公开(公告)号：US09896767B2

公开(公告)日：2018-02-20

申请号：US14248922

申请日：2014-04-09

申请人： Kennametal Inc.

发明人： Vineet Kumar ,  Ronald Penich ,  Yixiong Liu

IPC分类号： C23C14/06 ,  C23C28/04 ,  C04B35/66 ,  H01J37/32 ,  C23C14/00 ,  C23C14/02 ,  C23C14/32 ,  C23C28/00

CPC分类号： C23C28/042 ,  C04B35/66 ,  C04B2235/3886 ,  C23C14/0021 ,  C23C14/024 ,  C23C14/0641 ,  C23C14/325 ,  C23C28/044 ,  C23C28/42 ,  H01J37/32055 ,  H01J37/32568 ,  H01J37/32614 ,  H01J37/32669 ,  H01J2237/332 ,  Y10T428/265 ,  Y10T428/31678

摘要： In one aspect, coated cutting tools are described herein comprising a substrate and a coating comprising a refractory layer deposited by physical vapor deposition adhered to the substrate, the refractory layer comprising M1-xAlxN wherein x≧0.68 and M is titanium, chromium or zirconium, the refractory layer including a cubic crystalline phase and having hardness of at least 25 GPa.

公开(公告)号：US09839896B2

公开(公告)日：2017-12-12

申请号：US14547747

申请日：2014-11-19

申请人： The George Washington University

发明人： Michael Keidar ,  Alexey Shashurin

IPC分类号： B01J19/08 ,  B82Y30/00 ,  B82Y40/00 ,  H01J37/32 ,  C01B31/04

CPC分类号： B01J19/088 ,  B01J19/08 ,  B01J2219/0809 ,  B01J2219/0822 ,  B01J2219/083 ,  B01J2219/0839 ,  B01J2219/0875 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/184 ,  C01B32/186 ,  H01J37/32614 ,  H01J2329/0444

摘要： A system and method for producing graphene includes a discharge assembly and a substrate assembly. The discharge assembly includes a cathode and an anode, which in one embodiment are offset from each other. The anode produces a flux stream that is deposited onto a substrate. A collection device removes the deposited material from the rotating substrate. The flux stream can be a carbon vapor, with the deposited flux being graphene.

公开(公告)号：US09793098B2

公开(公告)日：2017-10-17

申请号：US14064617

申请日：2013-10-28

申请人： Vapor Technologies, Inc.

发明人： Vladimir Gorokhovsky ,  William Grant ,  Edward Taylor ,  David Humenik

IPC分类号： H01J37/32 ,  H01J37/34 ,  C23C14/35 ,  C23C14/54

CPC分类号： H01J37/3408 ,  C23C14/35 ,  C23C14/352 ,  C23C14/355 ,  C23C14/54 ,  H01J37/32055 ,  H01J37/32357 ,  H01J37/32614 ,  H01J37/32917 ,  H01J37/32935 ,  H01J37/34 ,  H01J37/3405 ,  H01J37/3417 ,  H01J37/3438

摘要： A vacuum coating and plasma treatment system includes a magnetron cathode with a long edge and a short edge. The magnetic pole of the magnetron results in an electromagnetic barrier. At least one remote arc discharge is generated separate from the magnetron cathode and in close proximity to the cathode so that it is confined within a volume adjacent to the magnetron target. The remote arc discharge extends parallel to the long edge of the magnetron target and is defined by the surface of the target on one side and the electromagnetic barrier on all other sides. There is a remote arc discharge cathode hood and anode hood extending over the arc discharge and across the short edge of the magnetron cathode. Outside of the plasma assembly is a magnetic system creating magnetic field lines which extend into and confine the plasma in front of the substrate.

公开(公告)号：US20160319439A1

公开(公告)日：2016-11-03

申请号：US15210566

申请日：2016-07-14

申请人： KENNAMETAL INC.

发明人： Vineet KUMAR ,  Ronald Penich ,  Yixiong Liu

IPC分类号： C23C28/04 ,  H01J37/32 ,  C23C28/00 ,  C23C14/06 ,  C23C14/02 ,  C04B35/66 ,  C23C14/32

CPC分类号： C23C28/042 ,  C04B35/66 ,  C04B2235/3886 ,  C23C14/0021 ,  C23C14/024 ,  C23C14/0641 ,  C23C14/325 ,  C23C28/044 ,  C23C28/42 ,  H01J37/32055 ,  H01J37/32568 ,  H01J37/32614 ,  H01J37/32669 ,  H01J2237/332 ,  Y10T428/265 ,  Y10T428/31678

摘要： In one aspect, coated cutting tools are described herein comprising a substrate and a coating comprising a refractory layer deposited by physical vapor deposition adhered to the substrate, the refractory layer comprising M1-xAlxN wherein x≧0.68 and M is titanium, chromium or zirconium, the refractory layer including a cubic crystalline phase and having hardness of at least 25 GPa.

