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公开(公告)号：US07095496B2
公开(公告)日：2006-08-22
申请号：US10317898
申请日：2002-12-12
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/274 , G01N21/278 , G01N21/93
摘要： A calibration method suitable for highly precise and highly accurate surface metrology measurements is described. In preferred embodiments, an optical inspection tool including a movable optics system is characterized in terms of position and wavelength dependent quantities over a range of motion. Once the position-dependant quantities are determined at various wavelengths and positions, they are stored and used to interpret data from test wafers having an unknown metrology. Free of position-dependent variations and other information pertaining to the measurement system, the accuracy of the resulting wafer measurement more closely matches the precision of the tool than existing techniques. In particular embodiments, a portion of the characterization of the optical system is accomplished by using tilted black glass to provide a non-reflective reference.
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2.发明授权公开(公告)号：US07224450B2
公开(公告)日：2007-05-29
申请号：US11364312
申请日：2006-02-28
CPC分类号： G01N21/9501 , G01N21/274 , G01N21/278 , G01N21/93
摘要： A calibration method suitable for highly precise and highly accurate surface metrology measurements is described. In preferred embodiments, an optical inspection tool including a movable optics system is characterized in terms of position and wavelength dependent quantities over a range of motion. Once the position-dependant quantities are determined at various wavelengths and positions, they are stored and used to interpret data from test wafers having an unknown metrology. Free of position-dependent variations and other information pertaining to the measurement system, the accuracy of the resulting wafer measurement more closely matches the precision of the tool than existing techniques. In particular embodiments, a portion of the characterization of the optical system is accomplished by using tilted black glass to provide a non-reflective reference.
摘要翻译： 描述了适用于高精度和高精度表面测量测量的校准方法。 在优选实施例中，包括可移动光学系统的光学检查工具的特征在于在运动范围上的位置和波长相关量。 一旦在各种波长和位置确定位置相关量，就将它们存储并用于从具有未知计量学的测试晶片中解释数据。 没有与位置相关的变化和与测量系统相关的其他信息，所得到的晶片测量的精度与现有技术的精度更接近。 在特定实施例中，通过使用倾斜的黑色玻璃来提供非反射参考来实现光学系统的表征的一部分。
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公开(公告)号：US07215419B2
公开(公告)日：2007-05-08
申请号：US11364709
申请日：2006-02-28
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/274 , G01N21/278 , G01N21/93
摘要： A calibration method suitable for highly precise and highly accurate surface metrology measurements is described. In preferred embodiments, an optical inspection tool including a movable optics system is characterized in terms of position and wavelength dependent quantities over a range of motion. Once the position-dependant quantities are determined at various wavelengths and positions, they are stored and used to interpret data from test wafers having an unknown metrology. Free of position-dependent variations and other information pertaining to the measurement system, the accuracy of the resulting wafer measurement more closely matches the precision of the tool than existing techniques. In particular embodiments, a portion of the characterization of the optical system is accomplished by using tilted black glass to provide a non-reflective reference.
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