公开(公告)号：US20080301624A1

公开(公告)日：2008-12-04

申请号：US12175097

申请日：2008-07-17

Applicant: Fook-Luen Heng ,  Mark Alan Lavin ,  Jin-Fuw Lee ,  Chieh-yu Lin ,  Jawahar Pundalik Nayak ,  Rama Nand Singh

Inventor： Fook-Luen Heng ,  Mark Alan Lavin ,  Jin-Fuw Lee ,  Chieh-yu Lin ,  Jawahar Pundalik Nayak ,  Rama Nand Singh

IPC: G06F17/50

CPC classification number: G06F17/5068

Abstract: A system and method of employing patterning process statistics to evaluate layouts for intersect area analysis includes applying Optical Proximity Correction (OPC) to the layout, simulating images formed by the mask and applying patterning process variation distributions to influence and determine corrective actions taken to improve and optimize the rules for compliance by the layout. The process variation distributions are mapped to an intersect area distribution by creating a histogram based upon a plurality of processes for an intersect area. The intersect area is analyzed using the histogram to provide ground rule waivers and optimization.

Abstract translation: 使用图案化处理统计来评估交叉区域分析的布局的系统和方法包括对布局应用光学近似校正（OPC），模拟由掩模形成的图像并应用图案化过程变化分布来影响和确定纠正措施以改进和 优化布局符合规则。 通过基于交叉区域的多个处理创建直方图，将过程变化分布映射到交叉区域分布。 使用直方图分析交叉区域，以提供基本规则豁免和优化。

公开(公告)号：US07090967B2

公开(公告)日：2006-08-15

申请号：US10248232

申请日：2002-12-30

Applicant: Zhijian Lu ,  Chieh-Yu Lin

Inventor： Zhijian Lu ,  Chieh-Yu Lin

IPC: G03F7/26

CPC classification number: G03F7/40 ,  H01L21/0273 ,  H01L21/31144 ,  H01L21/32139

Abstract: A method of transferring a pattern onto a substrate, in the fabrication of ICs, is disclosed. The substrate is coated with a photoresist layer, wherein the photoresist layer is selectively exposed and developed, producing sidewalls that exhibit roughness. The roughness is smoothened out by coating the photoresist layer with a coating layer.

Abstract translation: 公开了一种在IC的制造中将图案转印到基板上的方法。 衬底涂覆有光致抗蚀剂层，其中光致抗蚀剂层被选择性地暴露和显影，产生表现出粗糙度的侧壁。 通过用涂层涂覆光致抗蚀剂层，使粗糙度平滑化。

公开(公告)号：US5541772A

公开(公告)日：1996-07-30

申请号：US163480

申请日：1993-12-07

Applicant: Chieh-Yu Lin

Inventor： Chieh-Yu Lin

IPC: G02B15/16 ,  G02B15/14 ,  G02B3/02

CPC classification number: G02B15/161

Abstract: A camera zoom lens consists of five lens elements arranged in two groups, in which the first three elements form a front lens group with a positive refractive power and the last two elements form a rear lens group with a negative refracting power. In the lens system, the front lens group is composed of a negative first lens element having its concave surface directed toward the object side of the lens system, a negative second lens element, and a positive third lens element; the rear lens group consists of a positive fourth lens element having its concave surface directed toward the object side of the lens system and a negative fifth lens element having its concave surface directed toward the object side of the lens system. The zoom lens system is suitable for use in a 35 mm lens shutter camera.

