substrate and associates it with a respective one of the substrate holders. A controller ensures that either the substrate is processed on the appropriate holder or that correction is applied to the imaging. In an alternate embodiment, the substrate is associated with a respective one of the substrate holders and is consistently processed using that substrate holder without further identification steps.
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2.发明授权Method, computer program product and apparatus for scheduling maintenance actions in a substrate processing system 有权用于在基板处理系统中调度维护动作的方法，计算机程序产品和装置公开(公告)号：US06879866B2
公开(公告)日：2005-04-12
申请号：US10633307
申请日：2003-08-04
CPC分类号： G05B23/0283 , G05B2219/32233 , H01L21/67276
摘要： A method of scheduling one or more maintenance actions in at least a part of a substrate processing system is provided. According to an embodiment, the method includes determining a gap in the flow of substrates in a part of the substrate processing system and scheduling one or more maintenance actions to be performed in another part of the substrate processing during a period associated with the gap. An increase of productivity of substrate processing can be achieved through a reduction in downtime in a substrate processing system by appropriate scheduling of maintenance actions.
摘要翻译： 提供了一种在衬底处理系统的至少一部分中调度一个或多个维护动作的方法。 根据一个实施例，该方法包括确定衬底处理系统的一部分中的衬底流动中的间隙，并且调度在与间隙相关联的周期期间在衬底处理的另一部分中执行的一个或多个维护动作。 可以通过适当调整维护动作来减少基板处理系统中的停机时间来提高基板处理的生产率。
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