公开(公告)号：US20060115774A1

公开(公告)日：2006-06-01

申请号：US10999625

申请日：2004-11-30

Applicant: Yu-Hsi Wang ,  Shi-Che Wang ,  Hua-Tal Lin ,  Shang Ho Lin ,  Ching-Yu Chang ,  Chin-Hsiang Lin

Inventor： Yu-Hsi Wang ,  Shi-Che Wang ,  Hua-Tal Lin ,  Shang Ho Lin ,  Ching-Yu Chang ,  Chin-Hsiang Lin

IPC: G03F7/00

CPC classification number: G03F7/405 ,  H01L21/02057

Abstract: A novel method for eliminating or reducing the accumulation of electrostatic charges on semiconductor wafers during spin-rinse-drying of the wafers is disclosed. The method includes rinsing a wafer; applying an ionic solution to the wafer; and spin-drying the wafer. During the spin-drying step, the ionic solution neutralizes electrostatic charges on the wafer as the wafer is rotated. This reduces the formation of defects in devices fabricated on the wafer, as well as prevents or reduces electrostatic interference with processing equipment during photolithographic and other fabrication processes.

Abstract translation: 公开了一种用于在晶片的旋转冲洗干燥期间消除或减少半导体晶片上的静电电荷累积的新颖方法。 该方法包括冲洗晶片; 将离子溶液施加到晶片上; 并旋转晶片。 在旋转干燥步骤期间，当晶片旋转时，离子溶液中和晶片上的静电电荷。 这减少了在晶片上制造的器件中的缺陷的形成，以及在光刻和其它制造工艺期间防止或减少与处理设备的静电干扰。