Abstract translation: 照相机变焦镜头由两组布置的五个透镜元件组成，其中前三个元件形成具有正折光力的前透镜组，最后两个元件形成具有负折射光焦度的后透镜组。 在透镜系统中，前透镜组由具有指向透镜系统的物体侧的凹面的负第一透镜元件，负第二透镜元件和正第三透镜元件构成; 后透镜组由正的第四透镜元件组成，其正面具有朝向透镜系统的物体侧的凹面，而第四透镜元件的凹面指向透镜系统的物体侧。 变焦镜头系统适用于35 mm镜头快门摄像头。

公开(公告)号：US5412508A

公开(公告)日：1995-05-02

申请号：US90509

申请日：1993-07-13

Applicant: Chieh-Yu Lin

Inventor： Chieh-Yu Lin

IPC: G02B15/17 ,  G02B15/14 ,  G02B13/18

CPC classification number: G02B15/17

Abstract: A zoom lens system consists of five lens elements arranged in two groups. Counting from the object side, the first three elements form a front lens group with positive refracting power and the last two elements form a rear lens group with negative refracting power. An airspace is reserved between the front lens group and the rear lens group and it is made variable for zooming. The first lens element in the front lens group is a negative meniscus lens element having its concave lens surface directed toward the object side. Both the second and third lenses in the front lens group are positive lens element. The fourth lens in the rear lens group is positive meniscus lens element, and the fifth lens is a lens element with negative refracting power. In the lens composition, both the front lens group and the rear lens group at least include an aspherical surface respectively.

Abstract translation: 变焦镜头系统由五组透镜组成，分为两组。 从物体侧开始，前三个元件形成具有正折射率的前透镜组，最后两个元件形成具有负折射力的后透镜组。 前透镜组和后透镜组之间保留一个空间，并可变焦以进行变焦。 前透镜组中的第一透镜元件是其凹透镜表面朝向物体侧的负弯月透镜元件。 前透镜组中的第二和第三透镜都是正透镜元件。 后透镜组中的第四透镜是正弯月透镜元件，第五透镜是具有负折射力的透镜元件。 在透镜组合物中，前透镜组和后透镜组分别至少包括非球面。

公开(公告)号：US5341244A

公开(公告)日：1994-08-23

申请号：US940973

申请日：1992-09-04

Applicant: Chieh-Yu Lin

Inventor： Chieh-Yu Lin

IPC: G02B15/16 ,  G02B15/14

CPC classification number: G02B15/161

Abstract: A zoom lens system consists of five lens elements arranged in two groups, in which the first three elements form a front lens group with positive refracting power and the last two elements form a rear lens group with negative refracting power. In the lens system of the present invention, the front lens group is composed of a positive first lens element, a negative second lens element, and a positive third lens element; the rear lens group consists of a positive fourth lens element and a negative fifth negative lens element. The airspace between the front lens group and the rear lens group is variable for zooming operation. Both the front lens group and rear lens group comprise at least an aspheric lens elements.

Abstract translation: 变焦透镜系统包括两组布置的五个透镜元件，其中前三个元件形成具有正折射力的前透镜组，最后两个元件形成具有负折射力的后透镜组。 在本发明的透镜系统中，前透镜组由正的第一透镜元件，负的第二透镜元件和正的第三透镜元件组成; 后透镜组由正第四透镜元件和负第五负透镜元件组成。 前透镜组和后透镜组之间的空间对于变焦操作是可变的。 前透镜组和后透镜组都至少包括非球面透镜元件。

公开(公告)号：US07448018B2

公开(公告)日：2008-11-04

申请号：US11519617

申请日：2006-09-12

Applicant: Fook-Luen Heng ,  Mark Alan Lavin ,  Jin-Fuw Lee ,  Chieh-yu Lin ,  Jawahar Pundalik Nayak ,  Rama Nand Singh

Inventor： Fook-Luen Heng ,  Mark Alan Lavin ,  Jin-Fuw Lee ,  Chieh-yu Lin ,  Jawahar Pundalik Nayak ,  Rama Nand Singh

IPC: G06F17/50 ,  G06F19/00 ,  G03F1/00 ,  G21K5/00

CPC classification number: G06F17/5068

Abstract: A system and method of employing patterning process statistics to evaluate layouts for intersect area analysis includes applying Optical Proximity Correction (OPC) to the layout, simulating images formed by the mask and applying patterning process variation distributions to influence and determine corrective actions taken to improve and optimize the rules for compliance by the layout. The process variation distributions are mapped to an intersect area distribution by creating a histogram based upon a plurality of processes for an intersect area. The intersect area is analyzed using the histogram to provide ground rule waivers and optimization.

