公开(公告)号：US06391164B1

公开(公告)日：2002-05-21

申请号：US09603432

申请日：2000-06-23

Applicant: Isak I. Beilis ,  Raymond L Boxman ,  Samuel Goldsmith ,  Michael Keidar ,  Hanan Rosenthal

Inventor： Isak I. Beilis ,  Raymond L Boxman ,  Samuel Goldsmith ,  Michael Keidar ,  Hanan Rosenthal

IPC: C23C1434

CPC classification number: H01J37/32055 ,  C23C14/325 ,  H01J37/32614

Abstract: A process and apparatus for depositing thin films and coatings using a vacuum arc plasma source having hot, non-consumable anode is described. Plasma and macroparticles of the cathode material are emitted from the cathode. Part of this material arrives at the hot refractory anode, where it is re-evaporated without macroparticle generation. Substrates exposed to the vapor flow from the anode, but shielded from a direct line of sight with the cathode, are coated with cathode material without macroparticle inclusions.

Abstract translation: 描述了使用具有热的非消耗性阳极的真空电弧等离子体源沉积薄膜和涂层的工艺和设备。 阴极材料的等离子体和大颗粒从阴极发射。 这种材料的一部分到达耐火难燃阳极，在那里它被再蒸发而不产生大颗粒。 暴露于来自阳极的蒸汽流，但与阴极直接观察的屏蔽的基板被涂覆有没有大颗粒夹杂物的阴极材料。