摘要:
The present invention discloses a method and structure for accelerating image-sensing speed in a CCD image-sensing device. According to the present invention, specific shift-control electrodes (G2j−1 and G2j) are biased to serve as a block unit. After the CCD image-sensing device serially shifts out the charge packets actually corresponding to the image of a sensed object, the CCD image-sensing device can repeat the operation for image sensing without first shifting out the remaining or undesired charge packets, thereby accelerating image-sensing speed.
摘要:
A pixel structure for a liquid crystal display has a first substrate with respect to a pixel region. A W-like extruding structure composed of two V-like is formed on a surface of the substrate. A second substrate with several openings is also provided in parallel to the first substrate. The openings of the second substrate are aligned along a direction from a tip of the V-like to an edge of the pixel. Moreover, a liquid crystal layer is located between the first substrate and a second substrate, wherein the extruding structure abuts the liquid crystal layer.
摘要:
The invention provides a method for forming a multi-gap liquid crystal display. The method includes providing a substrate. A first insulating layer is formed on the substrate. Several bus lines are formed on the first insulating layer. A second insulating layer is formed on the first insulating layer and the bus lines. The bus lines divides the substrate into a first color region, a second color region, and a third color region. A photoresist layer covers the second color region and the third color region, where the photoresist layer at the second color region is thinner than that at the third color region. A portion of the first insulating layer and the second insulating layer is etched to expose the substrate at the first color region. A portion of the photoresist layer at the second color region is removed, whereby the second insulating layer is exposed and the remaining photoresist layer still covers the third color region and the bus lines. The second insulating layer is etched to expose the first insulating at the second color region, using the remaining photoresist layer as a mask. Alternatively, the first step of etching can only remove a portion or the whole of the second insulating layer in the first color region, and then the second step of etching removes the first insulating layer to expose the substrate.