公开(公告)号：US20080066047A1

公开(公告)日：2008-03-13

申请号：US11519617

申请日：2006-09-12

Applicant: Fook-Luen Heng ,  Mark Alan Lavin ,  Jin-Fuw Lee ,  Chieh-yu Lin ,  Jawahar Pundalik Nayak ,  Rama Nand Singh

Inventor： Fook-Luen Heng ,  Mark Alan Lavin ,  Jin-Fuw Lee ,  Chieh-yu Lin ,  Jawahar Pundalik Nayak ,  Rama Nand Singh

IPC: G06F17/50

CPC classification number: G06F17/5068

Abstract: A system and method of employing patterning process statistics to evaluate layouts for intersect area analysis includes applying Optical Proximity Correction (OPC) to the layout, simulating images formed by the mask and applying patterning process variation distributions to influence and determine corrective actions taken to improve and optimize the rules for compliance by the layout. The process variation distributions are mapped to an intersect area distribution by creating a histogram based upon a plurality of processes for an intersect area. The intersect area is analyzed using the histogram to provide ground rule waivers and optimization.

Abstract translation: 使用图案化处理统计来评估交叉区域分析的布局的系统和方法包括对布局应用光学近似校正（OPC），模拟由掩模形成的图像并应用图案化过程变化分布来影响和确定纠正措施以改进和 优化布局符合规则。 通过基于交叉区域的多个处理创建直方图，将过程变化分布映射到交叉区域分布。 使用直方图分析交叉区域，以提供基本规则豁免和优化。

公开(公告)号：US5287293A

公开(公告)日：1994-02-15

申请号：US76085

申请日：1993-06-14

Applicant: Hsien-Yei Chen ,  Chung-Mu Hwang ,  Jung-Lung Chang ,  Chieh-Yu Lin ,  Ruey-Yang Wang ,  Jyh-Jye Jeng

Inventor： Hsien-Yei Chen ,  Chung-Mu Hwang ,  Jung-Lung Chang ,  Chieh-Yu Lin ,  Ruey-Yang Wang ,  Jyh-Jye Jeng

IPC: G06T7/00 ,  G06F15/46 ,  G06F15/70

CPC classification number: G06T7/0006 ,  G06T7/0083 ,  G06T2207/10056 ,  G06T2207/20148 ,  G06T2207/30164

Abstract: A method and apparatus for the automatically inspecting the contours of a gear for manufacturing errors. According to the method, a gear to be inspected is imaged on an imaging surface to form a gear image. A digitized image indicative of the gear image is generated. The digitized image comprises a plurality of pixels. The pixels each have a gray value and coordinates which represent the location of the pixel within the digitized image. Each pixel is classified into a first or a second class by comparing the gray value of the pixel to a predetermined threshold value. The coordinates of pixels corresponding to the contours of the gear are determined from the classes of pixels. The manufacturing errors of the gear are calculated by comparing the coordinates of the pixels corresponding to the contours of the gear to a standard gear pattern. The apparatus, in its preferred embodiment, includes a base and collimated light source to illuminate the gear, a microscope to magnify an image of the gear and a CCD camera to generate a digitized image indicative of the magnified gear image. A digital computer is also included to assign a gray value to each pixel in the digitized image, to classify each pixel into a first or second class by comparing the gray value of the pixel with a predetermined threshold value, to determine the coordinates of pixels corresponding to the contours of the gear and to calculate the manufacturing errors of the gear by comparing the coordinates of pixels corresponding to the contours of the gear with a standard gear pattern. The manufacturing errors include runout error, pitch error and profile error.

