公开(公告)号：US5821035A

公开(公告)日：1998-10-13

申请号：US811261

申请日：1997-03-04

申请人： Harunobu Hirano ,  Yasushi Kusano ,  Rikio Ikeda ,  Ritsuko Inoue

发明人： Harunobu Hirano ,  Yasushi Kusano ,  Rikio Ikeda ,  Ritsuko Inoue

IPC分类号： G03F7/30

CPC分类号： G03F7/3021

摘要： A developing apparatus used for developing a resist applied on a substrate, comprises: developer storage means for storing a developer; a developer supply tube for supplying the developer from the developer storage means through one end thereof onto a substrate supported in a position; and degas means located immediately upstream of the one end of the developer supply tube to deaerate the developer. A resist developing method comprises the steps of: supplying a substance; applying a resist onto the substrate; making a latest image in the resist; and supplying a developer onto the resist having the latest image to develop the resist, wherein the step of supplying the developer provides the developer in several times. Another resist developing method comprises the steps of: supplying a substrate; applying a resist onto the substrate; forming a latest image in the resist; providing a developer onto the resist having the latest image therein; after providing the developer, rotating the substrate and then stopping same; maintaining the substrate still; and rotating the substrate and then stopping same.

摘要翻译： 一种显影装置，用于显影施加在基板上的抗蚀剂，包括：显影剂存储装置，用于存储显影剂; 显影剂供应管，其用于将显影剂从显影剂存储装置的一端供应到支撑在一个位置的基底上; 以及位于显影剂供应管的一端紧邻上游的脱气装置，以使显影剂脱气。 抗蚀剂显影方法包括以下步骤：提供物质; 将抗蚀剂涂布在基材上; 在抗拒中形成最新形象; 并且将显影剂供应到具有最新图像的抗蚀剂上以开发抗蚀剂，其中提供显影剂的步骤为显影剂提供多次。 另一种抗蚀剂显影方法包括以下步骤：提供衬底; 将抗蚀剂涂布在基材上; 在抗蚀剂中形成最新的图像; 在其中具有最新图像的抗蚀剂上提供显影剂; 在提供显影剂之后，旋转基底然后停止; 保持底物; 并旋转基板，然后停止。