摘要翻译： 在一个方面，本文描述了涂覆的切削工具，其包括基底和包括通过物理气相沉积粘附到基底上而沉积的耐火层的涂层，所述耐火层包含M1-xAlxN，其中x≥0.68，M是钛，铬或锆， 所述耐火层包括立方结晶相并且具有至少25GPa的硬度。

公开(公告)号：US20160260583A1

公开(公告)日：2016-09-08

申请号：US15027643

申请日：2014-09-25

申请人： UNITED TECHNOLOGIES CORPORATION

发明人： Thomas Balzano ,  Russell A. Beers

IPC分类号： H01J37/32 ,  C23C14/06 ,  C23C14/08 ,  C23C14/32 ,  C23C14/14

CPC分类号： H01J37/3266 ,  C23C14/0635 ,  C23C14/0641 ,  C23C14/0664 ,  C23C14/081 ,  C23C14/083 ,  C23C14/14 ,  C23C14/325 ,  H01J37/32055 ,  H01J37/32522 ,  H01J37/32614 ,  H01J37/32669 ,  H01J37/32816 ,  H01J37/3435 ,  H01J2237/327 ,  H01J2237/332

摘要： A cathodic arc coating apparatus includes a vessel, a cathode disposed in the vessel, and a stinger assembly. The stinger assembly includes a first magnetic field generator disposed in a first stinger cup in selective contact with the cathode. The first stinger cup has at least a first electrically conductive cup portion spaced from a second electrically conductive cup portion by a thermally insulating layer therebetween.

摘要翻译： 阴极电弧涂覆装置包括容器，设置在容器中的阴极和支架组件。 托泊架组件包括设置在与阴极选择性接触的第一托管杯中的第一磁场发生器。 第一个刺针杯具有至少一个第一导电杯部分，该第一导电杯部分通过其间的隔热层与第二导电杯部分间隔开。

公开(公告)号：US20160208375A1

公开(公告)日：2016-07-21

申请号：US14914202

申请日：2014-08-13

申请人： KABUSHIKI KAISHA KOBE SEIKO SHO(KOBE STEEL, LTD.)

发明人： Kenji YAMAMOTO

IPC分类号： C23C14/22 ,  C04B35/581 ,  C04B35/58

CPC分类号： C23C14/22 ,  C04B35/58007 ,  C04B35/58021 ,  C04B35/581 ,  C23C14/0021 ,  C23C14/0664 ,  C23C14/325 ,  H01J37/32055 ,  H01J37/32614 ,  H01J37/32669

摘要： A hard film whose composition formula satisfies M1-a-bCaNb, in which M is at least one element selected from Ti, Cr and Al, or is the element and at least one element selected from Group 4 elements except for Ti, Group 5 elements, Group 6 elements except for Cr, Si, Y, and rare earth elements. Atomic ratios of M, C and N satisfy: 0.01≦a≦0.50; 0.10≦b≦0.50; and 0

摘要翻译： 其组成式满足M1-a-bCaNb的硬膜，其中M是选自Ti，Cr和Al中的至少一种元素，或者除了Ti之外的元素和选自第4族元素中的至少一种元素，第5族元素 ，除了Cr，Si，Y和稀土元素之外的第6族元素。 M，C和N的原子比满足：0.01＆nlE; a＆nlE; 0.50; 0.10＆nlE; b＆nlE; 0.50; 和0 <1-a-b。 C-C键合与膜中所有C键的比率y为0.20以上。

公开(公告)号：US20160178054A1

公开(公告)日：2016-06-23

申请号：US14906929

申请日：2014-05-26

申请人： KABUSHIKI KAISHA RIKEN

发明人： Katsuhiro TSUJI

IPC分类号： F16J9/26 ,  C23C14/22 ,  C23C14/32 ,  F16J9/28 ,  C23C14/06

CPC分类号： F16J9/26 ,  C23C14/0605 ,  C23C14/225 ,  C23C14/226 ,  C23C14/325 ,  C23C14/505 ,  F02F5/00 ,  F16J9/28 ,  H01J37/32055 ,  H01J37/32614 ,  H01J37/32715

摘要： A piston ring that may be mounted to a piston made of an aluminum alloy that slides with a cylinder liner containing Fe as a main component is disclosed. The piston ring is formed to have hard carbon coatings containing no hydrogen formed on an outer periphery and at least one side surface of the piston ring, the hard carbon coating formed on the outer periphery having no columnar structure, and the hard carbon coating formed on the side surface having a columnar structure extending in a direction intersecting with the side surface.

