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1.发明申请SYSTEM AND METHOD FOR EMPLOYING PATTERNING PROCESS STATISTICS FOR GROUND RULES WAIVERS AND OPTIMIZATION 有权用于接地规则的绘图过程统计的系统和方法和优化公开(公告)号：US20080301624A1
公开(公告)日：2008-12-04
申请号：US12175097
申请日：2008-07-17
申请人： Fook-Luen Heng , Mark Alan Lavin , Jin-Fuw Lee , Chieh-yu Lin , Jawahar Pundalik Nayak , Rama Nand Singh
发明人： Fook-Luen Heng , Mark Alan Lavin , Jin-Fuw Lee , Chieh-yu Lin , Jawahar Pundalik Nayak , Rama Nand Singh
IPC分类号： G06F17/50
CPC分类号： G06F17/5068
摘要： A system and method of employing patterning process statistics to evaluate layouts for intersect area analysis includes applying Optical Proximity Correction (OPC) to the layout, simulating images formed by the mask and applying patterning process variation distributions to influence and determine corrective actions taken to improve and optimize the rules for compliance by the layout. The process variation distributions are mapped to an intersect area distribution by creating a histogram based upon a plurality of processes for an intersect area. The intersect area is analyzed using the histogram to provide ground rule waivers and optimization.
摘要翻译： 使用图案化处理统计来评估交叉区域分析的布局的系统和方法包括对布局应用光学近似校正（OPC），模拟由掩模形成的图像并应用图案化过程变化分布来影响和确定纠正措施以改进和 优化布局符合规则。 通过基于交叉区域的多个处理创建直方图，将过程变化分布映射到交叉区域分布。 使用直方图分析交叉区域，以提供基本规则豁免和优化。
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2.发明授权System and method for employing patterning process statistics for ground rules waivers and optimization 有权采用图形化处理统计的基本规则放弃和优化的系统和方法公开(公告)号：US07962865B2
公开(公告)日：2011-06-14
申请号：US12175097
申请日：2008-07-17
申请人： Fook-Luen Heng , Mark Alan Lavin , Jin-Fuw Lee , Chieh-yu Lin , Jawahar Pundalik Nayak , Rama Nand Singh
发明人： Fook-Luen Heng , Mark Alan Lavin , Jin-Fuw Lee , Chieh-yu Lin , Jawahar Pundalik Nayak , Rama Nand Singh
CPC分类号： G06F17/5068
摘要： A system and method of employing patterning process statistics to evaluate layouts for intersect area analysis includes applying Optical Proximity Correction (OPC) to the layout, simulating images formed by the mask and applying patterning process variation distributions to influence and determine corrective actions taken to improve and optimize the rules for compliance by the layout. The process variation distributions are mapped to an intersect area distribution by creating a histogram based upon a plurality of processes for an intersect area. The intersect area is analyzed using the histogram to provide ground rule waivers and optimization.
摘要翻译： 使用图案化处理统计来评估交叉区域分析的布局的系统和方法包括对布局应用光学近似校正（OPC），模拟由掩模形成的图像并应用图案化过程变化分布来影响和确定纠正措施以改进和 优化布局符合规则。 通过基于交叉区域的多个处理创建直方图，将过程变化分布映射到交叉区域分布。 使用直方图分析交叉区域，以提供基本规则豁免和优化。
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公开(公告)号：US07448018B2
公开(公告)日：2008-11-04
申请号：US11519617
申请日：2006-09-12
申请人： Fook-Luen Heng , Mark Alan Lavin , Jin-Fuw Lee , Chieh-yu Lin , Jawahar Pundalik Nayak , Rama Nand Singh
发明人： Fook-Luen Heng , Mark Alan Lavin , Jin-Fuw Lee , Chieh-yu Lin , Jawahar Pundalik Nayak , Rama Nand Singh
CPC分类号： G06F17/5068
摘要： A system and method of employing patterning process statistics to evaluate layouts for intersect area analysis includes applying Optical Proximity Correction (OPC) to the layout, simulating images formed by the mask and applying patterning process variation distributions to influence and determine corrective actions taken to improve and optimize the rules for compliance by the layout. The process variation distributions are mapped to an intersect area distribution by creating a histogram based upon a plurality of processes for an intersect area. The intersect area is analyzed using the histogram to provide ground rule waivers and optimization.
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4.发明申请System and method for employing patterning process statistics for ground rules waivers and optimization 失效采用图形化处理统计的基本规则放弃和优化的系统和方法公开(公告)号：US20080066047A1
公开(公告)日：2008-03-13
申请号：US11519617
申请日：2006-09-12
申请人： Fook-Luen Heng , Mark Alan Lavin , Jin-Fuw Lee , Chieh-yu Lin , Jawahar Pundalik Nayak , Rama Nand Singh
发明人： Fook-Luen Heng , Mark Alan Lavin , Jin-Fuw Lee , Chieh-yu Lin , Jawahar Pundalik Nayak , Rama Nand Singh
IPC分类号： G06F17/50
CPC分类号： G06F17/5068
摘要： A system and method of employing patterning process statistics to evaluate layouts for intersect area analysis includes applying Optical Proximity Correction (OPC) to the layout, simulating images formed by the mask and applying patterning process variation distributions to influence and determine corrective actions taken to improve and optimize the rules for compliance by the layout. The process variation distributions are mapped to an intersect area distribution by creating a histogram based upon a plurality of processes for an intersect area. The intersect area is analyzed using the histogram to provide ground rule waivers and optimization.
摘要翻译： 使用图案化处理统计来评估交叉区域分析的布局的系统和方法包括对布局应用光学近似校正（OPC），模拟由掩模形成的图像并应用图案化过程变化分布来影响和确定纠正措施以改进和 优化布局符合规则。 通过基于交叉区域的多个处理创建直方图，将过程变化分布映射到交叉区域分布。 使用直方图分析交叉区域，以提供基本规则豁免和优化。
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