METHOD OF INHIBITING FORMATION OF DEPOSITS IN A MANUFACTURING SYSTEM
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    发明申请
    METHOD OF INHIBITING FORMATION OF DEPOSITS IN A MANUFACTURING SYSTEM 审中-公开
    在制造系统中抑制沉积物形成的方法

    公开(公告)号:US20120114860A1

    公开(公告)日:2012-05-10

    申请号:US13383598

    申请日:2010-07-14

    IPC分类号: B05D1/00

    摘要: A method inhibits formation of deposits on a cooling surface of an electrode. The electrode is used in a manufacturing system that deposits a material on a carrier body. The cooling surface comprises copper. The system includes a reactor defining a chamber. The electrode is at least partially disposed within the chamber and supports the carrier body. A circulation system, in fluid communication with the electrode, transports a coolant composition to and from the cooling surface. The coolant composition comprises a coolant and dissolved copper from the cooling surface. A filtration system is in fluid communication with the circulation system. The method heats the electrode. The cooling surface of the electrode is contacted with the coolant composition. The material is deposited on the carrier body, and the coolant composition is filtered with the filtration system to remove at least a portion of the dissolved copper therefrom.

    摘要翻译: 一种方法抑制沉积物在电极的冷却表面上的形成。 电极用于将材料沉积在载体上的制造系统中。 冷却表面包括铜。 该系统包括限定腔室的反应器。 电极至少部分地设置在室内并支撑载体主体。 与电极流体连通的循环系统将冷却剂组合物输送到冷却表面。 冷却剂组合物包括来自冷却表面的冷却剂和溶解的铜。 过滤系统与循环系统流体连通。 该方法加热电极。 电极的冷却表面与冷却剂组合物接触。 将材料沉积在载体上,并用过滤系统过滤冷却剂组合物以从其中去除至少一部分溶解的铜。