摘要翻译： 公开了一种活塞环，其可以安装在由含有Fe作为主要成分的气缸套滑动的铝合金制的活塞上。 活塞环形成为具有在外周上形成的不含氢的硬碳涂层，活塞环的至少一个侧表面，形成在外周上的没有柱状结构的硬碳涂层和形成在 所述侧面具有在与所述侧面相交的方向上延伸的柱状结构。

公开(公告)号：US20160086770A1

公开(公告)日：2016-03-24

申请号：US14787272

申请日：2013-04-30

申请人： NIPPON ITF, INC.

发明人： NAOTO OKAZAKI ,  KEN YOSHIHARA ,  HIROSHI ISHIZUKA ,  TOMOYASU MATSUNO ,  SHINJI NARAHARA

IPC分类号： H01J37/32

CPC分类号： H01J37/32055 ,  C23C14/325 ,  H01J37/32614 ,  H01J37/3266 ,  H01J37/32669 ,  H01J2237/327 ,  H01J2237/332

摘要： Provided is an arc evaporation source for melting and evaporating a cathode material by arc discharge for film formation on a surface of a substrate, and including a cathode formed in a substantially disc shape and a magnetic field generating apparatus, disposed at a back side of the cathode. The magnetic field generating apparatus generates a magnetic field which forms magnetic lines that form an acute angle with respect to a substrate direction at an outer circumferential surface of the cathode, magnetic lines that are substantially perpendicular to the discharge surface at an outermost circumference part of the discharge surface of the cathode, and magnetic lines that form an acute angle with respect to a center direction of the cathode at a region towards the outer circumferential surface of the discharge surface of the cathode, by at least one permanent magnet disposed at the back side of the cathode.

摘要翻译： 本发明提供一种电弧蒸发源，用于通过电弧放电在基板的表面上熔融并蒸发阴极材料，并且包括形成为大致圆盘形状的阴极和磁场产生装置，该阴极材料设置在基板的背面 阴极。 磁场产生装置产生磁场，该磁场形成在阴极的外周面处相对于基板方向形成锐角的磁线，在与该阴极的最外周部分基本垂直于排出表面的磁线 阴极的放电表面和在阴极的放电表面的外周表面的区域处相对于阴极的中心方向形成锐角的磁线，通过设置在阴极的至少一个永磁体 的阴极。

公开(公告)号：US20150274566A1

公开(公告)日：2015-10-01

申请号：US14230914

申请日：2014-03-31

申请人： Corning Incorporated

发明人： Daniel Robert Boughton

IPC分类号： C03B5/02 ,  C03B3/02 ,  C03B5/185

CPC分类号： C03B19/109 ,  C03B19/1005 ,  C03B19/1015 ,  H01J37/32082 ,  H01J37/32614 ,  H01J37/32825 ,  H05H1/30 ,  H05H1/42

摘要： Methods and apparatus provide for: producing a plasma plume within a plasma containment vessel from a source of plasma gas; feeding an elongate feedstock material having a longitudinal axis into the plasma containment vessel such that at least a distal end of the feedstock material is heated within the plasma plume; and spinning the feedstock material about the longitudinal axis as the distal end of the feedstock material advances into the plasma plume, where the feedstock material is a mixture of compounds that have been mixed, formed into the elongate shape, and at least partially sintered.

摘要翻译： 方法和装置提供：在等离子体容纳容器内从等离子体气体源产生等离子体羽流; 将具有纵向轴线的细长进料材料进料到等离子体容纳容器中，使得原料材料的至少远端在等离子体羽流内被加热; 并且当原料材料的远端进入等离子体羽流时，围绕纵向轴线旋转原料材料，其中原料是混合形成细长形状并且至少部分烧结的化合物的混合物。

公开(公告)号：US20110073471A1

公开(公告)日：2011-03-31

申请号：US12965054

申请日：2010-12-10

申请人： Scott Andrew Weaver ,  William Thomas Carter ,  Paul Mario Marruso

发明人： Scott Andrew Weaver ,  William Thomas Carter ,  Paul Mario Marruso

IPC分类号： C23C14/34

CPC分类号： C23C14/325 ,  C23C14/16 ,  H01J37/32596 ,  H01J37/32614

摘要： A method and apparatus for depositing a coating material on a surface of a substrate by an ion plasma deposition process using a hollow cathode is disclosed. The cathode may be a substantially cylindrical hollow cathode. A plasma arc is formed on the outer circumference of the cathode to remove coating material from the cathode, which is then deposited on a surface of a substrate. An internal arc drive magnet is contained within the hollow bore of the cathode and cooling is provided to the magnet during operation.

摘要翻译： 公开了一种通过使用空心阴极的离子等离子体沉积工艺将涂层材料沉积在衬底的表面上的方法和装置。 阴极可以是基本上圆柱形的空心阴极。 在阴极的外圆周上形成等离子体电弧，以从阴极去除涂层材料，然后将其沉积在衬底的表面上。 内部电弧驱动磁体包含在阴极的中空孔内，并且在操作期间将冷却提供给磁体。