Method and system for determining the alignment of a surface of a material in relation to a laser beam
    1.
    发明申请
    Method and system for determining the alignment of a surface of a material in relation to a laser beam 有权
    用于确定材料的表面相对于激光束的对准的方法和系统

    公开(公告)号:US20040070761A1

    公开(公告)日:2004-04-15

    申请号:US10269340

    申请日:2002-10-11

    Abstract: The present invention generally relates to a method and system for determining the position and alignment of a plane in relation to an intersecting axis and using that known position and alignment to allow for corrections to be made when using the plane as a reference plane. More particularly, the invention relates to a method and system for determining the angle of tilt of a planar surface in relation to a laser beam, and using the determined angle of tilt to calculate a correction factor to be applied to the laser beam. Briefly stated, the method and system ultimately calculates a correction factor, z-offset, that is applied when using the laser beam in a procedure.

    Abstract translation: 本发明一般涉及用于确定平面相对于交叉轴线的位置和对准的方法和系统,并且使用该已知位置和对准来允许在使用该平面作为参考平面时进行校正。 更具体地,本发明涉及一种用于确定平面相对于激光束的倾斜角度的方法和系统,并且使用确定的倾斜角度来计算要施加到激光束的校正因子。 简而言之,该方法和系统最终计算在过程中使用激光束时应用的校正因子z偏移。

    System and method for improved material processing using a laser beam
    2.
    发明申请
    System and method for improved material processing using a laser beam 有权
    使用激光束改善材料处理的系统和方法

    公开(公告)号:US20030212387A1

    公开(公告)日:2003-11-13

    申请号:US10394368

    申请日:2003-03-21

    Abstract: A method and system for improved material processing using a laser beam. The method and system includes directing a laser beam above, at or below the surface of the material in one or more preferred patterns and with preferred laser pulse characteristics specific to the material to reduce or mitigate the accumulation or effects of gas, debris, fluid, or other by-products of photodisruption either at the location where additional laser pulses are being placed or in other sensitive locations in the material.

    Abstract translation: 一种使用激光束改进材料处理的方法和系统。 该方法和系统包括以一种或多种优选图案将激光束引导到材料表面上方或下方,并且具有对材料特有的优选激光脉冲特性,以减少或减轻气体,碎片,流体, 或者在其他激光脉冲被放置的位置处或在材料中的其它敏感位置的光致破坏的其他副产物。

    Closed-loop focal positioning system and method
    3.
    发明申请
    Closed-loop focal positioning system and method 有权
    闭环焦点定位系统及方法

    公开(公告)号:US20040228013A1

    公开(公告)日:2004-11-18

    申请号:US10827837

    申请日:2004-04-20

    Abstract: A closed-loop focusing system and method positions a focusing assembly to a desired positioned. A feedback positioning device, such as a linear encoder, provides an actual or nullreadnull value for the linear movement of the focusing assembly. The desired position is compared to the actual position of the focusing assembly. If the two values are outside of a predetermined tolerance or valid range, then an audible or visual warning will be given. When a laser source is utilized with the focusing system, laser operation will be prevented if the two values are outside of an acceptable range. However, if the difference between the desired position and the actual position are within an acceptable range, the focusing assembly is repositioned to allow real-time systematic correction of the position of the focusing assembly.

    Abstract translation: 闭环聚焦系统和方法将聚焦组件定位到期望的位置。 诸如线性编码器的反馈定位装置为聚焦组件的线性运动提供实际或“读取”值。 将所需位置与聚焦组件的实际位置进行比较。 如果两个值超出了预定的公差或有效范围,则会发出声音或视觉警告。 当激光源与聚焦系统一起使用时,如果两个值在可接受的范围之外,则将防止激光操作。 然而,如果期望位置和实际位置之间的差在可接受的范围内,则聚焦组件被重新定位以允许对聚焦组件的位置的实时系统校正。

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