Abstract translation: 用于自动检查齿轮轮廓以制造误差的方法和装置。 根据该方法，将要检查的齿轮在成像表面上成像以形成齿轮图像。 产生指示齿轮图像的数字化图像。 数字化图像包括多个像素。 像素各自具有灰度值和表示像素在数字化图像内的位置的坐标。 通过将像素的灰度值与预定阈值进行比较，将每个像素分类为第一类或第二类。 根据像素的类别确定与齿轮的轮廓相对应的像素的坐标。 通过将与齿轮轮廓对应的像素的坐标与标准齿轮图案进行比较来计算齿轮的制造误差。 在其优选实施例中，该装置包括用于照亮齿轮的基座和准直光源，用于放大齿轮图像的显微镜和CCD相机以产生指示放大齿轮图像的数字化图像。 还包括数字计算机以对数字化图像中的每个像素分配灰度值，通过将像素的灰度值与预定阈值进行比较来将每个像素分类为第一类或第二类，以确定相应像素的坐标 相对于齿轮的轮廓，并且通过将对应于齿轮的轮廓的像素的坐标与标准齿轮图案进行比较来计算齿轮的制造误差。 制造误差包括跳动误差，螺距误差和轮廓误差。

公开(公告)号：US20060150131A1

公开(公告)日：2006-07-06

申请号：US11029884

申请日：2005-01-05

Applicant: Kafai Lai ,  Chieh-Yu Lin ,  Nayak Jawahar ,  Mukherjee Maharaj

Inventor： Kafai Lai ,  Chieh-Yu Lin ,  Nayak Jawahar ,  Mukherjee Maharaj

IPC: G06F17/50 ,  G06F9/45

CPC classification number: G03F1/70 ,  G03F1/36 ,  G03F1/68 ,  G03F7/70941

Abstract: A method is described for computing distance based and pattern density based design rules for the mask layout design of a VLSI chip so that the design satisfying the above design rules when manufactured on a wafer do not violate the specified tolerance on the critical dimensions (CD). The design rules are developed on the computed enclosed energy which is a convolution of the total optical energy and the pattern density of the mask. The total optical energy is the sum of the short range diffraction limited optical energy and the long range optical flare. The method steps for generating rules for a mask layout include: selecting a mask shape from a plurality thereof inputted from the mask layout, and determining a CD of the selected mask shape and a tolerance on variations of the CD; building a physical model of a component of the energy contributed by surrounding regions at a predetermined distance from the CD; using the physical model, computing the energy enclosed within the surrounding regions at the predetermined distance, and the maximum pattern density there of while remaining within the tolerance on variations of the CD; and outputting the maximum pattern density as a rule for the surrounding region at that distance.

公开(公告)号：US07962865B2

公开(公告)日：2011-06-14

申请号：US12175097

申请日：2008-07-17

Applicant: Fook-Luen Heng ,  Mark Alan Lavin ,  Jin-Fuw Lee ,  Chieh-yu Lin ,  Jawahar Pundalik Nayak ,  Rama Nand Singh

Inventor： Fook-Luen Heng ,  Mark Alan Lavin ,  Jin-Fuw Lee ,  Chieh-yu Lin ,  Jawahar Pundalik Nayak ,  Rama Nand Singh

IPC: G06F17/20 ,  G06F19/00 ,  G03F1/00 ,  G21K5/00

CPC classification number: G06F17/5068

Abstract: A system and method of employing patterning process statistics to evaluate layouts for intersect area analysis includes applying Optical Proximity Correction (OPC) to the layout, simulating images formed by the mask and applying patterning process variation distributions to influence and determine corrective actions taken to improve and optimize the rules for compliance by the layout. The process variation distributions are mapped to an intersect area distribution by creating a histogram based upon a plurality of processes for an intersect area. The intersect area is analyzed using the histogram to provide ground rule waivers and optimization.

Abstract translation: 使用图案化处理统计来评估交叉区域分析的布局的系统和方法包括对布局应用光学近似校正（OPC），模拟由掩模形成的图像并应用图案化过程变化分布来影响和确定纠正措施以改进和 优化布局符合规则。 通过基于交叉区域的多个处理创建直方图，将过程变化分布映射到交叉区域分布。 使用直方图分析交叉区域，以提供基本规则豁免和优化。